Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14142378 | 0.87 | TSHR (0.33) | TSHRTDP1 | |
| SCHEMBL20628816 | 0.86 | — | — | |
| SCHEMBL5570795 | 0.79 | — | — | |
| SCHEMBL19831468 | 0.76 | — | — | |
| SCHEMBL9930151 | 0.73 | FDPS (0.31) | — | |
| SCHEMBL19432675 | 0.73 | — | — | |
| SCHEMBL14008416 | 0.71 | — | — | |
| SCHEMBL2237355 | 0.69 | TSHR (0.43) | TSHRTDP1 | |
| SCHEMBL7778099 | 0.69 | — | — | |
| SCHEMBL4444057 | 0.67 | ALDH1A1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12312569-B2 | Kit for cleaning agent and method for preparing cleaning agent | FUJIFILM CORPORATION (JP) | 2025-05-27 | — | — | US | disclosed |
| US-11385548-B2 | Process liquid and method of processing substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-07-12 | — | — | US | disclosed |
| US-20210395645-A1 | CLEANING LIQUID | FUJIFILM ELECTRONIC MATERIALS CO., LTD. (JP) | 2021-12-23 | — | — | US | disclosed |
| US-20210317391-A1 | KIT FOR CLEANING AGENT AND METHOD FOR PREPARING CLEANING AGENT | FUJIFILM ELECTRONIC MATERIALS CO., LTD. (JP) | 2021-10-14 | — | — | US | disclosed |
| US-20200241424-A1 | PROCESS LIQUID AND METHOD OF PROCESSING SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-07-30 | — | — | US | disclosed |
| WO-2020137359-A1 | KIT FOR CLEANING AGENT AND METHOD FOR PREPARING CLEANING AGENT | 富士フイルムエレクトロニクスマテリアルズ株式会社 | 2020-07-02 | — | — | WO | disclosed |
| US-9862914-B2 | Cleaning agent for semiconductor substrates and method for processing semiconductor substrate surface | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2018-01-09 | — | — | US | disclosed |
| EP-3051577-B1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | WAKO PURE CHEM IND LTD (JP) | 2017-10-18 | — | — | EP | disclosed |
| US-20160272924-A1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2016-09-22 | — | — | US | disclosed |
| EP-3051577-A1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | Wako Pure Chemical Industries, Ltd. (JP) | 2016-08-03 | — | — | EP | disclosed |
| EP-2474862-B1 | COMPOSITION FOR REMOVING A RESIST ON A SEMICONDUCTOR SUBSTRATE AND METHOD FOR REMOVING RESIST USING THE COMPOSITION | WAKO PURE CHEM IND LTD (JP) | 2015-02-25 | — | — | EP | disclosed |
| EP-2647693-A1 | SUBSTRATE CLEANER FOR COPPER WIRING, AND METHOD FOR CLEANING COPPER WIRING SEMICONDUCTOR SUBSTRATE | Wako Pure Chemical Industries, Ltd. (JP) | 2013-10-09 | — | — | EP | disclosed |
| US-20130261040-A1 | SUBSTRATE CLEANER FOR COPPER WIRING, AND METHOD FOR CLEANING COPPER WIRING SEMICONDUCTOR SUBSTRATE | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2013-10-03 | — | — | US | disclosed |
| EP-2475000-A1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | Wako Pure Chemical Industries, Ltd. (JP) | 2012-07-11 | — | — | EP | disclosed |
| EP-2474862-A1 | RESIST REMOVER COMPOSITION AND METHOD FOR REMOVING RESIST USING THE COMPOSITION | Wako Pure Chemical Industries, Ltd. (JP) | 2012-07-11 | — | — | EP | disclosed |
| US-20120172274-A1 | RESIST REMOVER COMPOSITION AND METHOD FOR REMOVING RESIST USING THE COMPOSITION | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-07-05 | — | — | US | disclosed |
| US-20120157368-A1 | PROCESSING AGENT COMPOSITION FOR SEMICONDUCTOR SURFACE AND METHOD FOR PROCESSING SEMICONDUCTOR SURFACE USING SAME | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2012-06-21 | — | — | US | disclosed |
| EP-0122935-A1 | METHOD FOR PREPARING ORGANIC HYPONITRITES | BOARD OF CONTROL OF MICHIGAN TECHNOLOGICAL UNIVERSITY (US) | 1984-10-31 | — | — | EP | disclosed |
| US-4460513-A | REACTING ALKALI METAL, ALKALINE EARTH, OR AMMONIUM SALTS OF HYPONITRITE WITH A TERTIARY ORGANIC HALIDE | BOARD OF CONTROL OF MICHIGAN TECHNOLOGICAL UNIVERSITY (US) | 1984-07-17 | — | — | US | disclosed |
| WO-1984001770-A1 | METHOD FOR PREPARING ORGANIC HYPONITRITES | UNIV MICHIGAN TECH (US) | 1984-05-10 | — | — | WO | disclosed |