Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIK1 | P39086 | 2/20 | 0.58 |
| ▸ | EP300 | Q09472 | 1/20 | 0.50 |
| ▸ | GRIK2 | Q13002 | 1/20 | 0.43 |
| ▸ | F7 | P08709 | 2/20 | 0.39 |
| ▸ | F3 | P13726 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | TERT | O14746 | 3/20 | 0.35 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.35 |
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | BLM | P54132 | 2/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.35 |
| ▸ | FABP4 | P15090 | 2/20 | 0.35 |
| ▸ | PPARG | P37231 | 2/20 | 0.35 |
| ▸ | PPARD | Q03181 | 2/20 | 0.35 |
| ▸ | PPARA | Q07869 | 2/20 | 0.35 |
| ▸ | GMNN | O75496 | 1/20 | 0.35 |
| ▸ | USP2 | O75604 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7561363 | 0.94 | EP300 (0.59) | GRIK1EP300GRIK2F7F3 | |
| SCHEMBL8055460 | 0.94 | EP300 (0.59) | GRIK1EP300GRIK2F7F3 | |
| SCHEMBL7173369 | 0.94 | EP300 (0.59) | GRIK1EP300GRIK2F7F3 | |
| SCHEMBL7176279 | 0.92 | EP300 (0.62) | GRIK1EP300F7F3TERT | |
| SCHEMBL811158 | 0.87 | GRIK1 (0.58) | GRIK1EP300GRIK2F7F3 | |
| SCHEMBL4375273 | 0.87 | GRIK1 (0.58) | GRIK1EP300GRIK2F7F3 | |
| SCHEMBL7562280 | 0.87 | GRIK1 (0.58) | GRIK1EP300GRIK2F7F3 | |
| SCHEMBL4665566 | 0.86 | GRIK1 (0.55) | GRIK1EP300GRIK2APEX1 | |
| SCHEMBL1905712 | 0.86 | GRIK1 (0.55) | GRIK1EP300GRIK2APEX1 | |
| Phosphoric Acid SCHEMBL23531685 | 0.85 | EP300 (0.55) | GRIK1EP300F7F3TERT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1159318-B1 | OLIGOMERIZATION AND (CO)POLYMERIZATION OF SUBSTITUTED AND UNSUBSTITUTED ALPHA-METHYLENE-GAMMA-BUTYROLACTONES AND PRODUCTS THEREOF | DU PONT (US) | 2004-01-21 | — | — | EP | claimed |
| EP-0738703-B1 | Acrylic acid derivatives, method for preparing the acrylic acid derivatives, and acrylic acid polymers | NIPPON CATALYTIC CHEM IND (JP) | 2002-05-22 | — | — | EP | claimed |
| EP-2325694-B1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORP (JP) | 2017-11-08 | — | — | EP | disclosed |
| US-8431324-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2013-04-30 | — | — | US | disclosed |
| US-20110212401-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2011-09-01 | — | — | US | disclosed |
| US-20110151378-A1 | RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2011-06-23 | — | — | US | disclosed |
| US-20110143279-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2011-06-16 | — | — | US | disclosed |
| EP-2325694-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD | JSR Corporation (JP) | 2011-05-25 | — | — | EP | disclosed |
| US-20110014569-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER | JSR CORPORATION (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20100285405-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-11-11 | — | — | US | disclosed |
| US-7417090-B2 | Water-dispersible polyisocyanate composition, production thereof, and water-based curable composition and application thereof | DAINIPPON INK & CHEMICALS, INC. (JP) | 2008-08-26 | — | — | US | disclosed |
| US-20070049691-A1 | Water-dispersible polyisocyanate composition, production thereof, and water-based curable composition and application thereof | DAINIPPON INK AND CHEMICALS, INC. (JP) | 2007-03-01 | — | — | US | disclosed |
| EP-0755951-B1 | Acrylic ester derivative and producing process of the same and acrylic-ester-based polymer | NIPPON CATALYTIC CHEM IND (JP) | 2003-02-05 | — | — | EP | disclosed |
| US-5783678-A | HYDROPHILIC | NIPPON SHOKUBAI CO., LTD. (JP) | 1998-07-21 | — | — | US | disclosed |
| EP-0755951-A2 | Acrylic ester derivative and producing process of the same and acrylic-ester-based polymer | NIPPON SHOKUBAI CO., LTD. (JP) | 1997-01-29 | — | — | EP | disclosed |