⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4951917 | 0.84 | — | — | |
| SCHEMBL9949054 | 0.84 | CA1 (0.59) | — | |
| SCHEMBL14192214 | 0.81 | KDM4E (0.45) | — | |
| SCHEMBL6009315 | 0.80 | — | — | |
| SCHEMBL6009330 | 0.79 | ALDH1A1 (0.49) | — | |
| SCHEMBL16221632 | 0.78 | QPCT (0.43) | — | |
| SCHEMBL18665154 | 0.78 | — | — | |
| SCHEMBL20017637 | 0.78 | — | — | |
| SCHEMBL10942127 | 0.78 | — | — | |
| SCHEMBL11817859 | 0.78 | EPHX1 (0.48) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2481834-B1 | Method for removing impurities from plating solution | ROHM & HAAS ELECT MAT (US) | 2017-06-28 | — | — | EP | disclosed |
| EP-2570514-B1 | Method of removing impurities from plating liquid | ROHM & HAAS ELECT MAT (US) | 2017-06-14 | — | — | EP | disclosed |
| EP-2471977-B1 | Method for removing impurities from plating solution | ROHM & HAAS ELECT MAT (US) | 2017-01-25 | — | — | EP | disclosed |
| CN-102560570-B | From plating solution, go deimpurity method | ROHM AND HAAS ELECTRONIC MATERIALS CO., LTD. (US) | 2016-05-04 | — | — | CN | disclosed |
| CN-102534701-B | Deimpurity method is gone from plating solution | ROHM AND HAAS ELECTRONIC MATERIALS CO., LTD. (US) | 2016-01-13 | — | — | CN | disclosed |
| CN-102994985-B | Method of removing impurities from plating liquid | ROHM & HAAS ELECT MAT | 2015-06-17 | — | — | CN | disclosed |
| US-20140083322-A1 | METHOD OF REMOVING IMPURITIES FROM PLATING LIQUID | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-03-27 | — | — | US | disclosed |
| CN-102994985-A | Method of removing impurities from plating liquid | ROHM & HAAS ELECT MAT | 2013-03-27 | — | — | CN | disclosed |
| EP-2570514-A1 | Method of removing impurities from plating liquid | Rohm and Haas Electronic Materials LLC (US) | 2013-03-20 | — | — | EP | disclosed |
| EP-2481834-A1 | Method for removing impurities from plating solution | Rohm and Haas Electronic Materials LLC (US) | 2012-08-01 | — | — | EP | disclosed |
| CN-102560570-A | Method for removing impurities from plating solution | ROHM & HAAS ELECT MAT | 2012-07-11 | — | — | CN | disclosed |
| EP-2471977-A2 | Method for removing impurities from plating solution | Rohm and Haas Electronic Materials LLC (US) | 2012-07-04 | — | — | EP | disclosed |
| CN-102534701-A | Method for removing impurities from plating solution | ROHM & HAAS ELECT MAT | 2012-07-04 | — | — | CN | disclosed |
| US-20120164342-A1 | METHOD FOR REMOVING IMPURITIES FROM PLATING SOLUTION | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-06-28 | — | — | US | disclosed |
| US-20120164341-A1 | METHOD FOR REMOVING IMPURITIES FROM PLATING SOLUTIONS | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2012-06-28 | — | — | US | disclosed |