Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 1/20 | 0.53 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | PRKCI | P41743 | 1/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | CASP6 | P55212 | 1/20 | 0.39 |
| ▸ | RXRA | P19793 | 2/20 | 0.37 |
| ▸ | RXRB | P28702 | 2/20 | 0.37 |
| ▸ | RXRG | P48443 | 1/20 | 0.37 |
| ▸ | CHRNB4 | P30926 | 2/20 | 0.35 |
| ▸ | CHRNA3 | P32297 | 2/20 | 0.35 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.34 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.33 |
| ▸ | ACMSD | Q8TDX5 | 1/20 | 0.32 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.32 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.32 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.32 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.32 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31540766 | 0.84 | FFAR4 (0.45) | ACHETSHRPRKCIRXRARXRB | |
| SCHEMBL12294066 | 0.84 | TSHR (0.55) | ACHETSHRPRKCIRXRARXRB | |
| SCHEMBL20649211 | 0.79 | ACHE (0.53) | ACHETSHRKDM4ECASP6RECQL | |
| SCHEMBL21973519 | 0.78 | TSHR (0.55) | TSHRPRKCIRXRARXRBRXRG | |
| SCHEMBL21694421 | 0.76 | KDM4E (0.35) | ACHEKDM4ECASP6MAPT | |
| SCHEMBL30539351 | 0.76 | ACHE (0.50) | ACHETSHRKDM4ECASP6RECQL | |
| SCHEMBL351788 | 0.76 | ACHE (0.88) | ACHETSHRKDM4ECASP6ENPP2 | |
| SCHEMBL5698111 | 0.76 | TSHR (0.60) | ACHETSHRPRKCIACMSDGRIN2D | |
| SCHEMBL31540753 | 0.75 | FFAR4 (0.40) | ACHEFFAR4RECQLCYP2A6 | |
| SCHEMBL19300926 | 0.74 | PTGS1 (0.46) | ACHEPRKCIRXRARXRBRXRG |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11028323-B2 | Liquid crystal aligning agent containing crosslinking agent and polymer that has site having isocyanate group and/or blocked isocyanate group and site having photoreactivity, liquid crystal alignment film, and liquid crystal display element | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2021-06-08 | — | — | US | disclosed |
| US-10921650-B2 | Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2021-02-16 | — | — | US | disclosed |
| US-20190023987-A1 | LIQUID CRYSTAL ALIGNING AGENT CONTAINING CROSSLINKING AGENT AND POLYMER THAT HAS SITE HAVING ISOCYANATE GROUP AND/OR BLOCKED ISOCYANATE GROUP AND SITE HAVING PHOTOREACTIVITY, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-01-24 | — | — | US | disclosed |
| US-20190018289-A1 | LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY ELEMENT | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-01-17 | — | — | US | disclosed |
| US-9905768-B2 | Semiconductor device and insulating layer-forming composition | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |
| US-9905768-B2 | Semiconductor device and insulating layer-forming composition | FUJIFILM CORPORATION (JP) | 2018-02-27 | — | — | US | disclosed |
| WO-2018025872-A1 | LIQUID CRYSTAL DISPLAY ELEMENT EQUIPPED WITH LIQUID CRYSTAL PANEL HAVING CURVED SURFACE AND LIQUID CRYSTAL ALIGNING AGENT FOR SAME | 日産化学工業株式会社 | 2018-02-08 | — | — | WO | disclosed |
| US-20170054076-A1 | SEMICONDUCTOR DEVICE AND INSULATING LAYER-FORMING COMPOSITION | FUJIFILM CORPORATION (JP) | 2017-02-23 | — | — | US | disclosed |
| US-20170054076-A1 | SEMICONDUCTOR DEVICE AND INSULATING LAYER-FORMING COMPOSITION | FUJIFILM CORPORATION (JP) | 2017-02-23 | — | — | US | disclosed |
| US-20170005266-A1 | SEMICONDUCTOR ELEMENT AND INSULATING LAYER-FORMING COMPOSITION | FUJIFILM CORPORATION (JP) | 2017-01-05 | — | — | US | disclosed |
| US-20170005266-A1 | SEMICONDUCTOR ELEMENT AND INSULATING LAYER-FORMING COMPOSITION | FUJIFILM CORPORATION (JP) | 2017-01-05 | — | — | US | disclosed |
| US-9400430-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming pattern | FUJIFILM CORPORATION (JP) | 2016-07-26 | — | — | US | disclosed |
| US-9400430-B2 | Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, mask blank and method of forming pattern | FUJIFILM CORPORATION (JP) | 2016-07-26 | — | — | US | disclosed |
| US-20140242502-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, MASK BLANK AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2014-08-28 | — | — | US | disclosed |
| US-20140242502-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, MASK BLANK AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2014-08-28 | — | — | US | disclosed |
| WO-2013069812-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM, MASK BLANK AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2013-05-16 | — | — | WO | disclosed |
| WO-2012014898-A1 | LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT | 日産化学工業株式会社 (JP) | 2012-02-02 | — | — | WO | disclosed |
| WO-2011132751-A1 | LIQUID-CRYSTAL ALIGNMENT AGENT, LIQUID-CRYSTAL ALIGNMENT FILM, AND LIQUID-CRYSTAL DISPLAY ELEMENT | 日産化学工業株式会社 (JP) | 2011-10-27 | — | — | WO | disclosed |
| WO-2011132752-A1 | LIQUID-CRYSTAL ALIGNMENT AGENT, LIQUID-CRYSTAL ALIGNMENT FILM, AND LIQUID-CRYSTAL DISPLAY ELEMENT | 日産化学工業株式会社 (JP) | 2011-10-27 | — | — | WO | disclosed |