SCHEMBL9944372

SCHEMBL9944372

Cc1ccc(C(=O)OC(C)C)c2cccnc12

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 7/20 0.52
KMT2A Q03164 2/20 0.48
MEN1 O00255 1/20 0.48
SMN1; SMN2 Q16637 1/20 0.48
KDM4A O75164 2/20 0.43
KDM4C Q9H3R0 2/20 0.43
L3MBTL1 Q9Y468 2/20 0.43
KDM6B O15054 1/20 0.43
KDM6A O15550 1/20 0.43
TET3 O43151 1/20 0.43
KDM4B O94953 1/20 0.43
KDM5C P41229 1/20 0.43
KDM4D Q6B0I6 1/20 0.43
TET2 Q6N021 1/20 0.43
ALKBH5 Q6P6C2 1/20 0.43
TET1 Q8NFU7 1/20 0.43
FTO Q9C0B1 1/20 0.43
EGLN1 Q9GZT9 1/20 0.43
KDM2A Q9Y2K7 1/20 0.43
KDM3A Q9Y4C1 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6018142 0.84 KDM4E (0.73) KDM4EKMT2AMEN1SMN1; SMN2KDM4A
SCHEMBL11912045 0.82 MEN1 (0.51) KDM4EKMT2AMEN1SMN1; SMN2KDM4A
SCHEMBL9944371 0.81 KDM4E (0.53) KDM4EKMT2ASMN1; SMN2KDM4AKDM4C
SCHEMBL23714061 0.81 KDM4E (0.56) KDM4EKMT2AMEN1SMN1; SMN2KDM4A
SCHEMBL3901228 0.79 KDM4E (0.68) KDM4EKMT2AMEN1SMN1; SMN2KDM4A
SCHEMBL9944363 0.78 PDE4A (0.51) KDM4EKMT2AMEN1SMN1; SMN2HTT
SCHEMBL7982959 0.77 MEN1 (0.50) KDM4EKMT2AMEN1SMN1; SMN2KDM4A
SCHEMBL9944369 0.77 NSD2 (0.48) KDM4EKMT2AMEN1L3MBTL1HTT
SCHEMBL3079961 0.76 KDM4E (0.57) KDM4EKMT2AMEN1SMN1; SMN2L3MBTL1
SCHEMBL9944379 0.75 P2RX7 (0.56) KDM4EKMT2AMEN1SMN1; SMN2L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8846291-B2 Resist composition, method of forming resist pattern, and new compound TOKYO OHKA KOGYO CO. LTD. (JP) 2014-09-30 US disclosed
US-20120148955-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 2012-06-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120148955-A1 RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND C1R, SLC11A2, RER1 KDM4E 4730/4885KMT2A 3398/4885MEN1 225/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.