SCHEMBL9350302

SCHEMBL9350302

[CH2]C(O)CNC(=O)C=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8632003 0.83 TSHR (0.56)
SCHEMBL9889643 0.83 ALDH1A1 (0.56)
SCHEMBL1548741 0.83
SCHEMBL12723737 0.80 TSHR (0.59)
SCHEMBL14901 0.79
SCHEMBL17267140 0.79
SCHEMBL28993977 0.79
SCHEMBL9350270 0.79
SCHEMBL10350868 0.79
SCHEMBL1147912 0.77 ALDH1A1 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105934468-A Process for preparing membranes 富士胶片制造欧洲有限公司 2016-09-07 CN disclosed
EP-0316618-B1 Multilayer flat light sensitive registration material BASF AG (DE) 1994-08-17 EP disclosed
EP-0231002-B1 CROSSLINKABLE SOLID RUBBERY POLYMERS BASF Aktiengesellschaft (DE) 1992-08-12 EP disclosed
US-5055377-A LIGHT-SENSITIVE RECORDING ELEMENT AND PROCESS OF FORMING A RELIEF IMAGE WHEREIN THE RECORDING ELEMENT CONTAINS LECITHIN AS AN ADDITIVE BASF AKTIENGESELLSCHAFT (DE) 1991-10-08 US disclosed
US-5035981-A Having a top layer of high-strength, transparent, soluble or swellable polymer containing an antistatic agent of an ethoxylated amine or amide; exposure; development BASF AKTIENGESELLSCHAFT (DE) 1991-07-30 US disclosed
US-4946758-A RELIEF IMAGE FORMING LAYER; HIGH TENSILE STRENGTH POLYMER AND COVERING BASF AKTIENGESELLSCHAFT (DE) 1990-08-07 US disclosed
EP-0361173-A1 Light-sensitive recording material BASF Aktiengesellschaft (DE) 1990-04-04 EP disclosed
US-4900795-A PHOTOPOLMERIZABLE POLYMER COMPRISING ETHYLENE, (METH)ACRYLIC ACID AND VINYL OR ACRYLATE MONOMER NEUTRALIZED BY A CYCLIC AMINE OR HYDROXY-CONTAINING AMINE; PHOTORESISTS; PRINTING PLATES; OZONE RESISTANCE; ELONGATION; TENSILE STRENGTH BASF AKTIENGESELLSCHAFT (DE) 1990-02-13 US disclosed
EP-0316618-A2 Multilayer flat light sensitive registration material BASF Aktiengesellschaft (DE) 1989-05-24 EP disclosed
EP-0293750-A2 Polymer ammonium salts BASF Aktiengesellschaft (DE) 1988-12-07 EP disclosed
US-4762892-A ETHYLENE-ACRYLIC OR METHACRYLIC ACID-ALKYL ACRYLATE MODIFIED TO CONTAIN UNSATURATED SIDE CHAINS BASF AKTIENGESELLSCHAFT (DE) 1988-08-09 US disclosed
US-4094833-A Vinylic group containing dextran derivative gel in particle form for separation purposes PHARMACIA FINE CHEMICALS AB (SW) 1978-06-13 US disclosed
US-4094832-A Vinylic group containing dextran derivative gel for use in electrophoretic separation processes PHARMACIA FINE CHEMICALS AB (SW) 1978-06-13 US disclosed