Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.42 |
| ▸ | GAA | P10253 | 3/20 | 0.42 |
| ▸ | MEN1 | O00255 | 3/20 | 0.42 |
| ▸ | TUBB1 | Q9H4B7 | 3/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | TOP2A | P11388 | 2/20 | 0.41 |
| ▸ | POLB | P06746 | 2/20 | 0.41 |
| ▸ | TACR2 | P21452 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.39 |
| ▸ | MAPT | P10636 | 3/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 2/20 | 0.39 |
| ▸ | RAB9A | P51151 | 2/20 | 0.39 |
| ▸ | ABL1 | P00519 | 1/20 | 0.39 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.39 |
| ▸ | BCR | P11274 | 1/20 | 0.39 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.39 |
| ▸ | TUBB | P07437 | 1/20 | 0.39 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL990381 | 1.00 | KMT2A (0.42) | KMT2AKDM4EGAAMEN1TUBB1 | |
| SCHEMBL992272 | 0.94 | KMT2A (0.44) | KMT2AKDM4EGAAMEN1TUBB1 | |
| SCHEMBL990502 | 0.94 | KMT2A (0.44) | KMT2AKDM4EGAAMEN1TUBB1 | |
| SCHEMBL992271 | 0.94 | KMT2A (0.44) | KMT2AKDM4EGAAMEN1TUBB1 | |
| SCHEMBL990501 | 0.94 | KMT2A (0.44) | KMT2AKDM4EGAAMEN1TUBB1 | |
| SCHEMBL990313 | 0.94 | TUBB1 (0.47) | KMT2AGAAMEN1TUBB1LMNA | |
| SCHEMBL989615 | 0.94 | TUBB1 (0.47) | KMT2AKDM4EGAAMEN1TUBB1 | |
| SCHEMBL989614 | 0.94 | TUBB1 (0.47) | KMT2AKDM4EGAAMEN1TUBB1 | |
| SCHEMBL990314 | 0.94 | TUBB1 (0.47) | KMT2AGAAMEN1TUBB1LMNA | |
| SCHEMBL991223 | 0.90 | KDM4E (0.44) | KMT2AKDM4EGAAMEN1TUBB1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1687678-B1 | CHEMICALLY AMPLIFIED POSITIVE PHOTOSENSITIVE THERMOSETTING RESIN COMPOSITION, METHOD OF FORMING CURED ARTICLE AND USE OF THE METHOD FOR PRODUCING FUNCTIONAL DEVICE | TOKYO OHKA KOGYO CO LTD (JP) | 2013-07-31 | — | — | EP | disclosed |
| US-7871756-B2 | Chemically amplified positive photosensitive thermosetting resin composition, method of forming cured article, and method of producing functional device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-01-18 | — | — | US | disclosed |
| US-7816072-B2 | Positive resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-10-19 | — | — | US | disclosed |
| US-20090081590-A1 | NEGATIVE RESIST COMPOSITION AND PROCESS FOR FORMING RESIST PATTERNS | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-26 | — | — | US | disclosed |
| US-20090068594-A1 | POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-03-12 | — | — | US | disclosed |
| US-7358028-B2 | Chemically amplified positive photo resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-04-15 | — | — | US | disclosed |
| US-20080044764-A1 | Chemically Amplified Positive Photosensitive Thermosetting Resin Composition, Method Of Forming Cured Article, And Method Of Producing Functional Device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-02-21 | — | — | US | disclosed |
| US-7329478-B2 | Chemical amplified positive photo resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-02-12 | — | — | US | disclosed |
| US-20070117045-A1 | CHEMICAL AMPLIFICATION TYPE POSITIVE PHOTORESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-05-24 | — | — | US | disclosed |
| US-7105265-B2 | Method for removing resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-09-12 | — | — | US | disclosed |
| US-20060003260-A1 | Chemical amplified positive photo resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-01-05 | — | — | US | disclosed |
| US-20050244740-A1 | Chemically amplified positive photo resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-11-03 | — | — | US | disclosed |
| US-20050130055-A1 | Method and removing resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-06-16 | — | — | US | disclosed |