SCHEMBL9889643

SCHEMBL9889643

C=CC(=O)NCC(O)C(O)CNC(=O)C=C

nearest known ligand 0.56

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.56
TSHR P16473 4/20 0.56
MAPK1 P28482 1/20 0.56
TDP1 Q9NUW8 1/20 0.56
ZDHHC20 Q5W0Z9 1/20 0.42
ZDHHC2 Q9UIJ5 1/20 0.42
TGM2 P21980 3/20 0.38
LMNA P02545 2/20 0.32
KMT2A Q03164 1/20 0.32
CYP2C19 P33261 2/20 0.32
CYP3A4 P08684 1/20 0.32
CYP2C9 P11712 1/20 0.32
GAA P10253 1/20 0.30
TP53 P04637 2/20 0.30
HIF1A Q16665 2/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8632003 0.85 TSHR (0.56) ALDH1A1TSHRMAPK1TDP1ZDHHC20
SCHEMBL1548741 0.85
SCHEMBL14311200 0.83 KDM4E (0.45) ALDH1A1TSHRMAPK1TDP1ZDHHC20
SCHEMBL106949 0.83 KDM4E (0.45) ALDH1A1TSHRMAPK1TDP1ZDHHC20
SCHEMBL1563416 0.83 KDM4E (0.45) ALDH1A1TSHRMAPK1TDP1ZDHHC20
SCHEMBL7635885 0.83 TSHR (0.45) ALDH1A1TSHRMAPK1TDP1ZDHHC20
SCHEMBL14221970 0.83 KDM4E (0.45) ALDH1A1TSHRMAPK1TDP1ZDHHC20
SCHEMBL9173193 0.83 TDP1 (0.45) ALDH1A1TSHRMAPK1TDP1ZDHHC20
SCHEMBL3690001 0.83 KDM4E (0.45) ALDH1A1TSHRMAPK1TDP1ZDHHC20
SCHEMBL9350302 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2363437-B1 Ink composition, ink set and image forming method FUJIFILM CORP (JP) 2018-08-08 EP disclosed
US-9714353-B2 Ink composition, ink set, and image formation method FUJIFILM CORPORATION (JP) 2017-07-25 US disclosed
EP-2977413-B1 INK COMPOSITION, INK SET, AND IMAGE FORMATION METHOD FUJIFILM CORP (JP) 2017-04-19 EP disclosed
EP-2902417-B1 CURABLE RESIN COMPOSITION, WATER-SOLUBLE INK COMPOSITION, INK SET, AND IMAGE FORMATION METHOD FUJIFILM CORP (JP) 2017-01-11 EP disclosed
US-9458337-B2 Curable resin composition, water-soluble ink composition, ink set, and image-forming method FUJIFILM CORPORATION (JP) 2016-10-04 US disclosed
US-9371460-B2 Photopolymerization method, ink set, ink composition, and water-soluble biimidazole FUJIFILM CORPORATION (JP) 2016-06-21 US disclosed
US-20150353748-A1 INK COMPOSITION, INK SET, AND IMAGE FORMATION METHOD FUJIFILM CORPORATION (JP) 2015-12-10 US disclosed
EP-2902417-A1 CURABLE RESIN COMPOSITION, WATER-SOLUBLE INK COMPOSITION, INK SET, AND IMAGE FORMATION METHOD Fujifilm Corporation (JP) 2015-08-05 EP disclosed
EP-2899241-A1 PHOTOPOLYMERIZATION METHOD, INK SET, IMAGE FORMATION METHOD, INK COMPOSITION, AND PHOTOPOLYMERIZATION INITIATOR AND WATER-SOLUBLE BIIMIDAZOLE USED THEREIN FUJI-FILM Corporation (JP) 2015-07-29 EP disclosed
US-20150159032-A1 CURABLE RESIN COMPOSITION, WATER-SOLUBLE INK COMPOSITION, INK SET, AND IMAGE-FORMING METHOD FUJIFILM CORPORATION (JP) 2015-06-11 US disclosed
US-20120141679-A1 INK COMPOSITION, INK SET, AND IMAGE FORMING METHOD FUJIFILM CORPORATION (JP) 2012-06-07 US disclosed
EP-2412536-A1 Image forming method Fujifilm Corporation (JP) 2012-02-01 EP disclosed
US-20110249055-A1 INK COMPOSITION, METHOD OF PRODUCING THE SAME, INK SET, AND IMAGE FORMING METHOD FUJIFILM CORPORATION (JP) 2011-10-13 US disclosed
WO-2011122356-A1 INK COMPOSITION AND METHOD FOR PRODUCING THE SAME, INK SET, AND IMAGE FORMING METHOD FUJIFILM CORPORATION (JP) 2011-10-06 WO disclosed
US-20110234690-A1 INK COMPOSITION, INK SET AND IMAGE FORMING PROCESS FUJIFILM CORPORATION (JP) 2011-09-29 US disclosed
US-20110234684-A1 IMAGE FORMING METHOD FUJIFILM CORPORATION (JP) 2011-09-29 US disclosed
EP-2363437-A2 Ink composition, ink set and image forming method Fujifilm Corporation (JP) 2011-09-07 EP disclosed
US-20110205291-A1 INK COMPOSITION, INK SET AND IMAGE FORMING METHOD FUJIFILM CORPORATION (JP) 2011-08-25 US disclosed
US-4511646-A Ethylenically-unsaturated dextrin composition for preparing a durable hydrophilic photopolymer MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1985-04-16 US disclosed
US-4507382-A Water developable positive acting lithographic printing plate MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1985-03-26 US disclosed