Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9973365 | 0.84 | SMN1; SMN2 (0.40) | PKMSMN1; SMN2 | |
| SCHEMBL23228270 | 0.83 | FABP3 (0.35) | SMN1; SMN2 | |
| SCHEMBL19700522 | 0.78 | ELANE (0.40) | — | |
| SCHEMBL17452121 | 0.77 | SMN1; SMN2 (0.42) | PKMSMN1; SMN2 | |
| SCHEMBL19484370 | 0.75 | MAPT (0.41) | PKMSMN1; SMN2 | |
| SCHEMBL16865900 | 0.74 | ALDH1A1 (0.32) | — | |
| SCHEMBL10180501 | 0.74 | CA1 (0.35) | PKMSMN1; SMN2 | |
| SCHEMBL15294914 | 0.73 | ALDH1A1 (0.38) | SMN1; SMN2 | |
| SCHEMBL6124939 | 0.73 | POLB (0.34) | PKM | |
| SCHEMBL27435323 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| US-8895222-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-11-25 | — | — | US | disclosed |
| US-20120006788-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20100248149-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |