Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.42 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 3/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 3/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | GFER | P55789 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | KCNQ3 | O43525 | 1/20 | 0.32 |
| ▸ | KCNQ2 | O43526 | 1/20 | 0.32 |
| ▸ | KCNQ4 | P56696 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10067078 | 0.91 | POLB (0.41) | POLBHSD11B1HPGDL3MBTL1EPHX2 | |
| SCHEMBL10172842 | 0.90 | POLB (0.40) | POLBHSD11B1HPGDL3MBTL1EPHX2 | |
| SCHEMBL18826804 | 0.85 | POLB (0.33) | POLB | |
| SCHEMBL12938399 | 0.84 | POLB (0.40) | POLBHSD11B1HPGDL3MBTL1EPHX2 | |
| SCHEMBL18775939 | 0.82 | POLB (0.42) | POLBHSD11B1HPGDL3MBTL1EPHX2 | |
| SCHEMBL9908386 | 0.80 | POLB (0.47) | POLBHSD11B1HPGDL3MBTL1EPHX2 | |
| SCHEMBL21853775 | 0.80 | POLB (0.47) | POLBHSD11B1HPGDL3MBTL1EPHX2 | |
| SCHEMBL18922923 | 0.79 | POLB (0.46) | POLBHSD11B1HPGDL3MBTL1EPHX2 | |
| SCHEMBL32688907 | 0.78 | POLB (0.45) | POLBHSD11B1HPGDL3MBTL1EPHX2 | |
| SCHEMBL12039740 | 0.76 | POLB (0.36) | POLBHSD11B1HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230140810-A1 | MATERIAL FOR FORMING ADHESIVE FILM, PATTERNING PROCESS, AND METHOD FOR FORMING ADHESIVE FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |
| US-20230140810-A1 | MATERIAL FOR FORMING ADHESIVE FILM, PATTERNING PROCESS, AND METHOD FOR FORMING ADHESIVE FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |
| US-20230059089-A1 | MATERIAL FOR FORMING ADHESIVE FILM, METHOD FOR FORMING ADHESIVE FILM USING THE SAME, AND PATTERNING PROCESS USING MATERIAL FOR FORMING ADHESIVE FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-02-23 | — | — | US | disclosed |
| EP-4116770-A1 | MATERIAL FOR FORMING ADHESIVE FILM, METHOD FOR FORMING ADHESIVE FILM USING THE SAME, AND PATTERNING PROCESS USING MATERIAL FOR FORMING ADHESIVE FILM | Shin-Etsu Chemical Co., Ltd. (JP) | 2023-01-11 | — | — | EP | disclosed |
| US-11366386-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-06-21 | — | — | US | disclosed |
| US-11231649-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-01-25 | — | — | US | disclosed |
| US-10844257-B2 | Adhesive composition, bio-electrode, and method for manufacturing a bio-electrode | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-11-24 | — | — | US | disclosed |
| US-10808148-B2 | Adhesive composition, bio-electrode, method for manufacturing a bio-electrode, and salt | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-10-20 | — | — | US | disclosed |
| US-20190354016-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-11-21 | — | — | US | disclosed |
| US-20190354017-A1 | PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-11-21 | — | — | US | disclosed |
| US-9200098-B2 | Radiation-sensitive composition and compound | JSR CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-9200098-B2 | Radiation-sensitive composition and compound | JSR CORPORATION (JP) | 2015-12-01 | — | — | US | disclosed |
| US-8900793-B2 | Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-12-02 | — | — | US | disclosed |
| US-8691490-B2 | Sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-04-08 | — | — | US | disclosed |
| US-8394570-B2 | Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-12 | — | — | US | disclosed |
| US-8394570-B2 | Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-12 | — | — | US | disclosed |
| US-20120308932-A1 | POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS USING SAID CHEMICALLY AMPLIFIED RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-12-06 | — | — | US | disclosed |
| US-20120164582-A1 | RADIATION-SENSITIVE COMPOSITION AND COMPOUND | JSR CORPORATION (JP) | 2012-06-28 | — | — | US | disclosed |
| US-20110189607-A1 | NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-04 | — | — | US | disclosed |
| US-20100143830-A1 | SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-06-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10808148-B2 | Adhesive composition, bio-electrode, method for manufacturing a bio-electrode, and salt | SLC9A1, FN1, EPCAM | POLB 3560/4885HSD11B1 2398/4885HPGD 3512/4885 |
| US-11366386-B2 | Patterning process | FEM1B, EGLN1, TET1 | POLB 1349/4885HSD11B1 1713/4885HPGD 2285/4885 |
| US-20110189607-A1 | NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | RPS4Y1, ETV6, RPS4X | POLB 1380/4885HSD11B1 2750/4885HPGD 4001/4885 |
| US-20190354017-A1 | PATTERNING PROCESS | FEM1B, EGLN1, TET1 | POLB 1349/4885HSD11B1 1713/4885HPGD 2285/4885 |
| US-20100143830-A1 | SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS | TYK2, VRK2, ARSA | POLB 1130/4885HSD11B1 2193/4885HPGD 4723/4885 |
| US-20120164582-A1 | RADIATION-SENSITIVE COMPOSITION AND COMPOUND | RAD51, RER1, ATP6AP1 | POLB 270/4885HSD11B1 2856/4885HPGD 1273/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.