SCHEMBL9945808

SCHEMBL9945808

CCC(F)(F)C1CC2CCC1C2

nearest known ligand 0.31

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 2/20 0.31
HPGD P15428 1/20 0.31
BRS3 P32247 1/20 0.30
HSD11B1 P28845 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12039534 0.80
SCHEMBL27433178 0.77 EPHX2 (0.32) EPHX2HPGDHSD11B1
SCHEMBL3435218 0.76 CYP19A1 (0.32)
SCHEMBL12971937 0.75 CYP19A1 (0.36) EPHX2HPGDHSD11B1
SCHEMBL4741902 0.75 CYP19A1 (0.33) EPHX2
SCHEMBL14707479 0.74 CYP19A1 (0.31)
SCHEMBL12972013 0.73 CYP19A1 (0.35) EPHX2HPGDBRS3HSD11B1
SCHEMBL15521102 0.73 PANK3 (0.34) EPHX2HPGDBRS3HSD11B1
SCHEMBL6853761 0.73 CYP19A1 (0.31)
SCHEMBL17070182 0.72 CYP19A1 (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8999621-B2 Pattern forming method, chemical amplification resist composition and resist film FUJIFILM CORPORATION (JP) 2015-04-07 US disclosed
US-20120148957-A1 PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM FUJIFILM CORPORATION (JP) 2012-06-14 US disclosed