Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.70 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.65 |
| ▸ | F2 | P00734 | 2/20 | 0.63 |
| ▸ | PRSS1 | P07477 | 2/20 | 0.63 |
| ▸ | PRSS2 | P07478 | 2/20 | 0.63 |
| ▸ | PRSS3 | P35030 | 2/20 | 0.63 |
| ▸ | MEN1 | O00255 | 2/20 | 0.60 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.60 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.59 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.59 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.56 |
| ▸ | CA1 | P00915 | 6/20 | 0.54 |
| ▸ | CA2 | P00918 | 6/20 | 0.54 |
| ▸ | CA5A | P35218 | 6/20 | 0.54 |
| ▸ | CA5B | Q9Y2D0 | 6/20 | 0.54 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.54 |
| ▸ | GAA | P10253 | 1/20 | 0.53 |
| ▸ | PKM | P14618 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5960692 | 1.00 | KMT2A (0.70) | KMT2AALDH1A1F2PRSS1PRSS2 | |
| SCHEMBL12705857 | 1.00 | KMT2A (0.70) | KMT2AALDH1A1F2PRSS1PRSS2 | |
| SCHEMBL863312 | 1.00 | KMT2A (0.70) | KMT2AALDH1A1F2PRSS1PRSS2 | |
| SCHEMBL19098992 | 0.87 | KMT2A (0.67) | KMT2AALDH1A1F2PRSS1PRSS2 | |
| SCHEMBL1362019 | 0.87 | KMT2A (0.70) | KMT2AALDH1A1F2PRSS1PRSS2 | |
| SCHEMBL10415674 | 0.86 | KMT2A (0.65) | KMT2AALDH1A1F2PRSS1PRSS2 | |
| SCHEMBL23124424 | 0.85 | KMT2A (0.68) | KMT2AALDH1A1F2PRSS1PRSS2 | |
| SCHEMBL1500774 | 0.85 | KMT2A (0.68) | KMT2AALDH1A1F2PRSS1PRSS2 | |
| SCHEMBL467203 | 0.85 | KMT2A (0.68) | KMT2AALDH1A1F2PRSS1PRSS2 | |
| SCHEMBL12706679 | 0.85 | KMT2A (0.68) | KMT2AALDH1A1F2PRSS1PRSS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230359119-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-09 | — | — | US | disclosed |
| WO-2017115205-A1 | SUBSTITUTED 3-AZABICYCLO[3.1.0]HEXANES AS KETOHEXOKINASE INHIBITORS | PFIZER INC. (US) | 2017-07-06 | — | — | WO | disclosed |
| US-9519216-B2 | Positive photosensitive resin compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2016-12-13 | — | — | US | disclosed |
| US-9519216-B2 | Positive photosensitive resin compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2016-12-13 | — | — | US | disclosed |
| US-9304399-B2 | Resist composition and method for producing semiconductor device | SONY CORPORATION (JP) | 2016-04-05 | — | — | US | disclosed |
| EP-1609024-B1 | PHOTOSENSITIVE RESIN COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS (US) | 2015-09-30 | — | — | EP | disclosed |
| US-20140248777-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE | SONY CORPORATION (JP) | 2014-09-04 | — | — | US | disclosed |
| US-8765353-B2 | Resist composition and method for producing semiconductor device | SONY CORPORATION (JP) | 2014-07-01 | — | — | US | disclosed |
| US-8765353-B2 | Resist composition and method for producing semiconductor device | SONY CORPORATION (JP) | 2014-07-01 | — | — | US | disclosed |
| US-20130115556-A1 | PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM | FUJIFILM CORPORATION (JP) | 2013-05-09 | — | — | US | disclosed |
| US-20120077343-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE | SONY CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20120077343-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE | SONY CORPORATION (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20090197067-A1 | Novel Positive Photosensitive Resin Compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2009-08-06 | — | — | US | disclosed |
| EP-1740571-B1 | A PROCESS FOR PREPARING PYRIDINYLMETHYL-1H- BENZIMIDAZOLE COMPOUNDS IN ENANTIOMERICALLY ENRICHED FORM OR AS SINGLE ENANTIOMERS | HETERO DRUGS LTD (IN) | 2009-07-29 | — | — | EP | disclosed |
| US-20090111050-A1 | Novel Photosensitive Resin Compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2009-04-30 | — | — | US | disclosed |
| US-20090111050-A1 | Novel Photosensitive Resin Compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2009-04-30 | — | — | US | disclosed |
| US-7176199-B2 | Aryl-substituted alicyclic compound and medical composition comprising the same | DAINIPPON PHARMACEUTICAL CO., LTD. (JP) | 2007-02-13 | — | — | US | disclosed |
| US-7176199-B2 | Aryl-substituted alicyclic compound and medical composition comprising the same | DAINIPPON PHARMACEUTICAL CO., LTD. (JP) | 2007-02-13 | — | — | US | disclosed |