Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PTGS1 | P23219 | 1/20 | 0.33 |
| ▸ | SLC7A11 | Q9UPY5 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | ENPEP | Q07075 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28890381 | 1.00 | PTGS1 (0.33) | PTGS1SLC7A11LMNAENPEP | |
| SCHEMBL28069051 | 0.76 | PTGS1 (0.31) | PTGS1SLC7A11 | |
| SCHEMBL3513292 | 0.75 | PTGS1 (0.40) | PTGS1SLC7A11LMNAENPEP | |
| SCHEMBL3513290 | 0.75 | PTGS1 (0.40) | PTGS1SLC7A11LMNAENPEP | |
| SCHEMBL31144831 | 0.74 | CPA1 (0.34) | — | |
| SCHEMBL515482 | 0.73 | LMNA (0.36) | LMNA | |
| SCHEMBL11053869 | 0.72 | CYP3A4 (0.33) | — | |
| SCHEMBL20788026 | 0.72 | GSR (0.44) | LMNA | |
| SCHEMBL20788027 | 0.72 | GSR (0.44) | LMNA | |
| SCHEMBL1054858 | 0.71 | KDM4E (0.40) | PTGS1SLC7A11ENPEP |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112639618-B | Negative photosensitive resin composition | 日产化学株式会社 | 2025-01-28 | — | — | CN | disclosed |
| CN-118192168-A | Photosensitive resin composition | 日产化学株式会社 | 2024-06-14 | — | — | CN | disclosed |
| CN-110537146-B | Photosensitive resin composition | 日产化学株式会社 | 2024-03-15 | — | — | CN | disclosed |
| CN-110573963-B | Photosensitive resin composition | 日产化学株式会社 | 2023-10-24 | — | — | CN | disclosed |
| CN-114245881-A | Photosensitive resin composition | 日产化学株式会社 | 2022-03-25 | — | — | CN | disclosed |
| CN-114174351-A | Resin composition | 日产化学株式会社 | 2022-03-11 | — | — | CN | disclosed |
| US-8968857-B2 | High hardness imprint material | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| US-20120148809-A1 | HIGH HARDNESS IMPRINT MATERIAL | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2012-06-14 | — | — | US | disclosed |