SCHEMBL998716

SCHEMBL998716

CC1CC(C)OC(C)(c2ccccc2)O1

nearest known ligand 0.39

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CHRNB2 P17787 1/20 0.39
SLC6A2 P23975 1/20 0.39
CHRNB4 P30926 1/20 0.39
CHRNA3 P32297 1/20 0.39
CHRNA4 P43681 1/20 0.39
SLC6A3 Q01959 1/20 0.39
OPRM1 P35372 1/20 0.34
OPRK1 P41145 1/20 0.34
OPRL1 P41146 1/20 0.34
CCR2 P41597 1/20 0.34
BACE1 P56817 1/20 0.34
KCNH2 Q12809 1/20 0.34
MAOB P27338 3/20 0.33
MAOA P21397 2/20 0.33
KDM1A O60341 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5156026 0.80 CHRNB2 (0.40) CHRNB2SLC6A2CHRNB4CHRNA3CHRNA4
SCHEMBL10590098 0.74 CYP3A4 (0.39) CHRNB2SLC6A2CHRNB4CHRNA3CHRNA4
SCHEMBL6572340 0.74 CYP3A4 (0.39) CHRNB2SLC6A2CHRNB4CHRNA3CHRNA4
SCHEMBL1730477 0.69 ALDH1A1 (0.41) CHRNB2SLC6A2CHRNB4CHRNA3CHRNA4
SCHEMBL2763759 0.69 CHRNB2 (0.39) CHRNB2SLC6A2CHRNB4CHRNA3CHRNA4
SCHEMBL2763761 0.69 CHRNB2 (0.39) CHRNB2SLC6A2CHRNB4CHRNA3CHRNA4
SCHEMBL28366383 0.69 CHRNB2 (0.39) CHRNB2SLC6A2CHRNB4CHRNA3CHRNA4
SCHEMBL1664714 0.69 TSHR (0.47) CHRNB2SLC6A2CHRNB4CHRNA3CHRNA4
SCHEMBL8538845 0.67 MAPK1 (0.70) CHRNB2SLC6A2CHRNB4CHRNA3CHRNA4
SCHEMBL8007579 0.67 MAPK1 (0.70) CHRNB2SLC6A2CHRNB4CHRNA3CHRNA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105283531-B Detergent composition 狮王株式会社 2018-11-02 CN claimed
US-12275915-B2 Fragrance composition KAO CORPORATION (JP) 2025-04-15 US disclosed
US-20240294844-A1 FRAGRANCE COMPOSITION KAO CORPORATION (JP) 2024-09-05 US disclosed
EP-4361342-A1 PERFUME COMPOSITION Kao Corporation (JP) 2024-05-01 EP disclosed
CN-117545827-A Perfume composition 花王株式会社 2024-02-09 CN disclosed
WO-2022270532-A1 PERFUME COMPOSITION 花王株式会社 2022-12-29 WO disclosed
CN-105283531-B Detergent composition 狮王株式会社 2018-11-02 CN disclosed
CN-104003904-B 4,8-dimethyl-4,9-decadienenitrile 花王株式会社 2017-04-19 CN disclosed
EP-2940005-B1 NITRILE COMPOUND, METHOD OF PREPARATION THEREOF AND FRAGRANCE COMPOSITION COMPRISING THE NITRILE COMPOUND KAO CORP (JP) 2017-04-05 EP disclosed
US-9447362-B2 Nitrile compound KAO CORPORATION (JP) 2016-09-20 US disclosed
EP-2940005-A1 NITRILE COMPOUND Kao Corporation (JP) 2015-11-04 EP disclosed
US-8186606-B2 Deodorant/fragrant device, volatilizing material for use in the same, process for producing the volatilizing material, and method of deodorizing/perfuming S.T. CORPORATION (JP) 2012-05-29 US disclosed
EP-2272541-A1 AROMATIC AGENT COMPOSITION FOR OPENABLE STORAGE SPACE Kobayashi Pharmaceutical Co., Ltd. (JP) 2011-01-12 EP disclosed
EP-2263700-A1 AROMATIC AGENT COMPOSITION FOR OPENABLE STORAGE SPACE Kobayashi Pharmaceutical Co., Ltd. (JP) 2010-12-22 EP disclosed
EP-1721943-B1 Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate FUJIFILM CORP (JP) 2010-05-12 EP disclosed
US-20100061886-A1 DEODORANT/FRAGRANT DEVICE, VOLATILIZING MATERIAL FOR USE IN THE SAME, PROCESS FOR PRODUCING THE VOLATILIZING MATERIAL, AND METHOD OF DEODORIZING/PERFUMING S.T. CORPORATION (JP) 2010-03-11 US disclosed
US-7538149-B2 Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate FUJIFILM CORPORATION (JP) 2009-05-26 US disclosed
US-20060258776-A1 Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate FUJI PHOTO FILM CO., LTD. 2006-11-16 US disclosed
EP-1721943-A1 Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2006-11-15 EP disclosed
US-6506793-B2 For sustained release of lemon aroma unique to citral; perfumes; leucine dehydrogenase inhibitors; deodorants, cosmetics, dermatology agents KAO CORPORATION (JP) 2003-01-14 US disclosed