SCHEMBL9906831

SCHEMBL9906831

C=C(C)C(=O)OCCOC(=O)c1ccc(Oc2ccc(C(=O)OCCOC(=O)C(=C)C)c(C)c2)cc1C

nearest known ligand 0.46

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ POLB P06746 2/20 0.46
▸ HTT P42858 2/20 0.46
▸ TDP1 Q9NUW8 2/20 0.46
▸ APEX1 P27695 1/20 0.46
▸ THRB P10828 1/20 0.41
▸ CA1 P00915 1/20 0.40
▸ CA2 P00918 1/20 0.40
▸ GSTP1 P09211 3/20 0.39
▸ SERPINE1 P05121 1/20 0.39
▸ L3MBTL1 Q9Y468 2/20 0.37
▸ MAPT P10636 1/20 0.37
▸ TSHR P16473 4/20 0.36
▸ ELANE P08246 1/20 0.35
▸ SRD5A2 P31213 1/20 0.35
▸ NPC1 O15118 1/20 0.35
▸ RAB9A P51151 1/20 0.35
▸ MEN1 O00255 1/20 0.34
▸ KMT2A Q03164 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19795529 0.85 TDP1 (0.48) POLBHTTTDP1APEX1THRB
SCHEMBL20061899 0.85 POLB (0.48) POLBHTTTDP1APEX1THRB
SCHEMBL9906840 0.84 HTT (0.44) POLBHTTTDP1APEX1THRB
SCHEMBL14502945 0.83 TDP1 (0.44) POLBHTTTDP1APEX1THRB
SCHEMBL20061898 0.83 TDP1 (0.46) POLBHTTTDP1APEX1THRB
SCHEMBL16351917 0.81 TDP1 (0.41) POLBHTTTDP1APEX1THRB
SCHEMBL9906835 0.81 CA1 (0.39) POLBHTTTDP1APEX1THRB
SCHEMBL21422382 0.81 TDP1 (0.55) POLBHTTTDP1APEX1THRB
SCHEMBL20115310 0.81 POLB (0.39) POLBHTTTDP1APEX1THRB
SCHEMBL10040690 0.78 THRB (0.53) POLBHTTTDP1APEX1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9023559-B2 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film CHEIL INDUSTRIES INC. (KR) 2015-05-05 — — US disclosed
US-20120171610-A1 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film CHEIL INDUSTRIES INC. (KR) 2012-07-05 — — US disclosed
US-8198002-B2 Positive photosensitive resin composition CHEIL INDUSTRIES INC. (KR) 2012-06-12 — — US disclosed
US-20100099043-A1 Positive Photosensitive Resin Composition CHEIL INDUSTRIES INC. 2010-04-22 — — US disclosed
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