Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | CASP1 | P29466 | 1/20 | 0.32 |
| ▸ | MAPK14 | Q16539 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 2/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | GLA | P06280 | 1/20 | 0.31 |
| ▸ | HPGD | P15428 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | PPARG | P37231 | 2/20 | 0.30 |
| ▸ | PPARA | Q07869 | 2/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8926701 | 0.89 | — | — | |
| SCHEMBL997810 | 0.88 | SMN1; SMN2 (0.35) | POLBCYP2C9MAPK14ALDH1A1TDP1 | |
| SCHEMBL28062585 | 0.86 | NPC1 (0.32) | NPC1POLBCYP2C9RAB9AMAPK14 | |
| SCHEMBL995221 | 0.84 | — | — | |
| Pyrophosphoric Acid SCHEMBL11219971 | 0.80 | ACP3 (0.32) | CYP2C9MAPK14MEN1ALDH1A1KMT2A | |
| SCHEMBL28827517 | 0.74 | MEN1 (0.32) | CYP2C9MAPK14MEN1ALDH1A1KMT2A | |
| SCHEMBL11219967 | 0.72 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL996121 | 0.72 | CYP3A4 (0.31) | — | |
| SCHEMBL999178 | 0.72 | ALDH1A1 (0.35) | POLBCYP2C9ALDH1A1TDP1 | |
| SCHEMBL11123759 | 0.72 | PPARG (0.41) | NPC1RAB9AMAPTMEN1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 80 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3604447-B1 | POLYAMIDE COMPOSITION AND MOLDED ARTICLE | ASAHI CHEMICAL IND (JP) | 2023-08-16 | — | — | EP | disclosed |
| WO-2023120457-A1 | POLYAMIDE COMPOSITION | 株式会社クラレ | 2023-06-29 | — | — | WO | disclosed |
| CN-110527289-B | Polyamide resin pellet, process for producing the same, and process for producing polyamide composition | 旭化成株式会社 | 2022-08-26 | — | — | CN | disclosed |
| CN-114773841-A | Polyamide composition and molded article | 旭化成株式会社 | 2022-07-22 | — | — | CN | disclosed |
| CN-112708269-B | Halogen-free flame-retardant reinforced semi-aromatic polyamide molding composition with specific glass fiber length and molded product | 金发科技股份有限公司 | 2022-07-08 | — | — | CN | disclosed |
| CN-110506079-B | Polyamide composition and molded article | 旭化成株式会社 | 2022-03-22 | — | — | CN | disclosed |
| CN-114133559-A | Process for preparing semiaromatic polyamides with reduced salt formation cycle, semiaromatic polyamides and moulding compositions | 山东广垠新材料有限公司 | 2022-03-04 | — | — | CN | disclosed |
| CN-114133560-A | Process for preparing semiaromatic polyamides with improved impact strength, semiaromatic polyamides and moulding compositions | 山东广垠新材料有限公司 | 2022-03-04 | — | — | CN | disclosed |
| CN-114058008-A | Process for preparing semi-aromatic polyamides end-capped with monocarboxylic acids, semi-aromatic polyamides and molding compositions | 山东广垠新材料有限公司 | 2022-02-18 | — | — | CN | disclosed |
| CN-114058009-A | Process for preparing semi-aromatic polyamides with reduced loss of diamine monomer, semi-aromatic polyamides and molding compositions | 山东广垠新材料有限公司 | 2022-02-18 | — | — | CN | disclosed |
| US-20080199793-A1 | Electrophotographic photoreceptor having excellent electrical properties and image quality and their high stabilities and electrophotographic imaging apparatus employing the same | SAMSUNG ELECTRONICS CO., LTD | 2008-08-21 | — | — | US | disclosed |
| US-20070026327-A1 | Electrophotographic photoreceptor for preventing image deterioration from repeated use and electrophotographic image forming apparatus employing the photoreceptor | SAMSUNG ELECTRONICS CO., LTD. | 2007-02-01 | — | — | US | disclosed |
| US-6265472-B1 | BLEND CONTAINING COPPER PHTHALOCYANINE | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 2001-07-24 | — | — | US | disclosed |
| US-5286588-A | Includes a hydroquinone compound having at least one group which contains four or more carbon atoms | RICOH COMPANY, LTD. (JP) | 1994-02-15 | — | — | US | disclosed |
| US-4888371-A | HEAT RESISTANCE, LIGHT RESISTANCE | ADEKA ARGUS CHEMICAL CO., LTD. (JP) | 1989-12-19 | — | — | US | disclosed |
| EP-0255097-A2 | Process for improving resistance to deterioration when exposed to sterilizing radiation of polyolefin resins | ADEKA ARGUS CHEMICAL CO., Ltd. (JP) | 1988-02-03 | — | — | EP | disclosed |
| EP-0143464-B1 | PENTAERYTHRITOL-SPIRO-BIS-PHOSPHITE COMPOSITIONS HAVING IMPROVED HYDROLYTIC STABILITY | Argus Chemical Corporation (US) | 1987-07-08 | — | — | EP | disclosed |
| EP-0143464-A2 | Pentaerythritol-spiro-bis-phosphite compositions having improved hydrolytic stability | Argus Chemical Corporation (US) | 1985-06-05 | — | — | EP | disclosed |
| US-4371647-A | 2,6-Di-tertiary butyl phenyl pentaerythritol spiro bis-phosphites enhancing the stability to heat and light of synthetic resin | ADEKA ARGUS CHEMICAL CO. LTD. (JP) | 1983-02-01 | — | — | US | disclosed |
| EP-0038876-A1 | 2,6-Di-tertiary butyl phenyl pentaerythritol spiro bis-phosphites enhancing the stability to heat and light of synthetic resins, stabilizer compositions comprising phenolic antioxidants and such phosphites, and synthetic resin compositions containing the same | ADEKA ARGUS CHEMICAL CO., Ltd. (JP) | 1981-11-04 | — | — | EP | disclosed |