SCHEMBL9951573

SCHEMBL9951573

CC(Cc1ccccc1)c1ccc(-c2ccccc2OC(=O)O)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARA Q07869 10/20 0.49
PPARG P37231 7/20 0.49
USP2 O75604 1/20 0.42
LMNA P02545 1/20 0.42
MAPT P10636 1/20 0.42
MAPK1 P28482 1/20 0.42
HTT P42858 1/20 0.42
MME P08473 2/20 0.41
MMEL1 Q495T6 1/20 0.41
ESR1 P03372 1/20 0.41
ESR2 Q92731 1/20 0.41
PTGER1 P34995 1/20 0.40
PTGER4 P35408 1/20 0.40
PTGER3 P43115 1/20 0.40
PTGER2 P43116 1/20 0.40
TDP1 Q9NUW8 1/20 0.39
KDM4E B2RXH2 2/20 0.39
ALDH1A1 P00352 2/20 0.39
ITGA4 P13612 1/20 0.39
ITGB7 P26010 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL237801 0.85 PPARA (0.49) PPARAPPARGUSP2LMNAMAPT
SCHEMBL237464 0.83 HPGD (0.49) PPARAPPARGUSP2LMNAMAPT
SCHEMBL238517 0.77 FAAH (0.47) PPARAPPARGLMNAMAPTHTT
SCHEMBL19470216 0.76 ACACB (0.49) PPARAPPARGESR1ESR2PKM
SCHEMBL236823 0.76 FABP3 (0.53) LMNAMAPK1HTTTDP1KDM4E
SCHEMBL8986479 0.76 FABP3 (0.53) USP2LMNAMAPTMAPK1HTT
SCHEMBL1639323 0.75 FABP3 (0.56) USP2LMNAMAPTMAPK1HTT
SCHEMBL30563023 0.75 FABP3 (0.56) USP2LMNAMAPTMAPK1HTT
SCHEMBL6447567 0.75 LMNA (0.55) LMNAMAPTMAPK1HTTTDP1
SCHEMBL238575 0.74 SLC13A5 (0.48) PPARAPPARGLMNAHTTTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3707198-A1 PLASTIC FILMS WITH REDUCED UV ACTIVITY Covestro Deutschland AG (DE) 2020-09-16 EP disclosed
CN-105637012-B Polysiloxane-polycarbonate block cocondensation 科思创德国股份有限公司 2019-03-08 CN disclosed
EP-2970096-A2 PROCESS FOR PURIFICATION OF DIPHENYL CARBONATE FOR THE MANUFACTURING OF HIGH QUALITY POLYCARBONATE SABIC Global Technologies B.V. (NL) 2016-01-20 EP disclosed
EP-2820071-A1 PROCESS FOR THE PRODUCTION OF LOW STRESS AND OPTICAL QUALITY FILM FOR USE IN OPTO-ELECTRONIC DEVICES Bayer Intellectual Property GmbH (DE) 2015-01-07 EP disclosed
WO-2014141108-A1 PRODUCTION OF A POLYCARBONATE WITH LIMITED METAL RESIDUALS SABIC INNOVATIVE PLASTICS IP B.V. (NL) 2014-09-18 WO disclosed
WO-2014141107-A2 PROCESS FOR PURIFICATION OF DIPHENYL CARBONATE FOR THE MANUFACTURING OF HIGH QUALITY POLYCARBONATE SABIC INNOVATIVE PLASTICS IP B.V. (NL) 2014-09-18 WO disclosed
EP-2655383-A2 HYPERBRANCHED OLIGOMERIC PHOSPHONATES AND COMPOSITIONS INCLUDING THE SAME FRX Polymers, Inc. (US) 2013-10-30 EP disclosed
EP-2655384-A2 OLIGOMERIC PHOSPHONATES AND COMPOSITIONS INCLUDING THE SAME FRX Polymers, Inc. (US) 2013-10-30 EP disclosed
WO-2013127851-A1 PROCESS FOR THE PRODUCTION OF LOW STRESS AND OPTICAL QUALITY FILM FOR USE IN OPTO-ELECTRONIC DEVICES BAYER MATERIALSCIENCE AG (DE) 2013-09-06 WO disclosed
WO-2012088406-A2 OLIGOMERIC PHOSPHONATES AND COMPOSITIONS INCLUDING THE SAME FRX POLYMERS, INC. (US) 2012-06-28 WO disclosed
WO-2012088435-A2 HYPERBRANCHED OLIGOMERIC PHOSPHONATES AND COMPOSITIONS INCLUDING THE SAME FRX POLYMERS, INC. (US) 2012-06-28 WO disclosed