SCHEMBL9906835

SCHEMBL9906835

C=C(C)C(=O)OCCOC(=O)c1ccc(S(=O)(=O)c2ccc(C(=O)OCCOC(=O)C(=C)C)c(C)c2)cc1C

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA1 P00915 3/20 0.39
▸ CA2 P00918 3/20 0.39
▸ THRB P10828 1/20 0.39
▸ POLB P06746 2/20 0.39
▸ APEX1 P27695 2/20 0.39
▸ HTT P42858 2/20 0.39
▸ TDP1 Q9NUW8 1/20 0.39
▸ CYP2D6 P10635 1/20 0.38
▸ CYP19A1 P11511 1/20 0.38
▸ CYP2C9 P11712 1/20 0.38
▸ CYP2C19 P33261 1/20 0.38
▸ GAA P10253 2/20 0.37
▸ SERPINE1 P05121 1/20 0.37
▸ TSHR P16473 4/20 0.35
▸ L3MBTL1 Q9Y468 3/20 0.34
▸ KDM4E B2RXH2 1/20 0.34
▸ LMNA P02545 1/20 0.34
▸ ALDH1A1 P00352 1/20 0.34
▸ CTDSP1 Q9GZU7 1/20 0.34
▸ KMT2A Q03164 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13132119 0.86 APEX1 (0.44) CA1CA2THRBPOLBAPEX1
SCHEMBL9906840 0.82 HTT (0.44) CA1CA2THRBPOLBAPEX1
SCHEMBL21422395 0.82 POLB (0.46) CA1CA2THRBPOLBAPEX1
SCHEMBL9906831 0.81 POLB (0.46) CA1CA2THRBPOLBAPEX1
SCHEMBL16351917 0.79 TDP1 (0.41) CA1CA2THRBPOLBAPEX1
SCHEMBL17736525 0.77 S1PR3 (0.45) CA1CA2THRBPOLBAPEX1
SCHEMBL1231509 0.77 THRB (0.41) CA1CA2THRBPOLBAPEX1
SCHEMBL10040690 0.76 THRB (0.53) CA1CA2THRBPOLBAPEX1
SCHEMBL930924 0.76 TSHR (0.46) CA1CA2THRBPOLBAPEX1
SCHEMBL29757196 0.76 TSHR (0.46) CA1CA2THRBPOLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9023559-B2 Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and semiconductor device including the photosensitive resin film CHEIL INDUSTRIES INC. (KR) 2015-05-05 — — US disclosed
US-20120171610-A1 Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Semiconductor Device Including the Photosensitive Resin Film CHEIL INDUSTRIES INC. (KR) 2012-07-05 — — US disclosed
US-8198002-B2 Positive photosensitive resin composition CHEIL INDUSTRIES INC. (KR) 2012-06-12 — — US disclosed
US-20100099043-A1 Positive Photosensitive Resin Composition CHEIL INDUSTRIES INC. 2010-04-22 — — US disclosed
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