SCHEMBL9911235

SCHEMBL9911235

COC(=O)Cc1ccc(C)cc1CC(=O)OC

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSP90AB1 P08238 1/20 0.44
HPGD P15428 3/20 0.43
ALDH1A1 P00352 5/20 0.42
KDM4E B2RXH2 3/20 0.42
GLA P06280 2/20 0.42
SRC P12931 1/20 0.42
MAPT P10636 2/20 0.42
HSD17B10 Q99714 2/20 0.42
CYP4F2 P78329 1/20 0.42
CYP4A11 Q02928 1/20 0.42
LMNA P02545 1/20 0.41
HTT P42858 1/20 0.41
KMT2A Q03164 1/20 0.41
GAA P10253 2/20 0.41
GFER P55789 1/20 0.41
EGFR P00533 1/20 0.41
PDGFRB P09619 1/20 0.41
FGFR1 P11362 1/20 0.41
PDGFRA P16234 1/20 0.41
FLT1 P17948 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1476379 0.93 HSP90AB1 (0.42) HSP90AB1HPGDALDH1A1KDM4EGLA
SCHEMBL14400443 0.91 CYP4F2 (0.42) HSP90AB1HPGDALDH1A1KDM4EGLA
SCHEMBL19540833 0.88 HMGCR (0.40) HSP90AB1HPGDALDH1A1KDM4EGLA
SCHEMBL12650135 0.87 NPC1 (0.45) HSP90AB1HPGDALDH1A1KDM4EGLA
SCHEMBL10015983 0.87 NPC1 (0.45) HSP90AB1HPGDALDH1A1KDM4EGLA
SCHEMBL12646581 0.85 EGFR (0.56) HSP90AB1HPGDALDH1A1KDM4EGLA
SCHEMBL6477480 0.84 HSP90AB1 (0.41) HSP90AB1HPGDALDH1A1KDM4EGLA
SCHEMBL9610136 0.84 ALDH1A1 (0.42) HSP90AB1HPGDALDH1A1KDM4EGLA
SCHEMBL13949103 0.84 P2RX7 (0.45) HSP90AB1HPGDALDH1A1KDM4EGLA
SCHEMBL16397084 0.84 ALDH1A1 (0.49) HSP90AB1HPGDALDH1A1KDM4EGLA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8197051-B2 Ink jet recording ink set and ink jet image recording method FUJIFILM CORPORATION (JP) 2012-06-12 US disclosed
EP-1760770-B1 Complex oxide laminate, method of manufacturing complex oxide laminate, and device SEIKO EPSON CORP (JP) 2010-10-13 EP disclosed
US-7731933-B2 Insulating target material, method of manufacturing insulating target material, insulating complex oxide film, and device SEIKO EPSON CORPORATION (JP) 2010-06-08 US disclosed
US-7713348-B2 Precursor composition, method of manufacturing precursor composition, inkjet coating ink, method of manufacturing ferroelectric film, piezoelectric device, semiconductor device, piezoelectric actuator, inkjet recording head, and inkjet printer SEIKO EPSON CORPORATION (JP) 2010-05-11 US disclosed
US-7601387-B2 Piezoelectric film laminate and method of manufacturing the same SEIKO EPSON CORPORATION (JP) 2009-10-13 US disclosed
US-20090073246-A1 Ink Jet Recording Ink Set and Ink Jet Image Recording Method FUJIFILM CORPORATION (JP) 2009-03-19 US disclosed
EP-1708289-B1 Piezoelectric film laminate and method of manufacturing the same, surface acoustic wave device, frequency filter, oscillator, electronic circuit, and electronic instrument SEIKO EPSON CORP (JP) 2008-07-16 EP disclosed
US-20070119343-A1 Complex metal oxide raw material composition SEIKO EPSON CORPORATION (JP) 2007-05-31 US disclosed
EP-1790622-A1 Complex metal oxide raw material composition SEIKO EPSON CORPORATION (JP) 2007-05-30 EP disclosed
EP-1760768-A1 Insulating target material, method of manufacturing insulating target material, insulating complex oxide film, and devide Seiko Epson Corporation (JP) 2007-03-07 EP disclosed
US-20070045109-A1 Insulating target material, method of manufacturing insulating target material, insulating complex oxide film, and device SEIKO EPSON CORPORATION 2007-03-01 US disclosed