⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14782727 | 0.92 | — | — | |
| SCHEMBL3191037 | 0.76 | — | — | |
| SCHEMBL27616170 | 0.76 | GRIN2D (0.33) | — | |
| SCHEMBL29553061 | 0.74 | — | — | |
| SCHEMBL29554396 | 0.74 | — | — | |
| SCHEMBL7655453 | 0.74 | — | — | |
| SCHEMBL2775678 | 0.71 | TRIM24 (0.37) | — | |
| SCHEMBL2115705 | 0.70 | ALDH1A1 (0.32) | — | |
| SCHEMBL1503367 | 0.70 | ALDH1A1 (0.32) | — | |
| SCHEMBL28078638 | 0.69 | AKR1C1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160349088-A1 | MONITORING DEVICES AND PROCESSES BASED ON TRANSFORMATION, DESTRUCTION AND CONVERSION OF NANOSTRUCTURES | PATEL GORDHANBHAI (US) | 2016-12-01 | — | — | US | disclosed |
| EP-2475612-A1 | MONITORING DEVICES AND PROCESSES BASED ON TRANSFORMATION, DESTRUCTION AND CONVERSION OF NANOSTRUCTURES | JP LABORATORIES, INC. (US) | 2012-07-18 | — | — | EP | disclosed |
| WO-2011031959-A1 | MONITORING DEVICES AND PROCESSES BASED ON TRANSFORMATION, DESTRUCTION AND CONVERSION OF NANOSTRUCTURES | JP LABORATORIES, INC. (US) | 2011-03-17 | — | — | WO | disclosed |
| US-20110003279-A1 | Monitoring devices and processes based on transformation, destruction and conversion of nanostructures | PATEL GORDHANBHAI NATHALAL | 2011-01-06 | — | — | US | disclosed |
| US-7303856-B2 | Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer | FUJIFILM CORPORATION (JP) | 2007-12-04 | — | — | US | disclosed |
| US-7150955-B2 | Light-sensitive sheet comprising support, first and second light-sensitive layers and barrier layer | FUJI PHOTO FILM CO., LTD. (JP) | 2006-12-19 | — | — | US | disclosed |
| US-20050037281-A1 | Light-sensitive sheet comprising support, first and second light-sensitive layers and barrier layer | FUJI PHOTO FILM CO., LTD. | 2005-02-17 | — | — | US | disclosed |
| EP-1507171-A2 | Light-Sensitive sheet comprising support, first and second light-sensitive layers and barrier layer | FUJI PHOTO FILM CO., LTD. (JP) | 2005-02-16 | — | — | EP | disclosed |
| US-20050025946-A1 | Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer | FUJI PHOTO FILM CO., LTD. | 2005-02-03 | — | — | US | disclosed |
| EP-1489460-A2 | Light-sensitive sheet comprising support, first light-sensitive layer and second light-sensitive layer | Fuji Photo Film Co., Ltd. (JP) | 2004-12-22 | — | — | EP | disclosed |
| US-5145760-A | POSITIVE-WORKING PHOTOSENSITIVE ELECTROSTATIC MASTER WITH IMPROVED INVIRONMENTAL LATITUDE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1992-09-08 | — | — | US | disclosed |
| US-5030548-A | Photoiniator system comprising a 4,4'-bis(dialkylamino) benzophenone, an aromatic ketone and lophine dimer; also present a halogen compound leuco and dye; lithography; printing plates; photoresists | FUJI PHOTO FILM CO., LTD. (JP) | 1991-07-09 | — | — | US | disclosed |
| EP-0405543-A2 | Photosensitive leuco dye containing electrostatic master with printout image | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-01-02 | — | — | EP | disclosed |
| US-4945020-A | MIXTURE OF POLYMIERC BINDER, PHOTOOXIDANT, LEUCO DYE, HALOGENATED HYDROCARBON AND PLASTICIZER | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1990-07-31 | — | — | US | disclosed |
| US-4923781-A | STORAGE STABILITY, CONTRAST, HIGH DENSITY, PHOTOSENSITIVITY | FUJI PHOTO FILM CO., LTD. (JP) | 1990-05-08 | — | — | US | disclosed |
| US-4343885-A | PHOTORESISTS | DYNACHEM CORPORATION (US) | 1982-08-10 | — | — | US | disclosed |
| EP-0005380-B1 | PHOTOTROPIC PHOTOSENSITIVE COMPOSITIONS CONTAINING A FLUORAN COLORFORMER | Dynachem Corporation (US) | 1982-01-06 | — | — | EP | disclosed |