SCHEMBL9908451

SCHEMBL9908451

CCO[Si](CCc1ccc(O)cc1)(OCC)OCC

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 1/20 0.48
ESR1 P03372 5/20 0.48
ESR2 Q92731 2/20 0.48
KDM4E B2RXH2 4/20 0.46
ALDH1A1 P00352 4/20 0.46
ADRA2A P08913 3/20 0.46
SLC6A2 P23975 3/20 0.46
ADORA3 P0DMS8 2/20 0.46
TACR2 P21452 2/20 0.46
SLC6A4 P31645 2/20 0.46
SLC6A3 Q01959 2/20 0.46
LMNA P02545 1/20 0.46
SHBG P04278 1/20 0.46
TP53 P04637 1/20 0.46
CYP3A4 P08684 1/20 0.46
HSPD1 P10809 1/20 0.46
ADRB3 P13945 1/20 0.46
HTR2C P28335 1/20 0.46
HSPE1 P61604 1/20 0.46
HIF1A Q16665 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL167111 0.90 CYP4F2 (0.37) CA2ESR1KDM4EALDH1A1ADRA2A
SCHEMBL16669329 0.89 ESR1 (0.52) CA2ESR1ESR2KDM4EALDH1A1
SCHEMBL16669200 0.85 ESR1 (0.47) CA2ESR1ESR2KDM4EALDH1A1
SCHEMBL27094921 0.84 HRH3 (0.39) ALDH1A1HSD17B10L3MBTL1KMT2A
SCHEMBL27812330 0.83 CA2 (0.47) CA2ESR1ESR2KDM4EALDH1A1
SCHEMBL12458731 0.82 CYP4F2 (0.33) TAAR1
SCHEMBL3397084 0.82 CYP1A2 (0.43) ALDH1A1TAAR1KMT2AIDO1
SCHEMBL16669256 0.82 ESR1 (0.53) CA2ESR1ESR2KDM4EALDH1A1
SCHEMBL27832610 0.81 CA2 (0.45) CA2ESR1ESR2KDM4EALDH1A1
SCHEMBL27832595 0.81 CA2 (0.45) CA2ESR1ESR2KDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121609722-A P-hydroxyphenylethyl triethoxysilane, and preparation method and application thereof 山东阳谷华泰化工股份有限公司 2026-03-06 CN disclosed
US-20250199402-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT OF THE SAME, AND DISPLAY DEVICE INCLUDING THE SAME TORAY INDUSTRIES, INC. (JP) 2025-06-19 US disclosed
CN-113260922-B Positive photosensitive resin composition 株式会社东进世美肯 2025-02-25 CN disclosed
CN-118679429-A Positive photosensitive resin composition, cured product thereof, and display device comprising same 东丽株式会社 2024-09-20 CN disclosed
CN-113260922-A Positive photosensitive resin composition 株式会社东进世美肯 2021-08-13 CN disclosed
CN-105759568-B Positive photosensitive siloxane resin composition and display device formed using the same 三星显示有限公司 2021-03-19 CN disclosed
US-10431753-B2 Substrate for display, color filter using the same and method for the production thereof, organic EL element and method for the production thereof, and flexible organic EL display TORAY INDUSTRIES, INC. (JP) 2019-10-01 US disclosed
EP-3040370-B1 POSITIVE PHOTOSENSITIVE SILOXANE RESIN COMPOSITION AND DISPLAY DEVICE FORMED USING THE SAME SAMSUNG DISPLAY CO LTD (KR) 2019-02-06 EP disclosed
US-9857682-B2 Positive photosensitive siloxane resin composition and display device formed using the same SAMSUNG DISPLAY CO., LTD. (KR) 2018-01-02 US disclosed
US-20170309844-A1 SUBSTRATE FOR DISPLAY, COLOR FILTER USING THE SAME AND METHOD FOR THE PRODUCTION THEREOF, ORGANIC EL ELEMENT AND METHOD FOR THE PRODUCTION THEREOF, AND FLEXIBLE ORGANIC EL DISPLAY (AS AMENDED) TORAY INDUSTRIES, INC. (JP) 2017-10-26 US disclosed
CN-104903091-A SUBSTRATE AND TOUCH PANEL MEMBER USING SAME TORAY INDUSTRIES 2015-09-09 CN disclosed
US-20150125680-A1 SUBSTRATE AND TOUCH PANEL MEMBER USING SAME TORAY INDUSTRIES, INC. (JP) 2015-05-07 US disclosed
US-20150116234-A1 RESIN COMPOSITION, AND TRANSPARENT MEMBRANE FOR TOUCH PANEL SENSORS AND TOUCH PANEL USING SAME DNP FINE CHEMICALS CO., LTD. (JP) 2015-04-30 US disclosed
EP-2853386-A1 SUBSTRATE AND TOUCH PANEL MEMBER USING SAME Toray Industries, Inc. (JP) 2015-04-01 EP disclosed
CN-104271345-A Substrate and touch panel member using same TORAY INDUSTRIES 2015-01-07 CN disclosed
CN-104204010-A Resin composition, transparent film for touch panel sensor using same, and touch panel DNP FINE CHEMICALS CO LTD 2014-12-10 CN disclosed
CN-102112922-B Positive photosensitive composition and permanent resist ADEKA CORP 2012-12-26 CN disclosed
US-8198016-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-12 US disclosed
CN-102112922-A Positive photosensitive composition and permanent resist ADEKA CORP 2011-06-29 CN disclosed
US-20090286188-A1 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-11-19 US disclosed