Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CHRNB2 | P17787 | 4/20 | 0.37 |
| ▸ | CHRNB4 | P30926 | 4/20 | 0.37 |
| ▸ | CHRNA3 | P32297 | 4/20 | 0.37 |
| ▸ | CHRNA7 | P36544 | 4/20 | 0.37 |
| ▸ | CHRNA4 | P43681 | 4/20 | 0.37 |
| ▸ | CHRNA1 | P02708 | 3/20 | 0.37 |
| ▸ | CHRNG | P07510 | 3/20 | 0.37 |
| ▸ | CHRNB1 | P11230 | 3/20 | 0.37 |
| ▸ | CHRND | Q07001 | 3/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | PKM | P14618 | 1/20 | 0.37 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | THPO | P40225 | 1/20 | 0.37 |
| ▸ | CHRNE | Q04844 | 1/20 | 0.37 |
| ▸ | CHRNA2 | Q15822 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9908350 | 0.82 | LMNA (0.31) | LMNA | |
| SCHEMBL14423156 | 0.78 | CHRNB2 (0.33) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 | |
| SCHEMBL11842095 | 0.78 | CHRNB2 (0.48) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 | |
| SCHEMBL9908369 | 0.70 | CHRNB2 (0.32) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 | |
| SCHEMBL24200566 | 0.65 | — | — | |
| SCHEMBL15003323 | 0.65 | — | — | |
| SCHEMBL4174626 | 0.65 | CHRNB2 (0.60) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 | |
| SCHEMBL15484142 | 0.65 | CHRNB2 (0.40) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 | |
| SCHEMBL13917617 | 0.63 | — | — | |
| SCHEMBL15660302 | 0.59 | CHRNB2 (0.40) | CHRNB2CHRNB4CHRNA3CHRNA7CHRNA4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9448482-B2 | Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-09-20 | — | — | US | disclosed |
| US-20150253673-A1 | PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-8198016-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |
| US-7511179-B2 | Fluorine-containing polymer, resist composition prepared from same and novel fluorine-containing monomer | DAIKIN INDUSTRIES, LTD. (JP) | 2009-03-31 | — | — | US | disclosed |
| US-20080026314-A1 | Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Composition | JSR CORPORATION (JP) | 2008-01-31 | — | — | US | disclosed |
| US-20070269735-A1 | Radiation-Sensitive Resin Composition | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |