Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.50 |
| ▸ | TP53 | P04637 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.50 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.48 |
| ▸ | RELA | Q04206 | 1/20 | 0.48 |
| ▸ | TUBB1 | Q9H4B7 | 2/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.47 |
| ▸ | CYP1A1 | P04798 | 3/20 | 0.47 |
| ▸ | CYP1B1 | Q16678 | 3/20 | 0.47 |
| ▸ | ESR1 | P03372 | 2/20 | 0.47 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.47 |
| ▸ | AHR | P35869 | 2/20 | 0.47 |
| ▸ | ABL1 | P00519 | 1/20 | 0.47 |
| ▸ | TTR | P02766 | 1/20 | 0.47 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.47 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.47 |
| ▸ | BCR | P11274 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5670358 | 0.79 | NPC1 (0.45) | LMNAKDM4ECYP3A4TP53TRPA1 | |
| SCHEMBL7770602 | 0.79 | NPC1 (0.45) | LMNAKDM4ECYP3A4TP53TRPA1 | |
| SCHEMBL5026274 | 0.76 | KDM4E (0.55) | LMNAKDM4ECYP3A4TP53TSHR | |
| SCHEMBL28662974 | 0.74 | KDM4E (0.64) | LMNAKDM4ECYP3A4TP53TSHR | |
| SCHEMBL7868088 | 0.74 | KDM4E (0.64) | LMNAKDM4ECYP3A4TP53TSHR | |
| SCHEMBL756486 | 0.74 | KDM4E (0.64) | LMNAKDM4ECYP3A4TP53TSHR | |
| SCHEMBL13790336 | 0.73 | RELA (0.81) | LMNAKDM4ECYP3A4TP53TSHR | |
| SCHEMBL4881152 | 0.73 | RELA (0.81) | LMNAKDM4ECYP3A4TP53TSHR | |
| SCHEMBL631998 | 0.73 | RELA (0.81) | LMNAKDM4ECYP3A4TP53TSHR | |
| SCHEMBL14950253 | 0.73 | RELA (0.81) | LMNAKDM4ECYP3A4TP53TSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2270596-B1 | Positive resist compostion and pattern forming process | SHINETSU CHEMICAL CO (JP) | 2018-07-25 | — | — | EP | disclosed |
| EP-2146247-B1 | Resist patterning process and manufacturing photo mask | SHINETSU CHEMICAL CO (JP) | 2015-04-15 | — | — | EP | disclosed |
| CN-101943864-B | Positive resist composition and patterning process | SHINETSU CHEMICAL CO | 2013-11-20 | — | — | CN | disclosed |
| CN-101625523-B | Resist patterning forming process and manufacturing method of photo mask | SHIN ETSU EHEMICAL CO LTD | 2012-09-19 | — | — | CN | disclosed |
| CN-101943864-A | Positive resist composition and patterning process | SHINETSU CHEMICAL CO | 2011-01-12 | — | — | CN | disclosed |
| EP-2270596-A2 | Positive resist compostion and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-01-05 | — | — | EP | disclosed |
| EP-2146247-A1 | Resist patterning process and manufacturing photo mask | Shin-Etsu Chemical Co., Ltd. (JP) | 2010-01-20 | — | — | EP | disclosed |
| CN-101625523-A | Resist patterning process and manufacturing photo mask | SHINETSU CHEMICAL CO | 2010-01-13 | — | — | CN | disclosed |
| US-20080020289-A1 | Novel polymer, positive resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-24 | — | — | US | disclosed |