SCHEMBL992397

SCHEMBL992397

Cc1cc(C(C)(CC(C)C)c2cc(C)c(O)c(C)c2)cc(C)c1O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.47
ESR2 Q92731 2/20 0.47
CA2 P00918 2/20 0.41
CA1 P00915 1/20 0.41
CYP2C9 P11712 4/20 0.36
CYP1A2 P05177 3/20 0.36
CYP2C19 P33261 2/20 0.36
PTGS1 P23219 5/20 0.34
PTGS2 P35354 5/20 0.34
TSHR P16473 1/20 0.33
HIF1A Q16665 1/20 0.33
HSD17B10 Q99714 1/20 0.33
AR P10275 1/20 0.31
ALDH1A1 P00352 2/20 0.31
POLB P06746 1/20 0.31
TYR P14679 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
CYP2D6 P10635 2/20 0.31
ALOX5 P09917 2/20 0.31
RORC P51449 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12951349 0.83 HSD17B10 (0.39) ESR1ESR2CYP2C9CYP1A2TSHR
SCHEMBL8908701 0.80 ESR1 (0.44) ESR1ESR2CA2CA1CYP2C9
SCHEMBL31666450 0.79 ESR1 (0.57) ESR1ESR2HSD17B10ARALDH1A1
SCHEMBL30708954 0.79 ESR1 (0.57) ESR1ESR2HSD17B10ARALDH1A1
SCHEMBL10051854 0.79 KLF10 (0.42) CYP2C9CYP1A2CYP2C19TSHRHIF1A
SCHEMBL311579 0.79 ESR1 (0.57) ESR1ESR2HSD17B10ARALDH1A1
SCHEMBL673998 0.78 ESR1 (0.54) ESR1ESR2CA2CA1CYP2C9
SCHEMBL7972245 0.78 ESR1 (0.54) ESR1ESR2CA2CA1CYP2C9
SCHEMBL11485491 0.76 ESR1 (0.40) ESR1ESR2CA2CA1CYP2C9
SCHEMBL226013 0.76 ESR1 (0.64) ESR1ESR2CA2CA1CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250034327-A1 POLYESTER RESIN AND MOLDED PRODUCT INCLUDING THE SAME FUJIFILM CORPORATION (JP) 2025-01-30 US disclosed
WO-2023166948-A1 (METH)ACRYLATE-TERMINATED POLYPHENYLENE ETHER OLIGOMER, AND RESIN COMPOSITION, VARNISH, PREPREG, AND CURED PRODUCT CONTAINING SAME 本州化学工業株式会社 2023-09-07 WO disclosed
US-20150175858-A1 ADHESIVE, AND TRANSPARENT SUBSTRATE USING SAME NITTO DENKO CORPORATION (JP) 2015-06-25 US disclosed
US-20150140343-A1 ADHESIVE, AND TRANSPARENT SUBSTRATE USING SAME NITTO DENKO CORPORATION (JP) 2015-05-21 US disclosed
EP-2857473-A1 ADHESIVE, AND TRANSPARENT SUBSTRATE USING SAME Nitto Denko Corporation (JP) 2015-04-08 EP disclosed
EP-2857474-A1 ADHESIVE, AND TRANSPARENT SUBSTRATE USING SAME Nitto Denko Corporation (JP) 2015-04-08 EP disclosed
US-8741399-B2 Birefringent film, polarizing plate, image display, and aromatic polyester NITTO DENKO CORPORATION (JP) 2014-06-03 US disclosed
US-8593599-B2 Liquid crystal panel and liquid crystal display NITTO DENKO CORPORATION (JP) 2013-11-26 US disclosed
US-8568893-B2 Birefringent film and polarizer NITTO DENKO CORPORATION (JP) 2013-10-29 US disclosed
US-8518552-B2 Optical film and method for production thereof NITTO DENKO CORPORATION (JP) 2013-08-27 US disclosed
US-20120282397-A1 OPTICAL FILM AND METHOD FOR PRODUCTION THEREOF NITTO DENKO CORPORATION (JP) 2012-11-08 US disclosed
US-7999059-B2 Optical film and method for production thereof NITTO DENKO CORPORATION (JP) 2011-08-16 US disclosed
US-20110176092-A1 LIQUID CRYSTAL PANEL AND LIQUID CRYSTAL DISPLAY NITTO DENKO CORPORATION (JP) 2011-07-21 US disclosed
US-20110064930-A1 OPTICAL FILM AND METHOD FOR PRODUCTION THEREOF NITTO DENKO CORPORATION (JP) 2011-03-17 US disclosed
US-20110013278-A1 BIREFRINGENT FILM, POLARIZING PLATE, IMAGE DISPLAY, AND AROMATIC POLYESTER NITTO DENKO CORPORATION (JP) 2011-01-20 US disclosed
US-20100328772-A1 BIREFRINGENT FILM AND POLARIZER NITTO DENKO CORPORATION (JP) 2010-12-30 US disclosed
US-20100265579-A1 OPTICAL FILM AND METHOD FOR PRODUCTION THEREOF NITTO DENKO CORPORATION (JP) 2010-10-21 US disclosed
US-20100188749-A1 OPTICAL FILM AND METHOD FOR PRODUCTION THEREOF NITTO DENKO CORPORATION (JP) 2010-07-29 US disclosed
US-7229753-B2 Photothermographic material and method for forming images FUJIFILM CORPORATION (JP) 2007-06-12 US disclosed
US-RE31165-E Transparent moulding composition of a polycarbonate and a resin BAYER AKTIENGESELLSCHAFT (DE) 1983-03-01 US disclosed