Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC3 | O15379 | 4/20 | 0.42 |
| ▸ | HDAC1 | Q13547 | 4/20 | 0.42 |
| ▸ | HDAC2 | Q92769 | 4/20 | 0.42 |
| ▸ | HDAC8 | Q9BY41 | 4/20 | 0.42 |
| ▸ | FFAR3 | O14843 | 3/20 | 0.42 |
| ▸ | CES2 | O00748 | 1/20 | 0.38 |
| ▸ | CES1 | P23141 | 1/20 | 0.38 |
| ▸ | GRIK1 | P39086 | 3/20 | 0.37 |
| ▸ | GRIK2 | Q13002 | 2/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | EP300 | Q09472 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | ABAT | P80404 | 1/20 | 0.32 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.32 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.32 |
| ▸ | GPR84 | Q9NQS5 | 2/20 | 0.31 |
| ▸ | PPARG | P37231 | 2/20 | 0.31 |
| ▸ | PPARD | Q03181 | 2/20 | 0.31 |
| ▸ | PPARA | Q07869 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4665568 | 1.00 | HDAC3 (0.42) | HDAC3HDAC1HDAC2HDAC8FFAR3 | |
| SCHEMBL984849 | 0.86 | CES1 (0.42) | CES2CES1GRIK1TSHREP300 | |
| SCHEMBL7173367 | 0.85 | AKR1B1 (0.48) | CES2CES1TSHREP300ALDH1A1 | |
| SCHEMBL9493661 | 0.83 | GRIK1 (0.50) | HDAC3HDAC1HDAC2HDAC8FFAR3 | |
| SCHEMBL1003142 | 0.83 | GRIK1 (0.50) | HDAC3HDAC1HDAC2HDAC8FFAR3 | |
| SCHEMBL691600 | 0.83 | GRIK1 (0.50) | HDAC3HDAC1HDAC2HDAC8FFAR3 | |
| SCHEMBL7176274 | 0.83 | GPR84 (0.50) | CES2CES1TSHREP300ALDH1A1 | |
| SCHEMBL9651125 | 0.82 | GRIK1 (0.43) | HDAC3HDAC1HDAC2HDAC8FFAR3 | |
| Hydrochloric Acid SCHEMBL9624870 | 0.81 | GRIK1 (0.48) | HDAC3HDAC1HDAC2HDAC8FFAR3 | |
| SCHEMBL811730 | 0.81 | GRIK1 (0.55) | HDAC3HDAC1HDAC2HDAC8FFAR3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10884335-B2 | Black photosensitive resin composition and black column spacer prepared therefrom | ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. (KR) | 2021-01-05 | — | — | US | disclosed |
| US-20190018318-A1 | BLACK PHOTOSENSITIVE RESIN COMPOSITION AND BLACK COLUMN SPACER PREPARED THEREFROM | DUPONT SPECIALTY MATERIALS KOREA LTD (KR) | 2019-01-17 | — | — | US | disclosed |
| US-20180335695-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC INSULATING FILM PREPARED THEREFROM | ROHM & HAAS ELECT MATERIALS KOREA LTD (KR) | 2018-11-22 | — | — | US | disclosed |
| US-20180253004-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND ORGANIC INSULATING FILM PREPARED THEREFROM | ROHM & HAAS ELECT MATERIALS KOREA LTD (KR) | 2018-09-06 | — | — | US | disclosed |
| US-8431324-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20110212401-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2011-09-01 | — | — | US | disclosed |
| US-20110151378-A1 | RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2011-06-23 | — | — | US | disclosed |
| US-20110143279-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2011-06-16 | — | — | US | disclosed |
| EP-2325694-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR Corporation (JP) | 2011-05-25 | — | — | EP | disclosed |
| US-20100285405-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-11-11 | — | — | US | disclosed |
| EP-0755951-B1 | Acrylic ester derivative and producing process of the same and acrylic-ester-based polymer | NIPPON CATALYTIC CHEM IND (JP) | 2003-02-05 | — | — | EP | disclosed |
| US-5783678-A | HYDROPHILIC | NIPPON SHOKUBAI CO., LTD. (JP) | 1998-07-21 | — | — | US | disclosed |
| EP-0755951-A2 | Acrylic ester derivative and producing process of the same and acrylic-ester-based polymer | NIPPON SHOKUBAI CO., LTD. (JP) | 1997-01-29 | — | — | EP | disclosed |