Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 2/20 | 0.42 |
| ▸ | CES2 | O00748 | 1/20 | 0.42 |
| ▸ | APEX1 | P27695 | 1/20 | 0.41 |
| ▸ | EP300 | Q09472 | 1/20 | 0.41 |
| ▸ | GRIK1 | P39086 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.39 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.39 |
| ▸ | PPARG | P37231 | 6/20 | 0.38 |
| ▸ | PPARD | Q03181 | 6/20 | 0.38 |
| ▸ | PPARA | Q07869 | 6/20 | 0.38 |
| ▸ | GPR84 | Q9NQS5 | 5/20 | 0.38 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.38 |
| ▸ | TSHR | P16473 | 4/20 | 0.38 |
| ▸ | TLR2 | O60603 | 2/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.38 |
| ▸ | FABP4 | P15090 | 2/20 | 0.38 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.38 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7173367 | 0.94 | AKR1B1 (0.48) | CES1CES2APEX1EP300ALDH1A1 | |
| SCHEMBL7176274 | 0.92 | GPR84 (0.50) | CES1CES2APEX1EP300ALDH1A1 | |
| SCHEMBL4665568 | 0.86 | HDAC3 (0.42) | CES1CES2EP300GRIK1ALDH1A1 | |
| SCHEMBL1905710 | 0.86 | HDAC3 (0.42) | CES1CES2EP300GRIK1ALDH1A1 | |
| SCHEMBL4433665 | 0.84 | GRIK1 (0.47) | CES1CES2APEX1EP300GRIK1 | |
| SCHEMBL285080 | 0.84 | GRIK1 (0.47) | CES1CES2APEX1EP300GRIK1 | |
| SCHEMBL7556833 | 0.84 | GRIK1 (0.47) | CES1CES2APEX1EP300GRIK1 | |
| SCHEMBL11034343 | 0.83 | GRIK1 (0.46) | CES1CES2APEX1EP300GRIK1 | |
| SCHEMBL7559357 | 0.83 | GRIK1 (0.52) | CES1CES2APEX1EP300GRIK1 | |
| SCHEMBL7562280 | 0.83 | GRIK1 (0.58) | CES1CES2APEX1EP300GRIK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0738703-B1 | Acrylic acid derivatives, method for preparing the acrylic acid derivatives, and acrylic acid polymers | NIPPON CATALYTIC CHEM IND (JP) | 2002-05-22 | — | — | EP | claimed |
| US-10884335-B2 | Black photosensitive resin composition and black column spacer prepared therefrom | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2021-01-05 | — | — | US | disclosed |
| US-20190018318-A1 | BLACK PHOTOSENSITIVE RESIN COMPOSITION AND BLACK COLUMN SPACER PREPARED THEREFROM | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2019-01-17 | — | — | US | disclosed |
| US-20180335695-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC INSULATING FILM PREPARED THEREFROM | ROHM & HAAS ELECT MATERIALS KOREA LTD (KR) | 2018-11-22 | — | — | US | disclosed |
| US-20180253004-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC INSULATING FILM PREPARED THEREFROM | ROHM & HAAS ELECT MATERIALS KOREA LTD (KR) | 2018-09-06 | — | — | US | disclosed |
| EP-2325694-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2017-11-08 | — | — | EP | disclosed |
| US-8431324-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20110212401-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2011-09-01 | — | — | US | disclosed |
| US-20110151378-A1 | RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2011-06-23 | — | — | US | disclosed |
| US-20110143279-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2011-06-16 | — | — | US | disclosed |
| EP-2325694-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR Corporation (JP) | 2011-05-25 | — | — | EP | disclosed |
| US-20110014569-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER | JSR CORPORATION (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20100285405-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-11-11 | — | — | US | disclosed |
| EP-0755951-B1 | Acrylic ester derivative and producing process of the same and acrylic-ester-based polymer | NIPPON CATALYTIC CHEM IND (JP) | 2003-02-05 | — | — | EP | disclosed |
| US-5783678-A | HYDROPHILIC | NIPPON SHOKUBAI CO., LTD. (JP) | 1998-07-21 | — | — | US | disclosed |
| EP-0755951-A2 | Acrylic ester derivative and producing process of the same and acrylic-ester-based polymer | NIPPON SHOKUBAI CO., LTD. (JP) | 1997-01-29 | — | — | EP | disclosed |