SCHEMBL9818632

SCHEMBL9818632

C=Cc1ccc(C(C)C)cc1.O=C1C=CC(=O)N1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SIRT2 Q8IXJ6 1/20 0.49
SIRT1 Q96EB6 1/20 0.49
SIRT5 Q9NXA8 1/20 0.49
TYR P14679 2/20 0.47
PIM1 P11309 1/20 0.46
POLB P06746 1/20 0.46
MYC P01106 1/20 0.42
MAX P61244 1/20 0.42
EGFR P00533 1/20 0.41
ERBB2 P04626 1/20 0.41
IGF1R P08069 1/20 0.41
PDGFRB P09619 1/20 0.41
GLB1 P16278 1/20 0.41
CTRC Q99895 1/20 0.41
KDM4E B2RXH2 2/20 0.40
MAPK1 P28482 1/20 0.40
ALDH1A1 P00352 2/20 0.39
GSK3A P49840 1/20 0.39
GSK3B P49841 1/20 0.39
CCR6 P51684 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL367595 0.82 TYR (0.58) SIRT2SIRT1SIRT5TYRPIM1
Methane SCHEMBL11025053 0.80 TYR (0.56) SIRT2SIRT1SIRT5TYRPIM1
SCHEMBL9818675 0.79 ALDH1A1 (0.44) PIM1POLBKDM4EALDH1A1GSK3A
SCHEMBL10489047 0.75 IGF1R (0.46) PIM1MYCMAXIGF1RKDM4E
Styrene SCHEMBL286196 0.75 ALDH1A1 (0.61) SIRT2SIRT1SIRT5PIM1POLB
Styrene SCHEMBL5583611 0.75 ALDH1A1 (0.61) SIRT2SIRT1SIRT5PIM1POLB
Styrene SCHEMBL9418540 0.75 ALDH1A1 (0.61) SIRT2SIRT1SIRT5PIM1POLB
SCHEMBL30560616 0.72 TYR (0.47) SIRT2SIRT1SIRT5TYRPOLB
SCHEMBL27747255 0.72 GSK3B (0.44) KDM4EMAPK1ALDH1A1GSK3AGSK3B
SCHEMBL6281528 0.69 ALDH1A1 (0.58) SIRT2SIRT1SIRT5TYRKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0140273-B1 POSITIVE PHOTORESIST COMPOSITIONS HAVING DEEP UV RESPONSE, PHOTOSENSITIVE ELEMENTS AND THERMALLY STABLE PHOTOCHEMICALLY IMAGED SYSTEMS CONTAINING SAME HOECHST CELANESE CORPORATION (US) 1991-09-11 EP disclosed