SCHEMBL983618

SCHEMBL983618

[CH2]COCCCCCCCCCCC

nearest known ligand 0.52

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
THRB P10828 2/20 0.52
HTT P42858 2/20 0.52
MEN1 O00255 1/20 0.52
KMT2A Q03164 1/20 0.52
MAPT P10636 1/20 0.52
CES2 O00748 2/20 0.48
ALDH1A1 P00352 1/20 0.45
TDP1 Q9NUW8 1/20 0.45
USP2 O75604 1/20 0.45
TSHR P16473 4/20 0.44
CES1 P23141 1/20 0.43
SPHK1 Q9NYA1 1/20 0.39
LPAR1 Q92633 2/20 0.39
LPAR3 Q9UBY5 2/20 0.39
LPAR2 Q9HBW0 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL132961 1.00 THRB (0.52) THRBHTTMEN1KMT2AMAPT
SCHEMBL335170 1.00 THRB (0.52) THRBHTTMEN1KMT2AMAPT
SCHEMBL983600 1.00 THRB (0.52) THRBHTTMEN1KMT2AMAPT
SCHEMBL981267 1.00 THRB (0.52) THRBHTTMEN1KMT2AMAPT
SCHEMBL493130 1.00 THRB (0.52) THRBHTTMEN1KMT2AMAPT
SCHEMBL22288118 1.00 THRB (0.52) THRBHTTMEN1KMT2AMAPT
SCHEMBL63140 1.00
SCHEMBL16114084 1.00 THRB (0.52) THRBHTTMEN1KMT2AMAPT
SCHEMBL983473 1.00 THRB (0.52) THRBHTTMEN1KMT2AMAPT
SCHEMBL982461 1.00 THRB (0.52) THRBHTTMEN1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0574355-B1 Phosphinyloxy propanaminium inner salt derivatives CIBA GEIGY AG (CH) 1997-08-13 EP claimed
EP-0574355-A1 Phosphinyloxy propanaminium inner salt derivatives SANDOZ LTD. (CH) 1993-12-15 EP claimed
CN-118302407-A Carbonyl compound, method for producing isocyanate compound, and isocyanate composition 旭化成株式会社 2024-07-05 CN disclosed
CN-118215651-A Method for producing isocyanate compound, method for producing urethane compound, method for recovering amine compound, and isocyanate composition 旭化成株式会社 2024-06-18 CN disclosed
EP-3878928-B1 LUBRICANT COMPOSITION ENEOS CORP (JP) 2024-05-22 EP disclosed
US-20230332064-A1 LUBRICATING OIL COMPOSITION ENEOS CORPORATION (JP) 2023-10-19 US disclosed
EP-4227389-A1 LUBRICATING OIL COMPOSITION ENEOS Corporation (JP) 2023-08-16 EP disclosed
CN-116323879-A Lubricating oil composition 引能仕株式会社 2023-06-23 CN disclosed
WO-2023080258-A1 CARBONYL COMPOUND, METHOD FOR PRODUCING CARBONYL COMPOUND, METHOD FOR PRODUCING ISOCYANATE COMPOUND, AND ISOCYANATE COMPOSITION 旭化成株式会社 2023-05-11 WO disclosed
WO-2023080257-A1 METHOD FOR PRODUCING ISOCYANATE COMPOUNDS, METHOD FOR PRODUCING CARBAMATE COMPOUNDS, METHOD FOR RECOVERING AMINE COMPOUNDS, AND ISOCYANATE COMPOSITION 旭化成株式会社 2023-05-11 WO disclosed
US-11555159-B2 Lubricating oil composition ENEOS CORPORATION (JP) 2023-01-17 US disclosed
EP-0463485-B1 Process for the production of flexographic relief printing plates BASF AG (DE) 1997-05-02 EP disclosed
EP-0757032-A2 Naphthalene compound, and liquid crystal composition and liquid crystal element using the same MITSUI TOATSU CHEMICALS, INC. (JP) 1997-02-05 EP disclosed
EP-0751133-A1 Pyrimidine compound, and liquid crystal composition and liquid crystal element using the same MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1997-01-02 EP disclosed
US-5512207-A Azaaromatic compounds, process for their preparation, and their use in liquid-crystalline mixtures HOECHST AKTIENGESELLSCHAFT (DE) 1996-04-30 US disclosed
EP-0316618-B1 Multilayer flat light sensitive registration material BASF AG (DE) 1994-08-17 EP disclosed
US-5240815-A Exposing photopolymerizable component to actinic light, development BASF AKTIENGESELLSCHAFT (DE) 1993-08-31 US disclosed
EP-0463485-A2 Process for the production of flexographic relief printing plates BASF Aktiengesellschaft (DE) 1992-01-02 EP disclosed
US-5035981-A Having a top layer of high-strength, transparent, soluble or swellable polymer containing an antistatic agent of an ethoxylated amine or amide; exposure; development BASF AKTIENGESELLSCHAFT (DE) 1991-07-30 US disclosed
US-4946758-A RELIEF IMAGE FORMING LAYER; HIGH TENSILE STRENGTH POLYMER AND COVERING BASF AKTIENGESELLSCHAFT (DE) 1990-08-07 US disclosed