Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28985420 | 0.80 | — | — | |
| SCHEMBL9362444 | 0.80 | — | — | |
| SCHEMBL18918255 | 0.78 | CHRM1 (0.32) | — | |
| SCHEMBL20915649 | 0.77 | NOS2 (0.31) | HTT | |
| SCHEMBL3137653 | 0.77 | TET2 (0.31) | — | |
| SCHEMBL5688214 | 0.76 | OR51E2 (0.39) | — | |
| SCHEMBL27807645 | 0.76 | — | — | |
| SCHEMBL1234369 | 0.76 | OR51E2 (0.39) | — | |
| SCHEMBL9979404 | 0.75 | HSPD1 (0.32) | — | |
| SCHEMBL12044154 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3580259-B1 | ROBUST SUPERHYDROPHOBIC MATERIAL AND COATING | UCL BUSINESS LTD (GB) | 2022-07-27 | — | — | EP | claimed |
| US-20200123392-A1 | Robust Superhydrophobic Material and Coating | UCL BUSINESS LTD (GB) | 2020-04-23 | — | — | US | claimed |
| WO-2018146252-A1 | ROBUST SUPERHYDROPHOBIC MATERIAL AND COATING | UCL BUSINESS PLC (GB) | 2018-08-16 | — | — | WO | claimed |
| WO-2024010056-A1 | SECONDARY BATTERY | ダイキン工業株式会社 | 2024-01-11 | — | — | WO | disclosed |
| WO-2024010057-A1 | NEGATIVE ELECTRODE, BATTERY, AND METHOD FOR COVERING BATTERY MATERIAL | ダイキン工業株式会社 | 2024-01-11 | — | — | WO | disclosed |
| WO-2023249003-A1 | SURFACE TREATMENT AGENT FOR ELECTRODE MATERIAL, POSITIVE ELECTRODE ACTIVE MATERIAL, CURRENT COLLECTOR FOIL, NEGATIVE ELECTRODE ACTIVE MATERIAL, CONDUCTIVE AID, ELECTRODE, BATTERY, METHOD FOR MANUFACTURING POSITIVE ELECTRODE ACTIVE MATERIAL, METHOD FOR MANUFACTURING CURRENT COLLECTOR FOIL, METHOD FOR MANUFACTURING NEGATIVE ELECTRODE ACTIVE MATERIAL, METHOD FOR MANUFACTURING CONDUCTIVE AID, AND METHOD FOR MANUFACTURING ELECTRODE | ダイキン工業株式会社 | 2023-12-28 | — | — | WO | disclosed |
| WO-2023238909-A1 | ELECTROLYTE SOLUTION AND SECONDARY BATTERY USING SAME | ダイキン工業株式会社 | 2023-12-14 | — | — | WO | disclosed |
| WO-2023167196-A1 | ELECTRODE ACTIVE MATERIAL, ELECTRODE, ELECTROCHEMICAL DEVICE, MODULE AND METHOD | 国立大学法人京都大学 | 2023-09-07 | — | — | WO | disclosed |
| EP-3580259-B1 | ROBUST SUPERHYDROPHOBIC MATERIAL AND COATING | UCL BUSINESS LTD (GB) | 2022-07-27 | — | — | EP | disclosed |
| CN-106796401-B | Pattern forming method, composition for forming upper layer film, resist pattern, and method for manufacturing electronic device | 富士胶片株式会社 | 2021-06-29 | — | — | CN | disclosed |
| WO-2021095574-A1 | ELECTRODE AND ELECTROCHEMICAL DEVICE | ダイキン工業株式会社 | 2021-05-20 | — | — | WO | disclosed |
| WO-2018146252-A1 | ROBUST SUPERHYDROPHOBIC MATERIAL AND COATING | UCL BUSINESS PLC (GB) | 2018-08-16 | — | — | WO | disclosed |
| EP-2580624-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM Corporation (JP) | 2013-04-17 | — | — | EP | disclosed |
| WO-2012086850-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-06-28 | — | — | WO | disclosed |
| WO-2012086849-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-06-28 | — | — | WO | disclosed |
| WO-2012026621-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN THEREWITH | FUJIFILM CORPORATION (JP) | 2012-03-01 | — | — | WO | disclosed |
| WO-2012008510-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-19 | — | — | WO | disclosed |
| WO-2011108767-A1 | METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2011-09-09 | — | — | WO | disclosed |
| CN-1922143-A | Alpha- (trifluoromethyl-substituted aryloxy, arylamino, arylthio or arylmethyl) -trifluoromethyl-substituted phenylacetic acids and derivatives as antidiabetics | METABOLEX INC (US) | 2007-02-28 | — | — | CN | disclosed |
| JP-2004077276-A | LC-MS ANALYSIS METHOD AND MOVING PHASE THEREOF | SHIMADZU CORP | 2004-03-11 | — | — | JP | disclosed |