SCHEMBL9999054

SCHEMBL9999054

C=C(C)C(=O)Oc1ccccc1OC1CCC(C)C1

nearest known ligand 0.43

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MCHR1 Q99705 3/20 0.43
ELANE P08246 1/20 0.38
CYP19A1 P11511 2/20 0.36
STAT3 P40763 1/20 0.36
KAT2B Q92831 1/20 0.35
BAZ2B Q9UIF8 1/20 0.35
GAA P10253 2/20 0.34
ALDH1A1 P00352 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
KMT2A Q03164 2/20 0.34
GRIK1 P39086 1/20 0.34
GRIA2 P42262 1/20 0.34
ENPP2 Q13822 3/20 0.33
ATM Q13315 1/20 0.33
RAB9A P51151 1/20 0.33
EPHX2 P34913 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9998843 0.92 MCHR1 (0.41) MCHR1ELANECYP19A1KAT2BBAZ2B
SCHEMBL9998833 0.83 FFAR1 (0.36) ELANEKAT2BBAZ2BALDH1A1KMT2A
SCHEMBL9999056 0.82 KMT2A (0.46) MCHR1ELANECYP19A1ALDH1A1KMT2A
SCHEMBL9998733 0.80 ENPP2 (0.42) ELANECYP19A1KAT2BBAZ2BKMT2A
SCHEMBL30803750 0.76 ELANE (0.56) ELANEALDH1A1SMN1; SMN2KMT2AATM
SCHEMBL30803748 0.76 ELANE (0.56) ELANEALDH1A1SMN1; SMN2KMT2AATM
SCHEMBL1232932 0.76 ELANE (0.56) ELANEALDH1A1SMN1; SMN2KMT2AATM
SCHEMBL9998844 0.72 KMT2A (0.48) ELANEGAAALDH1A1KMT2AATM
SCHEMBL9861731 0.72 CYP19A1 (0.42) CYP19A1ALDH1A1RAB9A
SCHEMBL8962026 0.71 ELANE (0.51) ELANEALDH1A1KMT2AATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9017918-B2 Monomer, polymer, chemically amplified positive resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-28 US disclosed
US-20110294070-A1 MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-12-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110294070-A1 MONOMER, POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND PATTERNING PROCESS PARG, PCNA, POLH MCHR1 2415/4885ELANE 1171/4885CYP19A1 3247/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.