SCHEMBL9906840

SCHEMBL9906840

C=C(C)C(=O)OCCOC(=O)c1ccc(C(=O)c2ccc(C(=O)OCCOC(=O)C(=C)C)c(C)c2)cc1C

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HTT P42858 2/20 0.44
▸ POLB P06746 2/20 0.44
▸ APEX1 P27695 1/20 0.44
▸ TDP1 Q9NUW8 1/20 0.44
▸ THRB P10828 1/20 0.41
▸ CA1 P00915 4/20 0.41
▸ CA2 P00918 4/20 0.41
▸ SERPINE1 P05121 1/20 0.40
▸ ELANE P08246 1/20 0.39
▸ TSHR P16473 3/20 0.37
▸ SMN1; SMN2 Q16637 1/20 0.37
▸ LMNA P02545 1/20 0.37
▸ ESR1 P03372 2/20 0.36
▸ NPC1 O15118 1/20 0.36
▸ RAB9A P51151 1/20 0.36
▸ MEN1 O00255 1/20 0.35
▸ KMT2A Q03164 1/20 0.35
▸ ALDH1A1 P00352 1/20 0.35
▸ CA12 O43570 1/20 0.35
▸ CA7 P43166 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14262495 0.86 POLB (0.48) HTTPOLBAPEX1TDP1THRB
SCHEMBL16351917 0.85 TDP1 (0.41) HTTPOLBAPEX1TDP1THRB
SCHEMBL9906831 0.84 POLB (0.46) HTTPOLBAPEX1TDP1THRB
SCHEMBL14262496 0.84 POLB (0.46) HTTPOLBAPEX1TDP1THRB
SCHEMBL13400178 0.83 POLB (0.42) HTTPOLBAPEX1TDP1THRB
SCHEMBL930924 0.82 TSHR (0.46) HTTPOLBAPEX1TDP1THRB
SCHEMBL29757196 0.82 TSHR (0.46) HTTPOLBAPEX1TDP1THRB
SCHEMBL9906835 0.82 CA1 (0.39) HTTPOLBAPEX1TDP1THRB
SCHEMBL9622084 0.80 HTT (0.51) HTTPOLBAPEX1TDP1THRB
SCHEMBL14262486 0.80 TDP1 (0.57) HTTPOLBAPEX1TDP1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9023559-B2 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film CHEIL INDUSTRIES INC. (KR) 2015-05-05 — — US disclosed
US-20120171610-A1 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film CHEIL INDUSTRIES INC. (KR) 2012-07-05 — — US disclosed
US-8198002-B2 Positive photosensitive resin composition CHEIL INDUSTRIES INC. (KR) 2012-06-12 — — US disclosed
US-20100099043-A1 Positive Photosensitive Resin Composition CHEIL INDUSTRIES INC. 2010-04-22 — — US disclosed
Send feedback