⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12764311 | 0.80 | — | — | |
| SCHEMBL9915946 | 0.79 | — | — | |
| SCHEMBL12015369 | 0.77 | L3MBTL1 (0.31) | — | |
| SCHEMBL12764317 | 0.77 | MEN1 (0.33) | — | |
| SCHEMBL12764322 | 0.75 | — | — | |
| SCHEMBL9915938 | 0.74 | KMT2A (0.37) | — | |
| SCHEMBL9917061 | 0.74 | — | — | |
| SCHEMBL9916042 | 0.73 | RIPK1 (0.38) | — | |
| SCHEMBL9916044 | 0.73 | ACE (0.31) | — | |
| SCHEMBL9917057 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9268226-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-23 | — | — | US | disclosed |
| US-9268226-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-23 | — | — | US | disclosed |
| US-8859183-B2 | N-acyl-β-lactam derivative, macromolecular compound, and photoresist composition | KURARAY CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8859183-B2 | N-acyl-β-lactam derivative, macromolecular compound, and photoresist composition | KURARAY CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8753794-B2 | N-acyl-β-lactam derivative, macromolecular compound, and photoresist composition | KURARAY CO., LTD. (JP) | 2014-06-17 | — | — | US | disclosed |
| US-8753794-B2 | N-acyl-β-lactam derivative, macromolecular compound, and photoresist composition | KURARAY CO., LTD. (JP) | 2014-06-17 | — | — | US | disclosed |
| US-20140038106-A1 | N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2014-02-06 | — | — | US | disclosed |
| US-20140038105-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-02-06 | — | — | US | disclosed |
| US-20140038105-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-02-06 | — | — | US | disclosed |
| US-20140038106-A1 | N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2014-02-06 | — | — | US | disclosed |
| US-20120148954-A1 | N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20120148954-A1 | N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20110053082-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-03 | — | — | US | disclosed |