SCHEMBL9973365

SCHEMBL9973365

CCC(C)C(=O)Oc1c(F)c(F)c(F)c(F)c1F

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.40
PKM P14618 1/20 0.40
MAPT P10636 2/20 0.33
RAB9A P51151 2/20 0.32
TP53 P04637 2/20 0.32
HSD17B10 Q99714 2/20 0.32
NPC1 O15118 1/20 0.32
MITF O75030 1/20 0.32
RECQL P46063 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32
GAA P10253 1/20 0.32
MTOR P42345 1/20 0.32
FFAR1 O14842 1/20 0.31
LMNA P02545 2/20 0.31
MAPK1 P28482 2/20 0.31
KMT2A Q03164 2/20 0.31
MEN1 O00255 1/20 0.31
KDM4E B2RXH2 1/20 0.31
HTT P42858 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17452121 0.87 SMN1; SMN2 (0.42) SMN1; SMN2PKMMAPTTP53FFAR1
SCHEMBL19484370 0.85 MAPT (0.41) SMN1; SMN2PKMMAPTHSD17B10MAPK1
SCHEMBL682996 0.84 PKM (0.30) SMN1; SMN2PKM
SCHEMBL19105220 0.81 PKM (0.37) SMN1; SMN2PKMMAPTRAB9AGAA
SCHEMBL19105450 0.80 PKM (0.38) SMN1; SMN2PKMMAPTRAB9AGAA
SCHEMBL27944432 0.80 PKM (0.35) PKMMAPTRAB9AHSD17B10GAA
SCHEMBL15907912 0.79 PKM (0.30) SMN1; SMN2PKM
SCHEMBL10197497 0.79 GABRR1 (0.45) SMN1; SMN2PKM
SCHEMBL28063036 0.78 CA1 (0.46) MAPTFFAR1
SCHEMBL11915792 0.78 ELANE (0.42) SMN1; SMN2PKMGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230246226-A1 INORGANIC SOLID ELECTROLYTE-CONTAINING COMPOSITION, SHEET FOR ALL-SOLID STATE SECONDARY BATTERY, AND ALL-SOLID STATE SECONDARY BATTERY, AND MANUFACTURING METHODS FOR SHEET FOR ALL-SOLID STATE SECONDARY BATTERY AND ALL-SOLID STATE SECONDARY BATTERY FUJIFILM CORPORATION (JP) 2023-08-03 US disclosed
EP-3147334-B1 SURFACE TREATMENT LIQUID TOKYO OHKA KOGYO CO LTD (JP) 2021-03-31 EP disclosed
US-20170129970-A1 IMPROVED POPPET FOR CRYOGENIC FLUID COUPLING JC CARTER LLC (US) 2017-05-11 US disclosed
US-20170088683-A1 SURFACE TREATMENT LIQUID TOKYO OHKA KOGYO CO., LTD. (JP) 2017-03-30 US disclosed
EP-3147334-A1 SURFACE TREATMENT LIQUID TOKYO OHKA KOGYO CO., LTD. (JP) 2017-03-29 EP disclosed
EP-3070110-A1 POLYMERS HAVING ORTHOGONAL REACTIVE GROUPS AND USES THEREOF NVS Technologies Inc. (US) 2016-09-21 EP disclosed
US-9429840-B2 Pattern forming method, composition used therein, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2016-08-30 US disclosed
US-20160178816-A1 NEAR-INFRARED-ABSORBING COMPOSITION, NEAR-INFRARED CUT FILTER OBTAINED USING SAME, PROCESS FOR PRODUCING SAID CUT FILTER, CAMERA MODULE AND PROCESS FOR PRODUCING SAME, AND SOLID PHOTOGRAPHING ELEMENT FUJIFILM CORPORATION (JP) 2016-06-23 US disclosed
US-20160178816-A1 NEAR-INFRARED-ABSORBING COMPOSITION, NEAR-INFRARED CUT FILTER OBTAINED USING SAME, PROCESS FOR PRODUCING SAID CUT FILTER, CAMERA MODULE AND PROCESS FOR PRODUCING SAME, AND SOLID PHOTOGRAPHING ELEMENT FUJIFILM CORPORATION (JP) 2016-06-23 US disclosed
US-9316908-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, photomask blank and method of forming pattern FUJIFILM CORPORATION (JP) 2016-04-19 US disclosed
US-20150118627-A1 PATTERN FORMING METHOD, COMPOSITION USED TEHREIN, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-04-30 US disclosed
US-20140370425-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, PHOTOMASK BLANK AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2014-12-18 US disclosed
US-20140349223-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-OR RADIATION-SENSITIVE FILM THEREFROM, METHOD OF FORMING PATTERN, PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE AND COMPOUND FUJIFILM CORPORATION (JP) 2014-11-27 US disclosed
US-20140227637-A1 PATTERN FORMING METHOD, MULTI-LAYERED RESIST PATTERN, MULTI-LAYERED FILM FOR ORGANIC SOLVENT DEVELOPMENT, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2014-08-14 US disclosed
US-20140213641-A1 POLYMERIC NANOPARTICLES FOR DRUG DELIVERY INSTITUT QUIMIC DE SARRIA (ES) 2014-07-31 US disclosed
US-20120156617-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-06-21 US disclosed
US-20110014570-A1 RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2011-01-20 US disclosed
US-20100183980-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2010-07-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170129970-A1 IMPROVED POPPET FOR CRYOGENIC FLUID COUPLING PHOSPHO1, PCMT1, PARG SMN1; SMN2 2594/4885PKM 311/4885MAPT 10/4885
US-20140213641-A1 POLYMERIC NANOPARTICLES FOR DRUG DELIVERY CD44, MKI67, CD63 SMN1; SMN2 2318/4885PKM 3251/4885MAPT 2749/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.