Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Diethylamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.60 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.60 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.48 |
| ▸ | TSHR | P16473 | 3/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.48 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.39 |
| ▸ | MMP1 | P03956 | 1/20 | 0.38 |
| ▸ | MMP2 | P08253 | 1/20 | 0.38 |
| ▸ | MMP3 | P08254 | 1/20 | 0.38 |
| ▸ | MMP9 | P14780 | 1/20 | 0.38 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | PAOX | Q6QHF9 | 1/20 | 0.35 |
| ▸ | ADH1B | P00325 | 1/20 | 0.34 |
| ▸ | ADH1A | P07327 | 1/20 | 0.34 |
| ▸ | ADH7 | P40394 | 1/20 | 0.34 |
| ▸ | TGM2 | P21980 | 3/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL141762 | 0.91 | — | — | |
| SCHEMBL4978060 | 0.89 | ZDHHC20 (0.62) | ZDHHC20ZDHHC2ALDH1A1TSHRMAPK1 | |
| SCHEMBL641627 | 0.89 | ZDHHC20 (0.62) | ZDHHC20ZDHHC2ALDH1A1TSHRMAPK1 | |
| Ammonia Solution, Strong SCHEMBL27756085 | 0.89 | — | — | |
| Water SCHEMBL28252943 | 0.89 | — | — | |
| SCHEMBL9063855 | 0.89 | — | — | |
| Hydrochloric Acid SCHEMBL15846881 | 0.89 | — | — | |
| Diethylamine SCHEMBL2505686 | 0.88 | ZDHHC20 (0.72) | ZDHHC20ZDHHC2ALDH1A1TSHRMAPK1 | |
| SCHEMBL11326540 | 0.87 | ZDHHC20 (0.64) | ZDHHC20ZDHHC2ALDH1A1TSHRMAPK1 | |
| Hydrochloric Acid SCHEMBL15201039 | 0.87 | ZDHHC20 (0.64) | ZDHHC20ZDHHC2ALDH1A1TSHRMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 431 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4624548-A1 | WATER REPELLENT COMPOSITION, METHOD FOR PRODUCING NON-FLUORINE POLYMER, PROCESSING METHOD AND ARTICLE | AGC INC. (JP) | 2025-10-01 | — | — | EP | claimed |
| US-20250277071-A1 | WATER REPELLENT COMPOSITION, METHOD FOR PRODUCING NON-FLUORINE POLYMER, PROCESSING METHOD AND ARTICLE | AGC Inc. (JP) | 2025-09-04 | — | — | US | claimed |
| WO-2024111614-A1 | WATER REPELLENT COMPOSITION, METHOD FOR PRODUCING NON-FLUORINE POLYMER, PROCESSING METHOD AND ARTICLE | ＡＧＣ株式会社 | 2024-05-30 | — | — | WO | claimed |
| US-20180051417-A1 | METHOD OF MANUFACTURING PAPER WITH UNBLEACHED CELLULOSE PULP SUSPENSION CONTAINING ORGANIC RESIDUES | SOLENIS TECHNOLOGIES, L.P. | 2018-02-22 | — | — | US | claimed |
| EP-1622583-B1 | HAIR CARE PRODUCTS WITH STYLING PROPERTIES | HENKEL AG & CO KGAA (DE) | 2016-12-21 | — | — | EP | claimed |
| US-8524111-B2 | CMP abrasive slurry for polishing insulation film, polishing method, and semiconductor electronic part polished by the polishing method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-09-03 | — | — | US | claimed |
| EP-1093787-B1 | Composition for treating dandruff based on a pyridinethione salt, an insoluble conditioning agent and an acrylic terpolymer | OREAL (FR) | 2007-03-14 | — | — | EP | claimed |
| US-6926900-B1 | Antidandruff composition for treating the hair and the scalp, based on a pyridinethione salt, an insoluble conditioner and an acrylic terpolymer | L'OREAL (FR) | 2005-08-09 | — | — | US | claimed |
| EP-1088546-B1 | Composition for treating dandruff in hair and scalp based on an antidandruff agent and an acrylic terpolymer | OREAL (FR) | 2004-07-14 | — | — | EP | claimed |
| EP-1092420-B1 | A washing composition for keratinous materials based on a surfactant, a cationic vinyllactam polymer and an acrylic terpolymer | OREAL (FR) | 2004-05-19 | — | — | EP | claimed |
| US-5567608-A | N,N-DIALKYLACRYLAMIDE CONTAINING POLYMER | NITTO CHEMICAL INDUSTRY CO., LTD. (JP) | 1996-10-22 | — | — | US | claimed |
| EP-0544933-B1 | A pressure sensitive adhesive composition and a pressure sensitive adhesive sheet, a label and a laminate utilizing it | LINTEC CORP (JP) | 1996-02-07 | — | — | EP | claimed |
| US-5389437-A | Paper or synthetic resin film coated with adhesive having improved blister resistance, removability, cohesive strength, heat resistance, corrosion resistance | SAIDEN CHEMICAL INDUSTRY CO., LTD. (JP) | 1995-02-14 | — | — | US | claimed |
| EP-0435418-B1 | A dispersant/antioxidant viscosity index improving lubricant additive | TEXACO DEVELOPMENT CORP (US) | 1995-01-04 | — | — | EP | claimed |
| US-5278271-A | Acrylic copolymer comprising aminoalkyl (meth)acrylamide | SAIDEN CHEMICAL INDUSTRY CO., LTD. (JP) | 1994-01-11 | — | — | US | claimed |
| EP-0544933-A1 | A pressure sensitive adhesive composition and a pressure sensitive adhesive sheet, a label and a laminate utilizing it | LINTEC Corporation (JP) | 1993-06-09 | — | — | EP | claimed |
| US-5173160-A | ANALYSIS OF CARRIER AMPHOLYTES USING IMMOBILIZED PH GRADIENTS | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 1992-12-22 | — | — | US | claimed |
| WO-1992015870-A1 | ANALYSIS OF CARRIER AMPHOLYTES USING IMMOBILIZED PH GRADIENTS | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 1992-09-17 | — | — | WO | claimed |
| EP-0435418-A1 | A dispersant/antioxidant viscosity index improving lubricant additive | TEXACO DEVELOPMENT CORPORATION (US) | 1991-07-03 | — | — | EP | claimed |
| US-4897433-A | Process for producing an anti-thrombogenic material by graft polymerization | JAPAN ATOMIC ENERGY RESEARCH INST. (JP) | 1990-01-30 | — | — | US | claimed |