SCHEMBL98865

SCHEMBL98865

C=C(F)C(=O)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30772960 0.97
SCHEMBL9723633 0.83
SCHEMBL24089734 0.82 ALDH1A1 (0.39)
SCHEMBL26116114 0.81 THRB (0.44)
SCHEMBL26112615 0.81 SOAT1 (0.41)
SCHEMBL30842820 0.81 GABRR1 (0.38)
SCHEMBL1322253 0.80
SCHEMBL22334513 0.80 ALDH1A1 (0.44)
SCHEMBL26111850 0.80 THRB (0.68)
SCHEMBL10829058 0.80 ALDH1A1 (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 359 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115779156-B Deiodination adhesive composition and operation film thereof 振德医疗用品股份有限公司 2024-09-13 CN claimed
CN-118368958-A Perovskite precursor solution, perovskite solar cell and preparation method of perovskite solar cell 天合光能股份有限公司 2024-07-19 CN claimed
CN-118359960-A Photoetching ink and preparation method thereof 湖南互力达涂料科技有限公司 2024-07-19 CN claimed
CN-114381280-B Negative dielectric anisotropic liquid crystal composition, optical anisotropic isomer and liquid crystal display device 烟台显华科技集团股份有限公司 2024-03-19 CN claimed
CN-114381279-B Polymerizable compound, composition, and liquid crystal display device 烟台显华科技集团股份有限公司 2024-01-30 CN claimed
CN-117418393-A Processing method for improving fatigue resistance of polyester fiber product based on graft copolymerization 苏州通捷纺织有限公司 2024-01-19 CN claimed
CN-113773433-B Polymer resin and preparation method thereof, method for improving cracking of electron beam photoresist, electron beam photoresist and preparation and use thereof 江苏汉拓光学材料有限公司 2023-12-29 CN claimed
CN-117233999-A Low-driving-voltage electric control dimming film and preparation method thereof 北京科技大学 2023-12-15 CN claimed
CN-115779156-A Deiodination viscose composition and operation film thereof 振德医疗用品股份有限公司 2023-03-14 CN claimed
CN-109456187-B Process for preparing alkyl fluoroacrylates DPX精细化学奥地利两合公司 2022-08-30 CN claimed
US-20170197905-A1 METHOD FOR PRODUCING 2-HALOGEN-ACRYLIC ACID ESTERS SALTIGO GMBH (DE) 2017-07-13 US claimed
EP-3157900-A1 METHOD FOR PRODUCING 2-HALOGEN-ACRYLIC ACID ESTERS Saltigo GmbH (DE) 2017-04-26 EP claimed
CN-104557512-B A kind of 3-(bromo phenyl)-2, the preparation method of 2 '-difluoro propionic acid SHANXI UNIVERISTY (CN) 2016-05-11 CN claimed
WO-2015193392-A1 METHOD FOR PRODUCING 2-HALOGEN-ACRYLIC ACID ESTERS SALTIGO GMBH (DE) 2015-12-23 WO claimed
EP-1792889-B1 Process for the preparation of carboxylic acid esters SUMITOMO CHEMICAL CO (JP) 2015-03-04 EP claimed
US-7741511-B2 Process for the preparation of carboxylic acid esters SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-06-22 US claimed
US-20080009648-A1 PROCESS FOR THE PREPARATION OF CARBOXYLIC ACID ESTERS SOUDA HIROSHI 2008-01-10 US claimed
EP-1792889-A2 Process for the preparation of carboxylic acid esters Sumitomo Chemical Company, Limited (JP) 2007-06-06 EP claimed
EP-1547995-A1 Process for the preparation of carboxylic acid esters Sumitomo Chemical Company, Limited (JP) 2005-06-29 EP claimed
US-20050113581-A1 Process for the preparation of carboxylic acid esters SUMITOMO CHEMICAL COMPANY, LIMITED 2005-05-26 US claimed