Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | OPRK1 | P41145 | 6/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | PER2 | O15055 | 1/20 | 0.31 |
| ▸ | CRY1 | Q16526 | 1/20 | 0.31 |
| ▸ | CRY2 | Q49AN0 | 1/20 | 0.31 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7647876 | 0.81 | MEN1 (0.37) | MEN1NPC1RAB9AKMT2AOPRK1 | |
| SCHEMBL113192 | 0.79 | OPRK1 (0.40) | MEN1NPC1RAB9AKMT2AOPRK1 | |
| SCHEMBL3316247 | 0.76 | MEN1 (0.41) | MEN1NPC1RAB9AKMT2AOPRK1 | |
| SCHEMBL19746512 | 0.76 | MEN1 (0.41) | MEN1NPC1RAB9AKMT2AOPRK1 | |
| SCHEMBL25233759 | 0.75 | MEN1 (0.41) | MEN1NPC1RAB9AKMT2AOPRK1 | |
| SCHEMBL26935787 | 0.73 | OPRK1 (0.36) | MEN1NPC1RAB9AKMT2AOPRK1 | |
| SCHEMBL9908423 | 0.72 | MEN1 (0.39) | MEN1NPC1RAB9AKMT2AOPRK1 | |
| SCHEMBL9908396 | 0.71 | MEN1 (0.38) | MEN1NPC1RAB9AKMT2AOPRK1 | |
| SCHEMBL19604523 | 0.71 | — | — | |
| SCHEMBL3332075 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9448482-B2 | Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-09-20 | — | — | US | disclosed |
| US-20150253673-A1 | PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-8198016-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-06-12 | — | — | US | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |