SCHEMBL9930840

SCHEMBL9930840

O=C(Cl)c1ccc2c3cccc4cc5ccccc5c(c5cccc1c25)c43

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 5/20 0.49
ERBB2 P04626 1/20 0.49
FYN P06241 1/20 0.49
MAOA P21397 1/20 0.49
ACHE P22303 1/20 0.49
AHR P35869 1/20 0.49
ALDH1A1 P00352 6/20 0.39
HPGD P15428 5/20 0.39
KMT2A Q03164 5/20 0.39
HSD17B10 Q99714 4/20 0.39
MEN1 O00255 4/20 0.39
KDM4E B2RXH2 3/20 0.39
GLA P06280 2/20 0.39
CYP2C19 P33261 2/20 0.39
GAA P10253 1/20 0.38
L3MBTL1 Q9Y468 2/20 0.37
PTK2B Q14289 1/20 0.37
CYP2D6 P10635 2/20 0.37
POLB P06746 1/20 0.37
CES1 P23141 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3951847 0.86 NR4A1 (0.51) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL29820418 0.82 ALDH1A1 (0.40) CYP1A2ALDH1A1HPGDKMT2AHSD17B10
SCHEMBL8901363 0.82 ALDH1A1 (0.40) CYP1A2ALDH1A1HPGDKMT2AHSD17B10
SCHEMBL3036869 0.77 ALDH1A1 (0.57) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL31139592 0.77 ALDH1A1 (0.57) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL4510652 0.76 CYP1A2 (0.64) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL29037340 0.76 CYP1A2 (0.56) CYP1A2ERBB2FYNMAOAACHE
SCHEMBL14003696 0.74 ESR2 (0.38) CYP1A2ALDH1A1HPGDKMT2AHSD17B10
SCHEMBL6069647 0.74 KMT2A (0.43) CYP1A2ALDH1A1HPGDKMT2AHSD17B10
SCHEMBL466256 0.74 CYP1A2 (0.69) CYP1A2ERBB2FYNMAOAACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9018776-B2 Hardmask composition including aromatic ring-containing compound, method of forming patterns, and semiconductor integrated circuit device including the patterns CHEIL INDUSTRIES, INC. (KR) 2015-04-28 US disclosed
US-20120153511-A1 HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS CHEIL INDUSTRIES, INC. (KR) 2012-06-21 US disclosed