Acetic Acid Butyl Ester

Acetic Acid Butyl Ester

SCHEMBL9895720

C=CC.CCCCOC(C)=O.COCCO

nearest known ligand 0.60

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Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.60
TSHR P16473 6/20 0.49
HPGD P15428 1/20 0.49
ATM Q13315 1/20 0.43
HCAR2 Q8TDS4 1/20 0.39
ACHE P22303 7/20 0.38
MGLL Q99685 1/20 0.35
NAAA Q02083 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid Butyl Ester SCHEMBL15021138 0.91 ALDH1A1 (0.72) ALDH1A1TSHRHPGDATMHCAR2
Acetic Acid Butyl Ester SCHEMBL15023860 0.90 ALDH1A1 (0.69) ALDH1A1TSHRHPGDATMHCAR2
Acetic Acid Butyl Ester SCHEMBL4514617 0.90 ALDH1A1 (0.69) ALDH1A1TSHRHPGDATMHCAR2
2-Methoxyethanol SCHEMBL109126 0.86 TSHR (0.41) ALDH1A1TSHR
Acetic Acid Pentyl Ester SCHEMBL2917892 0.86 ALDH1A1 (0.63) ALDH1A1TSHRHCAR2ACHENAAA
Ethyl Acetate SCHEMBL106222 0.84 ALDH1A1 (0.52) ALDH1A1TSHRHPGDHCAR2
Acetic Acid Butyl Ester SCHEMBL895987 0.83 ALDH1A1 (0.60) ALDH1A1TSHRHPGDATMHCAR2
Acetic Acid Butyl Ester SCHEMBL487270 0.83 ALDH1A1 (0.60) ALDH1A1TSHRHPGDATMHCAR2
Acetic Acid Butyl Ester SCHEMBL282613 0.83 ALDH1A1 (0.60) ALDH1A1TSHRHPGDATMHCAR2
Acetic Acid Butyl Ester SCHEMBL20210843 0.83 ALDH1A1 (0.60) ALDH1A1TSHRHPGDATMHCAR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8999621-B2 Pattern forming method, chemical amplification resist composition and resist film FUJIFILM CORPORATION (JP) 2015-04-07 US disclosed
US-20120148957-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2012-06-14 US disclosed