Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | SIGMAR1 | Q99720 | 3/20 | 0.33 |
| ▸ | PDK1 | Q15118 | 1/20 | 0.33 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.33 |
| ▸ | PDK3 | Q15120 | 1/20 | 0.33 |
| ▸ | PDK4 | Q16654 | 1/20 | 0.33 |
| ▸ | THRA | P10827 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | ACHE | P22303 | 1/20 | 0.30 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.30 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.30 |
| ▸ | GRM3 | Q14832 | 1/20 | 0.30 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.30 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.30 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.30 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9908342 | 0.98 | CYP1A2 (0.36) | CYP1A2SIGMAR1PDK1PDK2PDK3 | |
| SCHEMBL9908336 | 0.93 | THRA (0.31) | CYP1A2THRATHRB | |
| SCHEMBL17070164 | 0.81 | CYP1A2 (0.39) | CYP1A2SIGMAR1PDK1PDK2PDK3 | |
| SCHEMBL16825252 | 0.80 | CYP1A2 (0.37) | CYP1A2SIGMAR1CHRM5GRM2GRM3 | |
| SCHEMBL13464765 | 0.80 | CYP1A2 (0.42) | CYP1A2SIGMAR1PDK1PDK2PDK3 | |
| SCHEMBL17070180 | 0.78 | CYP1A2 (0.36) | CYP1A2SIGMAR1PDK1PDK2PDK3 | |
| SCHEMBL91141 | 0.77 | PDK1 (0.39) | CYP1A2SIGMAR1PDK1PDK2PDK3 | |
| SCHEMBL692846 | 0.77 | CYP1A2 (0.33) | CYP1A2SIGMAR1 | |
| SCHEMBL1524628 | 0.76 | CYP1A2 (0.48) | CYP1A2SIGMAR1THRATHRBACHE | |
| SCHEMBL75027 | 0.76 | CYP1A2 (0.34) | CYP1A2SIGMAR1PDK1PDK2PDK3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8753802-B2 | Pattern forming method, chemical amplification resist composition and resist film | FUJIFILM CORPORATION (JP) | 2014-06-17 | — | — | US | disclosed |
| US-20130045365-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2013-02-21 | — | — | US | disclosed |
| US-8198016-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |
| US-7189493-B2 | Polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |