Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 1/20 | 0.33 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18674553 | 0.96 | CYP4F2 (0.31) | CYP4F2CYP4A11 | |
| SCHEMBL18674549 | 0.96 | CYP4F2 (0.31) | CYP4F2CYP4A11 | |
| SCHEMBL2607790 | 0.89 | — | — | |
| SCHEMBL800518 | 0.86 | CYP4F2 (0.35) | CYP4F2CYP4A11HTT | |
| SCHEMBL2607807 | 0.86 | — | — | |
| SCHEMBL18119972 | 0.86 | CYP4F2 (0.31) | CYP4F2CYP4A11 | |
| SCHEMBL17736198 | 0.85 | THRB (0.36) | — | |
| SCHEMBL106916 | 0.84 | HTT (0.45) | CYP4F2CYP4A11HTT | |
| SCHEMBL17552830 | 0.84 | CYP4F2 (0.35) | CYP4F2CYP4A11HTT | |
| SCHEMBL12939330 | 0.84 | CYP4F2 (0.32) | CYP4F2CYP4A11HTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240231231-A1 | METHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION, AND RESIST UNDERLAYER FILM | JSR CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-8795944-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8771916-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-07-08 | — | — | US | disclosed |
| US-20120156617-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-06-21 | — | — | US | disclosed |
| US-20110318687-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110236828-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-09-29 | — | — | US | disclosed |