Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 2/20 | 0.41 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | CES2 | O00748 | 1/20 | 0.39 |
| ▸ | CES1 | P23141 | 1/20 | 0.39 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.37 |
| ▸ | SLC1A3 | P43003 | 2/20 | 0.35 |
| ▸ | SLC1A2 | P43004 | 2/20 | 0.35 |
| ▸ | SLC1A1 | P43005 | 2/20 | 0.35 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.34 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.34 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8415539 | 1.00 | EPHX1 (0.41) | EPHX1HPGDKMT2ACES2CES1 | |
| SCHEMBL28785459 | 0.98 | EPHX1 (0.38) | EPHX1HPGDKMT2ACES2CES1 | |
| Methacrylic Acid SCHEMBL5669361 | 0.82 | EPHX1 (0.30) | EPHX1HPGDKMT2A | |
| SCHEMBL2674149 | 0.78 | CES2 (0.36) | EPHX1CES2CES1HDAC8HDAC6 | |
| SCHEMBL31343209 | 0.73 | KMT2A (0.38) | EPHX1HPGDKMT2AEPHX2NPC1 | |
| SCHEMBL6515413 | 0.72 | CES2 (0.44) | EPHX1HPGDCES2CES1EPHX2 | |
| SCHEMBL6515421 | 0.72 | CES2 (0.44) | EPHX1HPGDCES2CES1EPHX2 | |
| SCHEMBL9709482 | 0.72 | HPGD (0.38) | EPHX1HPGDKMT2AEPHX2NPC1 | |
| SCHEMBL3871573 | 0.72 | EPHX1 (0.48) | EPHX1HPGDKMT2AEPHX2NPC1 | |
| SCHEMBL11310775 | 0.71 | EPHX1 (0.44) | EPHX1HPGDKMT2ACES2CES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0226387-B1 | COATING RESIN COMPOSITION | Hitachi Chemical Co., Ltd. (JP) | 1992-03-04 | — | — | EP | claimed |
| US-20240294421-A1 | MAT AND GYPSUM BOARDS SUITABLE FOR WET OR HUMID AREAS | AHLSTROM OYJ (FI) | 2024-09-05 | — | — | US | disclosed |
| US-12012352-B2 | Mat and gypsum boards suitable for wet or humid areas | AHLSTROM OYJ (FI) | 2024-06-18 | — | — | US | disclosed |
| CN-117866555-A | High-adhesive-strength aging-resistant hot melt adhesive and preparation method thereof | 广东皓景新材料科技股份有限公司 | 2024-04-12 | — | — | CN | disclosed |
| EP-3204551-B1 | MAT AND GYPSUM BOARDS SUITABLE FOR WET OR HUMID AREAS | MUNKSJOE AHLSTROM OYJ (FI) | 2018-12-05 | — | — | EP | disclosed |
| EP-3312339-A1 | GYPSUM BOARDS SUITABLE FOR WET OR HUMID AREAS | Etex Building Performance International SAS (FR) | 2018-04-25 | — | — | EP | disclosed |
| US-20170305783-A1 | MAT AND GYPSUM BOARDS SUITABLE FOR WET OR HUMID AREAS | AHLSTROM OYJ (FI) | 2017-10-26 | — | — | US | disclosed |
| US-9383645-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, manufacturing method of electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2016-07-05 | — | — | US | disclosed |
| US-9188857-B2 | Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon | MITSUBISHI RAYON CO., LTD. (JP) | 2015-11-17 | — | — | US | disclosed |
| US-20140242505-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2014-08-28 | — | — | US | disclosed |
| US-20110025954-A1 | Retardation substrate, semi-transparent liquid crystal display, and method for manufacturing retardation substrate | TOPPAN PRINTING CO., LTD. (JP) | 2011-02-03 | — | — | US | disclosed |
| US-7868049-B2 | Organic/inorganic hybrid material and method for manufacturing the same | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2011-01-11 | — | — | US | disclosed |
| EP-2259129-A1 | RETARDATION PLATE, SEMI-TRANSMISSIVE LIQUID CRYSTAL DISPLAY DEVICE, AND METHOD FOR PRODUCING RETARDATION PLATE | Toppan Printing Co., Ltd. (JP) | 2010-12-08 | — | — | EP | disclosed |
| US-20090005513-A1 | Organic/inorganic hybrid material and method for manufacturing the same | INDUSTRIAL TECHNOLOGY INSTITUTE (TW) | 2009-01-01 | — | — | US | disclosed |
| CN-101333297-A | Organic/inorganic hybrid material and method for forming the same | IND TECH RES INST (CN) | 2008-12-31 | — | — | CN | disclosed |
| US-20080032241-A1 | Resist Polymer, Process For Production Thereof, Resist Composition, And Process For Production Of Substrated With Patterns Thereon | MITSUBISHI RAYON CO., LTD. (JP) | 2008-02-07 | — | — | US | disclosed |
| US-20070299204-A1 | Polymerizable Composition for Forming Optical Device, Optical Device and Method for Producing Optical Device | FUJIFILM CORPORATION (JP) | 2007-12-27 | — | — | US | disclosed |
| WO-2006049318-A1 | POLYMERIZABLE COMPOSITION FOR FORMING OPTICAL DEVICE, OPTICAL DEVICE, AND METHOD FOR PRODUCING OPTICAL DEVICE | FUJIFILM CORPORATION (JP) | 2006-05-11 | — | — | WO | disclosed |
| US-5866304-A | USING AN ACRYLATED ACID TERPOLYMER | NEC CORPORATION (JP) | 1999-02-02 | — | — | US | disclosed |
| US-5738975-A | MIXTURE CONTAINING (METH)ACRYLATE TERPOLYMER HAVING GROUP WHICH REACTS WITH AN ACID TO CONVERT POLARITY OF POLYMER, PHOTO ACID GENERATING COMPOUND, SOLVENT | NEC CORPORATION (JP) | 1998-04-14 | — | — | US | disclosed |