Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSPD1 | P10809 | 1/20 | 0.32 |
| ▸ | BLM | P54132 | 1/20 | 0.32 |
| ▸ | HSPE1 | P61604 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12044154 | 0.83 | — | — | |
| SCHEMBL12784233 | 0.81 | HSPD1 (0.33) | HSPD1BLMHSPE1 | |
| SCHEMBL17469430 | 0.75 | CHRM1 (0.35) | HSPD1BLMHSPE1 | |
| SCHEMBL363488 | 0.75 | HTT (0.31) | — | |
| SCHEMBL2035661 | 0.75 | CHRM1 (0.35) | HSPD1BLMHSPE1 | |
| SCHEMBL7638052 | 0.73 | CHRM1 (0.33) | HSPD1BLMHSPE1 | |
| Hydrochloric Acid SCHEMBL28492070 | 0.73 | CHRM1 (0.33) | HSPD1BLMHSPE1 | |
| SCHEMBL9362444 | 0.71 | — | — | |
| SCHEMBL826185 | 0.71 | CHRM1 (0.48) | HSPD1BLMHSPE1 | |
| SCHEMBL28985420 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20130009323-A1 | INTERCONNECT STRUCTURE AND METHOD OF FABRICATING | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-01-10 | — | — | US | disclosed |
| US-20120301980-A1 | METHODOLOGY FOR EVALUATION OF ELECTRICAL CHARACTERISTICS OF CARBON NANOTUBES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-29 | — | — | US | disclosed |
| US-20120252204-A1 | PATTERNABLE LOW-K DIELECTRIC INTERCONNECT STRUCTURE WITH A GRADED CAP LAYER AND METHOD OF FABRICATION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-10-04 | — | — | US | disclosed |
| US-20120161296-A1 | MULTIPLE PATTERNING USING IMPROVED PATTERNABLE LOW-k DIELECTRIC MATERIALS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-06-28 | — | — | US | disclosed |
| US-8202783-B2 | Patternable low-k dielectric interconnect structure with a graded cap layer and method of fabrication | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-06-19 | — | — | US | disclosed |
| US-20110309507-A1 | METHODOLOGY FOR EVALUATION OF ELECTRICAL CHARACTERISTICS OF CARBON NANOTUBES | INTERNATIONAL BUSINESS MACHINES CORP. (US) | 2011-12-22 | — | — | US | disclosed |
| US-7919225-B2 | Photopatternable dielectric materials for BEOL applications and methods for use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-04-05 | — | — | US | disclosed |
| US-20110074044-A1 | PATTERNABLE LOW-K DIELECTRIC INTERCONNECT STRUCTURE WITH A GRADED CAP LAYER AND METHOD OF FABRICATION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-03-31 | — | — | US | disclosed |
| US-7867689-B2 | Method of use for photopatternable dielectric materials for BEOL applications | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-01-11 | — | — | US | disclosed |
| US-20100319971-A1 | AIRGAP-CONTAINING INTERCONNECT STRUCTURE WITH IMPROVED PATTERNABLE LOW-K MATERIAL AND METHOD OF FABRICATING | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-12-23 | — | — | US | disclosed |
| US-20090291389-A1 | PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS AND METHODS FOR USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-11-26 | — | — | US | disclosed |
| US-20080286467-A1 | METHOD OF USE FOR PHOTOPATTERNABLE DIELECTRIC MATERIALS FOR BEOL APPLICATIONS | GLOBALFOUNDRIES U.S. INC. | 2008-11-20 | — | — | US | disclosed |