SCHEMBL9951569

SCHEMBL9951569

Cc1ccccc1C(C)c1ccc(-c2ccccc2OC(=O)Oc2ccccc2-c2ccc(C(C)c3ccccc3C)cc2)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.38
AKR1C2 P52895 1/20 0.38
MAPT P10636 3/20 0.37
LMNA P02545 2/20 0.37
MAPK1 P28482 2/20 0.37
USP2 O75604 1/20 0.37
HTT P42858 1/20 0.37
PDE10A Q9Y233 2/20 0.37
ALDH1A1 P00352 4/20 0.35
CTSA P10619 1/20 0.35
HPGD P15428 2/20 0.35
FABP3 P05413 2/20 0.35
FABP7 O15540 1/20 0.35
FABP5 Q01469 1/20 0.35
XBP1 P17861 1/20 0.35
KDM4E B2RXH2 3/20 0.34
L3MBTL1 Q9Y468 2/20 0.34
PPARA Q07869 2/20 0.34
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL237463 0.81 HPGD (0.50) MAPTLMNAMAPK1USP2HTT
SCHEMBL19470214 0.78 PPARA (0.42) MAPTCTSAPPARAPPARG
SCHEMBL23003831 0.77 ACACB (0.40) MAPTLMNAUSP2ALDH1A1HPGD
SCHEMBL1836909 0.76 KDM4E (0.50) MAPTLMNAMAPK1HTTALDH1A1
SCHEMBL7602708 0.75 HPGD (0.51) MAPTLMNAMAPK1USP2HTT
SCHEMBL12506262 0.73 ESR1 (0.50) LMNAALDH1A1
SCHEMBL17703419 0.73 L3MBTL1 (0.46) MAPTLMNAMAPK1HTTALDH1A1
SCHEMBL1837254 0.73 POLB (0.47) MAPTLMNAMAPK1HTTALDH1A1
SCHEMBL236822 0.72 FABP3 (0.53) LMNAMAPK1HTTALDH1A1HPGD
SCHEMBL237313 0.72 AKR1C3 (0.42) AKR1C3AKR1C2LMNAALDH1A1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3707198-A1 PLASTIC FILMS WITH REDUCED UV ACTIVITY Covestro Deutschland AG (DE) 2020-09-16 EP disclosed
EP-2970096-A2 PROCESS FOR PURIFICATION OF DIPHENYL CARBONATE FOR THE MANUFACTURING OF HIGH QUALITY POLYCARBONATE SABIC Global Technologies B.V. (NL) 2016-01-20 EP disclosed
EP-2820071-A1 PROCESS FOR THE PRODUCTION OF LOW STRESS AND OPTICAL QUALITY FILM FOR USE IN OPTO-ELECTRONIC DEVICES Bayer Intellectual Property GmbH (DE) 2015-01-07 EP disclosed
WO-2014141107-A2 PROCESS FOR PURIFICATION OF DIPHENYL CARBONATE FOR THE MANUFACTURING OF HIGH QUALITY POLYCARBONATE SABIC INNOVATIVE PLASTICS IP B.V. (NL) 2014-09-18 WO disclosed
WO-2014141108-A1 PRODUCTION OF A POLYCARBONATE WITH LIMITED METAL RESIDUALS SABIC INNOVATIVE PLASTICS IP B.V. (NL) 2014-09-18 WO disclosed
EP-2655384-A2 OLIGOMERIC PHOSPHONATES AND COMPOSITIONS INCLUDING THE SAME FRX Polymers, Inc. (US) 2013-10-30 EP disclosed
EP-2655383-A2 HYPERBRANCHED OLIGOMERIC PHOSPHONATES AND COMPOSITIONS INCLUDING THE SAME FRX Polymers, Inc. (US) 2013-10-30 EP disclosed
WO-2013127851-A1 PROCESS FOR THE PRODUCTION OF LOW STRESS AND OPTICAL QUALITY FILM FOR USE IN OPTO-ELECTRONIC DEVICES BAYER MATERIALSCIENCE AG (DE) 2013-09-06 WO disclosed
WO-2012088406-A2 OLIGOMERIC PHOSPHONATES AND COMPOSITIONS INCLUDING THE SAME FRX POLYMERS, INC. (US) 2012-06-28 WO disclosed
WO-2012088435-A2 HYPERBRANCHED OLIGOMERIC PHOSPHONATES AND COMPOSITIONS INCLUDING THE SAME FRX POLYMERS, INC. (US) 2012-06-28 WO disclosed