SCHEMBL991080

SCHEMBL991080

CCCc1cccc(C(=O)O)c1

nearest known ligand 0.61

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
FOLH1 Q04609 2/20 0.61
MRGPRX4 Q96LA9 4/20 0.55
TP53 P04637 2/20 0.55
PKM P14618 2/20 0.55
NFKB1 P19838 2/20 0.55
NFKB2 Q00653 2/20 0.55
RELA Q04206 2/20 0.55
SMN1; SMN2 Q16637 2/20 0.55
KAT6A Q92794 1/20 0.55
KMT2A Q03164 1/20 0.53
RAB9A P51151 1/20 0.51
RXFP1 Q9HBX9 1/20 0.51
HTT P42858 1/20 0.51
CYP2D6 P10635 1/20 0.50
CYP2C9 P11712 1/20 0.50
HIF1A Q16665 1/20 0.50
ANPEP P15144 1/20 0.50
ENPEP Q07075 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30354557 1.00 FOLH1 (0.61) FOLH1MRGPRX4TP53PKMNFKB1
SCHEMBL849666 0.90 BCL2 (0.59) FOLH1MRGPRX4
SCHEMBL3387825 0.89 FOLH1 (0.58) FOLH1MRGPRX4TP53PKMNFKB1
SCHEMBL31124111 0.89 FOLH1 (0.58) FOLH1MRGPRX4TP53PKMNFKB1
SCHEMBL371526 0.88 FOLH1 (0.70) FOLH1MRGPRX4KMT2ACYP2D6CYP2C9
SCHEMBL443913 0.87 RARB (0.58) FOLH1KMT2A
SCHEMBL11752450 0.86 KAT6A (0.52) FOLH1KAT6A
SCHEMBL15766204 0.86 RARB (0.59) KMT2A
SCHEMBL1876486 0.86 RARB (0.59) KMT2A
SCHEMBL15174619 0.86 RARB (0.59) KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 304 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114302906-B Polyamide and corresponding polymer compositions, articles, and methods for making and using 索尔维特殊聚合物美国有限责任公司 2024-03-08 CN claimed
CN-113825784-B Polyamide and corresponding polymer composition and article 索尔维特殊聚合物美国有限责任公司 2024-03-01 CN claimed
CN-116670212-A Polyamide composition 索尔维特殊聚合物美国有限责任公司 2023-08-29 CN claimed
CN-114302906-A Polyamide and corresponding polymer composition, article and methods for making and using 索尔维特殊聚合物美国有限责任公司 2022-04-08 CN claimed
CN-110088167-B Glycolic acid polymers 索尔维公司 2022-02-08 CN claimed
CN-113825784-A Polyamide and corresponding polymer composition and article 索尔维特殊聚合物美国有限责任公司 2021-12-21 CN claimed
CN-113045753-A Copolymerized polyamide material and application and composition thereof 宁波七诺新材料科技有限公司 2021-06-29 CN claimed
CN-104177520-B It is used to prepare the ingredient of solid catalyst of olefin polymer 中国石油化工股份有限公司 2018-06-12 CN claimed
CN-105431471-A Polyamides comprising ME-BHT, compositions comprising such a polyamide, shaped articles comprising such a polyamide or such a composition RHODIA OPERATIONS 2016-03-23 CN claimed
CN-101827880-B Precursor for heat-resistant resin and photosensitive resin composition containing the same ASAHI KASEI E MATERIALS CORP 2013-08-21 CN claimed
WO-2011000464-A2 CONTINUOUS METHOD FOR PRODUCING ESTERS OF AROMATIC CARBOXYLIC ACIDS CLARIANT INTERNATIONAL LTD (CH) 2011-01-06 WO claimed
EP-1913448-B1 PHOTORESIST STRIPPER COMPOSITION FOR SEMICONDUCTOR MANUFACTURING TECHNO SEMICHEM CO LTD (KR) 2010-10-13 EP claimed
US-20100081843-A1 Method For Producing Tertiary Amides Of Alkylphenyl Carboxylic Acids Clariant Finacne (BVI) LImited 2010-04-01 US claimed
US-20090312216-A1 Photoresist Stripper Composition for Semiconductor Manufacturing TECHNO SEMICHEM CO., LTD. (KR) 2009-12-17 US claimed
EP-2079679-A1 METHOD FOR PRODUCING TERTIARY AMIDES OF ALKYLPHENYL CARBOXYLIC ACIDS Clariant Finance (BVI) Limited (VG) 2009-07-22 EP claimed
CN-101371199-A Photoresist stripper composition for semiconductor manufacturing TECHNO SEMICHEM CO LTD (KR) 2009-02-18 CN claimed
EP-1913448-A4 PHOTORESIST STRIPPER COMPOSITION FOR SEMICONDUCTOR MANUFACTURING TECHNO SEMICHEM CO LTD (KR) 2008-11-05 EP claimed
EP-1913448-A1 PHOTORESIST STRIPPER COMPOSITION FOR SEMICONDUCTOR MANUFACTURING Techno Semichem Co., Ltd. (KR) 2008-04-23 EP claimed
WO-2008043494-A1 METHOD FOR PRODUCING TERTIARY AMIDES OF ALKYLPHENYL CARBOXYLIC ACIDS CLARIANT FINANCE (BVI) LIMITED (VG) 2008-04-17 WO claimed
WO-2007021085-A1 PHOTORESIST STRIPPER COMPOSITION FOR SEMICONDUCTOR MANUFACTURING TECHNO SEMICHEM CO., LTD. (KR) 2007-02-22 WO claimed