Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL98379 | 0.84 | NPSR1 (0.31) | NPSR1 | |
| SCHEMBL9944392 | 0.76 | CYP19A1 (0.39) | NPSR1 | |
| SCHEMBL47504 | 0.74 | CYP17A1 (0.43) | NPSR1 | |
| Hydrochloric Acid SCHEMBL31564945 | 0.73 | CYP17A1 (0.44) | NPSR1 | |
| Bromide SCHEMBL31708313 | 0.73 | CYP17A1 (0.42) | NPSR1 | |
| SCHEMBL98285 | 0.73 | NPSR1 (0.43) | NPSR1 | |
| SCHEMBL98531 | 0.73 | NPSR1 (0.30) | NPSR1 | |
| SCHEMBL98386 | 0.72 | CYP19A1 (0.39) | NPSR1 | |
| SCHEMBL98577 | 0.71 | CYP17A1 (0.40) | NPSR1 | |
| SCHEMBL9925259 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9618843-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-04-11 | — | — | US | disclosed |
| US-9618843-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-04-11 | — | — | US | disclosed |
| US-9494860-B2 | Resist composition, method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-11-15 | — | — | US | disclosed |
| US-9250531-B2 | Method of forming resist pattern and negative tone-development resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-02-02 | — | — | US | disclosed |
| US-9164380-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-10-20 | — | — | US | disclosed |
| US-9104101-B2 | Resist composition, method of forming resist pattern and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-08-11 | — | — | US | disclosed |
| US-9097971-B2 | Compound, radical polymerization initiator, method for producing compound, polymer, resist composition, and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-08-04 | — | — | US | disclosed |
| US-9063416-B2 | Resist composition, method of forming resist pattern and compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-23 | — | — | US | disclosed |
| US-9023577-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD (JP) | 2015-05-05 | — | — | US | disclosed |
| US-8945812-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-02-03 | — | — | US | disclosed |
| US-20120208131-A1 | METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-08-16 | — | — | US | disclosed |
| US-20120183899-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120183900-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-07-19 | — | — | US | disclosed |
| US-20120164578-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-06-28 | — | — | US | disclosed |
| US-20120148955-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20120148956-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20120100487-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20120058430-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-03-08 | — | — | US | disclosed |
| US-20120015299-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-01-19 | — | — | US | disclosed |
| US-20110287362-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-11-24 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120015299-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | RER1, ASIC1, ABCC1 | NPSR1 1466/4885 |
| US-20110287362-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | RER1, ASIC1, SCO2 | NPSR1 296/4885 |
| US-20120058430-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | ASIC1, SLC11A2, RER1 | NPSR1 967/4885 |
| US-20120148955-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND | C1R, SLC11A2, RER1 | NPSR1 364/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.