Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | RECQL | P46063 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | ATM | Q13315 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13088042 | 1.00 | KDM4E (0.31) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL19719271 | 1.00 | KDM4E (0.31) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL22840948 | 1.00 | KDM4E (0.31) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL47307 | 1.00 | KDM4E (0.31) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL15166539 | 1.00 | KDM4E (0.31) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL14121550 | 0.91 | — | — | |
| SCHEMBL74605 | 0.89 | KDM4E (0.30) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL19050201 | 0.89 | KDM4E (0.30) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL16905096 | 0.89 | — | — | |
| SCHEMBL16605692 | 0.88 | ALDH1A1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160274464-A1 | METHOD OF RECOVERING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-09-22 | — | — | US | disclosed |
| US-20160109801-A1 | UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2016-04-21 | — | — | US | disclosed |
| US-20150370170-A1 | PATTERN FORMING METHOD, ELECTRON BEAM- OR EXTREME ULTRAVIOLET-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-12-24 | — | — | US | disclosed |
| US-9034559-B2 | Pattern-forming method, and radiation-sensitive composition | JSR CORPORATION (JP) | 2015-05-19 | — | — | US | disclosed |
| US-20130230804-A1 | PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2013-09-05 | — | — | US | disclosed |
| US-8232041-B2 | Positive resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-07-31 | — | — | US | disclosed |
| US-8202678-B2 | Wet developable bottom antireflective coating composition and method for use thereof | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-06-19 | — | — | US | disclosed |
| US-20100209848-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-08-19 | — | — | US | disclosed |
| US-20090291392-A1 | WET DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITION AND METHOD FOR USE THEREOF | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-11-26 | — | — | US | disclosed |
| US-7452655-B2 | Acrylic copolymer and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-11-18 | — | — | US | disclosed |