SCHEMBL9842301

SCHEMBL9842301

CC(F)(F)C(F)(F)C(C(=O)O)=C(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1614528 0.86 THRB (0.30)
SCHEMBL15873150 0.82 THRB (0.37)
SCHEMBL14938344 0.79 ALDH1A1 (0.32)
SCHEMBL3183011 0.79 THRB (0.35)
SCHEMBL3260986 0.78
SCHEMBL1801444 0.78
SCHEMBL5967653 0.75 THRB (0.32)
SCHEMBL8925159 0.75
SCHEMBL723673 0.75
SCHEMBL9011344 0.75 THRB (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8600279-B2 Resin material, endless belt, roll, image fixing unit, and image forming apparatus FUJI XEROX CO., LTD. (JP) 2013-12-03 US disclosed
US-20120195656-A1 RESIN MATERIAL, ENDLESS BELT, ROLL, IMAGE FIXING UNIT, AND IMAGE FORMING APPARATUS FUJI XEROX CO., LTD. (JP) 2012-08-02 US disclosed
US-5002979-A Hyydrogenorganosilicon monomer, organosilicon, fluoroorgano monomer, a hydrophobic monomer and a crosslinking agent BAUSCH & LOMB INCORPORATED (US) 1991-03-26 US disclosed
EP-0209597-A1 EXTENDED-WEAR LENSES Bausch &amp; Lomb Incorporated (US) 1987-01-28 EP disclosed
WO-1986004343-A1 EXTENDED-WEAR LENSES BAUSCH AND LOMB INCORPORATED (US) 1986-07-31 WO disclosed