SCHEMBL1362019

SCHEMBL1362019

CC1(C)C2CCC1(CS([O])(=O)=O)C(=O)C2

nearest known ligand 0.70

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 3/20 0.70
ALDH1A1 P00352 2/20 0.65
F2 P00734 2/20 0.63
PRSS1 P07477 2/20 0.63
PRSS2 P07478 2/20 0.63
PRSS3 P35030 2/20 0.63
MEN1 O00255 2/20 0.60
SMN1; SMN2 Q16637 1/20 0.60
CYP1A2 P05177 1/20 0.59
CYP2C19 P33261 1/20 0.59
KDM4E B2RXH2 1/20 0.56
CA1 P00915 5/20 0.54
CA2 P00918 5/20 0.54
CA5A P35218 5/20 0.54
CA5B Q9Y2D0 5/20 0.54
L3MBTL1 Q9Y468 1/20 0.54
GAA P10253 1/20 0.53
PKM P14618 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10000728 0.87 KMT2A (0.70) KMT2AALDH1A1F2PRSS1PRSS2
SCHEMBL12705857 0.87 KMT2A (0.70) KMT2AALDH1A1F2PRSS1PRSS2
SCHEMBL863312 0.87 KMT2A (0.70) KMT2AALDH1A1F2PRSS1PRSS2
SCHEMBL5960692 0.87 KMT2A (0.70) KMT2AALDH1A1F2PRSS1PRSS2
SCHEMBL23124424 0.85 KMT2A (0.68) KMT2AALDH1A1F2PRSS1PRSS2
SCHEMBL2385301 0.85 KMT2A (0.68) KMT2AALDH1A1F2PRSS1PRSS2
SCHEMBL467203 0.85 KMT2A (0.68) KMT2AALDH1A1F2PRSS1PRSS2
SCHEMBL7753485 0.85 KMT2A (0.68) KMT2AALDH1A1F2PRSS1PRSS2
SCHEMBL20729441 0.85 KMT2A (0.68) KMT2AALDH1A1F2PRSS1PRSS2
SCHEMBL1696817 0.85 KMT2A (0.68) KMT2AALDH1A1F2PRSS1PRSS2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 175 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7150856-B2 On-spot selectively activated hydrophobic slide and preparation thereof INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2006-12-19 US claimed
US-7118908-B2 On-spot selectively activated hydrophobic slide and preparation thereof Jan, Bor-Iuan (TW) 2006-10-10 US claimed
US-7105340-B2 On-spot selectively activated hydrophobic slide and preparation thereof Jan, Bor-Iuan (TW) 2006-09-12 US claimed
US-20060029973-A1 On-spot selectively activated hydrophobic slide and preparation thereof INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2006-02-09 US claimed
US-20060029974-A1 On-spot selectively activated hydrophobic slide and preparation thereof INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2006-02-09 US claimed
US-20040029908-A1 Tricyclo compounds, a process for their production and a pharmaceutical composition containing the same FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 2004-02-12 US claimed
US-20030229115-A1 Tricyclo compounds, a process for their production and pharmaceutical composition containing the same FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 2003-12-11 US claimed
US-20030170831-A1 Tricyclo compounds, a process for their production and a pharmaceutical composition containing the same FUJISAWA PHARMACEUTICAL CO. LTD. (JP) 2003-09-11 US claimed
US-20020182719-A1 On-spot selectively activated hydrophobic slide and preparation thereof INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2002-12-05 US claimed
US-6018066-A Production of amide derivatives and intermediate compounds therefor JAPAN TOBACCO INC. (JP) 2000-01-25 US claimed
US-5348966-A Method for treating pyoderma and Sezary's syndrome using FK 506 and related compounds FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1994-09-20 US claimed
EP-0184162-B1 Tricyclo compounds, a process for their production and a pharmaceutical composition containing the same FUJISAWA PHARMACEUTICAL CO (JP) 1994-04-27 EP claimed
US-5266692-A Autoimmune FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1993-11-30 US claimed
US-5254562-A Autoimmune FUJISAWA PHARMACEUTICAL COMPANY, LTD. (JP) 1993-10-19 US claimed
US-5196437-A Macrolide FUJISAWA PHARMACEUTICAL COMPANY, LTD. (JP) 1993-03-23 US claimed
US-5110811-A Antibody inhibitors FUJISAWA PHARMACEUTICAL COMPANY, LTD. (JP) 1992-05-05 US claimed
US-4894366-A Tricyclo compounds, a process for their production and a pharmaceutical composition containing the same FUJISAWA PHARMACEUTICAL COMPANY, LTD. (JP) 1990-01-16 US claimed
EP-0184162-A2 Tricyclo compounds, a process for their production and a pharmaceutical composition containing the same FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1986-06-11 EP claimed
EP-0081993-A2 Optically active alpha-substituted aryl ketones, their preparation and their use in preparing alpha-arylalkanoic acids SYNTEX PHARMACEUTICALS INTERNATIONAL LIMITED (BM) 1983-06-22 EP claimed
US-12012426-B2 Tetradentate diaminodiphosphine ligand and transition metal complex, and method for manufacturing same and application for same TAKASAGO INTERNATIONAL CORPORATION (JP) 2024-06-18 US disclosed
CN-112239407-B Diester compound having dimethylcyclobutane ring, method for producing the same, and method for producing dimethylcyclobutane compound derived from the same 信越化学工业株式会社 2024-05-28 CN disclosed
CN-112654630-B Tetradentate diaminodiphosphine ligands, transition metal complexes, methods for their production and use thereof 高砂香料工业株式会社 2024-05-24 CN disclosed
CN-112441895-B Dialkoxy alkadienyne compound, preparation method thereof and preparation method of dialkoxy alkadienyne aldehyde compound 信越化学工业株式会社 2024-01-23 CN disclosed
US-11795133-B2 Process for preparing 6-isopropenyl-3-methyl-9-decenyl acetate, and intermediates therefor SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-24 US disclosed
CN-110461824-B Method for producing polymerizable compound and solution 日本瑞翁株式会社 2023-09-05 CN disclosed
CN-112166108-B Method for producing polymerizable compound 日本瑞翁株式会社 2023-09-05 CN disclosed
US-20230219983-A1 TETRADENTATE DIAMINODIPHOSPHINE LIGAND AND TRANSITION METAL COMPLEX, AND METHOD FOR MANUFACTURING SAME AND APPLICATION FOR SAME TAKASAGO INTERNATIONAL CORPORATION (JP) 2023-07-13 US disclosed
EP-3604319-B1 CATIONIC RUTHENIUM COMPLEX, AND PRODUCTION METHOD THEREFOR AND USE THEREOF TAKASAGO PERFUMERY CO LTD (JP) 2023-06-21 EP disclosed
US-20230176479-A1 NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-08 US disclosed
EP-3766862-B1 DIMETHYLCYCLOBUTANONE COMPOUNDS, DIMETHYLCYCLOBUTANE COMPOUNDS, AND PROCESSES FOR PREPARING THE SAME SHINETSU CHEMICAL CO (JP) 2023-06-07 EP disclosed
EP-3766861-B1 DIESTER COMPOUND HAVING A DIMETHYLCYCLOBUTANE RING, A PROCESS FOR PREPARING THE SAME, AND A PROCESS FOR PREPARING DIMETHYLCYCLOBUTANE COMPOUND DERIVED FROM THE DIESTER COMPOUND SHINETSU CHEMICAL CO (JP) 2023-05-24 EP disclosed
US-11639362-B2 Tetradentate diaminodiphosphine ligand and transition metal complex, and method for manufacturing same and application for same TAKASAGO INTERNATIONAL CORPORATION (JP) 2023-05-02 US disclosed
US-20230128569-A1 NOVEL COMPOUND AND APPLICATION THEREOF DAICEL CORPORATION (JP) 2023-04-27 US disclosed
EP-4167028-A1 NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-19 EP disclosed
CN-115885217-A Negative resist film laminate and pattern forming method 信越化学工业株式会社 2023-03-31 CN disclosed
EP-3943474-B1 PROCESSES FOR PREPARING ALPHA-NECRODYL COMPOUNDS AND PROCESSES FOR PREPARING GAMMA-NECRODYL COMPOUNDS SHINETSU CHEMICAL CO (JP) 2023-03-29 EP disclosed
CN-108107676-B Chemically amplified positive resist film laminate and pattern formation method 信越化学工业株式会社 2023-02-21 CN disclosed
EP-4108657-A1 NEW COMPOUND AND USE THEREOF Daicel Corporation (JP) 2022-12-28 EP disclosed
CN-108459469-B Pattern forming method 信越化学工业株式会社 2022-11-11 CN disclosed
US-20220324783-A1 DIMETHYLCYCLOBUTANONE COMPOUNDS, DIMETHYLCYCLOBUTANE COMPOUNDS, AND PROCESSES FOR PREPARING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-10-13 US disclosed
US-11460774-B2 Photosensitive resin composition, photosensitive dry film, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-10-04 US disclosed
CN-115135640-A Novel compound and use thereof 株式会社大赛璐 2022-09-30 CN disclosed
US-11384043-B2 Dimethylcyclobutanone compounds, dimethylcyclobutane compounds, and processes for preparing the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-07-12 US disclosed
US-11370741-B2 Processes for preparing alpha-necrodyl compounds and processes for preparing gamma-necrodyl compounds SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-28 US disclosed
CN-114600045-A Photosensitive resin composition, photosensitive dry film and pattern forming method 信越化学工业株式会社 2022-06-07 CN disclosed
US-11352312-B2 Diester compound having a dimethylcyclobutane ring, a process for preparing the same, and a process for preparing dimethylcyclobutane compound derived from the diester compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-07 US disclosed
US-11325933-B2 Cationic ruthenium complex, and production method therefor and use thereof TAKASAGO INTERNATIONAL CORPORATION (JP) 2022-05-10 US disclosed
EP-3789375-B1 PROCESS FOR PREPARING 4-PENTEN-2-YNAL SHINETSU CHEMICAL CO (JP) 2022-03-02 EP disclosed
US-11256174-B2 Pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-02-22 US disclosed
EP-3671345-B1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2022-02-02 EP disclosed
US-20220024847-A1 PROCESSES FOR PREPARING ALPHA-NECRODYL COMPOUNDS AND PROCESSES FOR PREPARING GAMMA-NECRODYL COMPOUNDS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-01-27 US disclosed
EP-3943474-A1 PROCESSES FOR PREPARING ALPHA-NECRODYL COMPOUNDS AND PROCESSES FOR PREPARING GAMMA-NECRODYL COMPOUNDS Shin-Etsu Chemical Co., Ltd. (JP) 2022-01-26 EP disclosed
CN-113968784-A Preparation method of alpha-cadaveric alcohol-based compound and preparation method of gamma-cadaveric alcohol-based compound 信越化学工业株式会社 2022-01-25 CN disclosed
US-20220017447-A1 PROCESS FOR PREPARING 6-ISOPROPENYL-3-METHYL-9-DECENYL ACETATE, AND INTERMEDIATES THEREFOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-01-20 US disclosed
EP-3936500-A1 PROCESS FOR PREPARING 6-ISOPROPENYL-3-METHYL-9-DECENYL ACETATE, AND INTERMEDIATES THEREFOR Shin-Etsu Chemical Co., Ltd. (JP) 2022-01-12 EP disclosed
CN-113912494-A Preparation method of 6-isopropenyl-3-methyl-9-decenyl acetate and intermediate thereof 信越化学工业株式会社 2022-01-11 CN disclosed
CN-108727165-B Process for producing 2, 4-dienal aldehyde compound and 2, 4-dienal compound 信越化学工业株式会社 2021-11-12 CN disclosed
US-11148989-B2 Dialkoxyalkadienyne compound and a process for preparing the same and a process for preparing a dienynal compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-19 US disclosed
EP-3848378-A1 TETRADENTATE DIAMINODIPHOSPHINE LIGAND AND TRANSITION METAL COMPLEX, AND METHOD FOR MANUFACTURING SAME AND APPLICATION FOR SAME Takasago International Corporation (JP) 2021-07-14 EP disclosed
WO-2021079679-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMATION METHOD 信越化学工業株式会社 2021-04-29 WO disclosed
CN-112654630-A Tetradentate diamino diphosphine ligand, transition metal complex, their production method and use 高砂香料工业株式会社 2021-04-13 CN disclosed
EP-3789375-A1 PROCESS FOR PREPARING 4-PENTEN-2-YNAL Shin-Etsu Chemical Co., Ltd. (JP) 2021-03-10 EP disclosed
EP-3789376-A1 DIALKOXYALKADIENYNE COMPOUND AND A PROCESS FOR PREPARING THE SAME AND A PROCESS FOR PREPARING A DIENYNAL COMPOUND Shin-Etsu Chemical Co., Ltd. (JP) 2021-03-10 EP disclosed
CN-112441895-A Dialkoxyl alkadienyne compound, preparation method thereof and preparation method of diene alkynal compound 信越化学工业株式会社 2021-03-05 CN disclosed
CN-112441894-A Method for preparing 4-pentene-2-alkynal 信越化学工业株式会社 2021-03-05 CN disclosed
US-20210061745-A1 PROCESS FOR PREPARING 4-PENTEN-2-YNAL SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-03-04 US disclosed
US-20210061744-A1 DIALKOXYALKADIENYNE COMPOUND AND A PROCESS FOR PREPARING THE SAME AND A PROCESS FOR PREPARING A DIENYNAL COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-03-04 US disclosed
US-20210017112-A1 DIMETHYLCYCLOBUTANONE COMPOUNDS, DIMETHYLCYCLOBUTANE COMPOUNDS, AND PROCESSES FOR PREPARING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-01-21 US disclosed
US-20210017115-A1 DIESTER COMPOUND HAVING A DIMETHYLCYCLOBUTANE RING, A PROCESS FOR PREPARING THE SAME, AND A PROCESS FOR PREPARING DIMETHYLCYCLOBUTANE COMPOUND DERIVED FROM THE DIESTER COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-01-21 US disclosed
EP-3766861-A1 DIESTER COMPOUND HAVING A DIMETHYLCYCLOBUTANE RING, A PROCESS FOR PREPARING THE SAME, AND A PROCESS FOR PREPARING DIMETHYLCYCLOBUTANE COMPOUND DERIVED FROM THE DIESTER COMPOUND Shin-Etsu Chemical Co., Ltd. (JP) 2021-01-20 EP disclosed
EP-3766862-A1 DIMETHYLCYCLOBUTANONE COMPOUNDS, DIMETHYLCYCLOBUTANE COMPOUNDS, AND PROCESSES FOR PREPARING THE SAME Shin-Etsu Chemical Co., Ltd. (JP) 2021-01-20 EP disclosed
CN-112239398-A Dimethylcyclobutanone compound, dimethylcyclobutane compound and preparation method thereof 信越化学工业株式会社 2021-01-19 CN disclosed
CN-112239407-A Diester compound having dimethylcyclobutane ring, process for producing the same, and process for producing dimethylcyclobutane compound derived therefrom 信越化学工业株式会社 2021-01-19 CN disclosed
CN-112166108-A Method for producing polymerizable compound 日本瑞翁株式会社 2021-01-01 CN disclosed
EP-3121168-B1 METHOD FOR PRODUCING POLYMERIZABLE COMPOUND ZEON CORP (JP) 2020-10-21 EP disclosed
US-20200283399-A1 METHOD OF PRODUCING POLYMERIZABLE COMPOUND, AND SOLUTION OF POLYMERIZABLE COMPOUND ZEON CORPORATION (JP) 2020-09-10 US disclosed
EP-3135681-B1 RUTHENIUM COMPLEX, METHOD FOR PRODUCING SAME, AND USE OF SAME TAKASAGO PERFUMERY CO LTD (JP) 2020-08-19 EP disclosed
CN-111338181-A Photosensitive resin composition, photosensitive dry film and pattern forming method 信越化学工业株式会社 2020-06-26 CN disclosed
US-20200201182-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-25 US disclosed
EP-3671345-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2020-06-24 EP disclosed
US-20200102336-A1 CATIONIC RUTHENIUM COMPLEX, AND PRODUCTION METHOD THEREFOR AND USE THEREOF TAKASAGO INTERNATIONAL CORPORATION (JP) 2020-04-02 US disclosed
EP-3392230-B1 METHOD FOR PRODUCING 2,4-DIENAL ACETAL COMPOUND AND 2,4-DIENAL COMPOUND SHINETSU CHEMICAL CO (JP) 2020-03-04 EP disclosed
EP-3604319-A1 CATIONIC RUTHENIUM COMPLEX, AND PRODUCTION METHOD THEREFOR AND USE THEREOF Takasago International Corporation (JP) 2020-02-05 EP disclosed
EP-3604289-A1 POLYMERIZABLE COMPOUND PRODUCTION METHOD AND POLYMERIZABLE COMPOUND SOLUTION Zeon Corporation (JP) 2020-02-05 EP disclosed
CN-110461824-A Method for producing polymerizable compound and solution ZEON CORP 2019-11-15 CN disclosed
EP-3367164-B1 PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2019-11-13 EP disclosed
CN-110249264-A Negative light-sensitive resin combination 日本瑞翁株式会社 2019-09-17 CN disclosed
EP-3327504-B1 CHEMICALLY AMPLIFIED POSITIVE RESIST FILM LAMINATE AND PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2019-05-15 EP disclosed
CN-109690361-A Optical component forms composition 三菱瓦斯化学株式会社 2019-04-26 CN disclosed
CN-109073782-A Optical element forms composition and its solidfied material 三菱瓦斯化学株式会社 2018-12-21 CN disclosed
US-10138179-B2 Method for producing 2,4-dienal acetal compound and 2,4-dienal compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-11-27 US disclosed
US-20180305276-A1 METHOD FOR PRODUCING 2,4-DIENAL ACETAL COMPOUND AND 2,4-DIENAL COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-10-25 US disclosed
EP-3392230-A1 METHOD FOR PRODUCING 2,4-DIENAL ACETAL COMPOUND AND 2,4-DIENAL COMPOUND Shin-Etsu Chemical Co., Ltd. (JP) 2018-10-24 EP disclosed
CN-106068257-B The manufacturing method of polymerizable compound 日本瑞翁株式会社 2018-09-14 CN disclosed
US-10072033-B2 N-(phosphinoalkyl)-N-(thioalkyl)amine derivative, method for producing same, and metal complex thereof TAKASAGO INTERNATIONAL CORPORATION (JP) 2018-09-11 US disclosed
EP-3367164-A1 PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2018-08-29 EP disclosed
CN-108459469-A Pattern forming method 信越化学工业株式会社 2018-08-28 CN disclosed
US-10059679-B2 Method for producing polymerizable compound ZEON CORPORATION (JP) 2018-08-28 US disclosed
US-10059729-B2 Ruthenium complex, method for producing same, and use of same TAKASAGO INTERNATIONAL CORPORATION (JP) 2018-08-28 US disclosed
US-20180239255-A1 PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-08-23 US disclosed
CN-108107676-A Chemically amplified positive resist film laminated body and pattern formation method 信越化学工业株式会社 2018-06-01 CN disclosed
EP-3327504-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST FILM LAMINATE AND PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2018-05-30 EP disclosed
US-20180143535-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST FILM LAMINATE AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-24 US disclosed
CN-107428717-A Resist composition, resist pattern forming method, and polyphenol compound used for same 三菱瓦斯化学株式会社 2017-12-01 CN disclosed
CN-107406392-A Composition of matter and molecular resists made therefrom 亚历克斯·菲利普·格雷厄姆·罗宾逊 2017-11-28 CN disclosed
US-20170233418-A1 N-(PHOSPHINOALKYL)-N-(THIOALKYL)AMINE DERIVATIVE, METHOD FOR PRODUCING SAME, AND METAL COMPLEX THEREOF TAKASAGO INTERNATIONAL CORPORATION (JP) 2017-08-17 US disclosed
US-20170190679-A9 METHOD FOR PRODUCING POLYMERIZABLE COMPOUND ZEON CORPORATION (JP) 2017-07-06 US disclosed
EP-3135681-A1 RUTHENIUM COMPLEX, METHOD FOR PRODUCING SAME, AND USE OF SAME Takasago International Corporation (JP) 2017-03-01 EP disclosed
US-20170044196-A1 RUTHENIUM COMPLEX, METHOD FOR PRODUCING SAME, AND USE OF SAME TAKASAGO INTERNATIONAL CORPORATION (JP) 2017-02-16 US disclosed
EP-3121168-A1 METHOD FOR PRODUCING POLYMERIZABLE COMPOUND Zeon Corporation (JP) 2017-01-25 EP disclosed
US-20170015639-A1 METHOD FOR PRODUCING POLYMERIZABLE COMPOUND ZEON CORPORATION (JP) 2017-01-19 US disclosed
EP-2353686-B1 METHOD FOR PURIFYING FK506 BY EXTRACTION WITH SILVER ION SOLUTION GENOTECH CORP (KR) 2016-11-09 EP disclosed
EP-1838659-B1 PROCESS FOR PREPARATION OF N,N-DIISOPROPYL-3-(2-HYDROXY-5-METHYLPHENYL)-3-PHENYLPROPYLAMINE LEK PHARMACEUTICALS (SI) 2015-07-15 EP disclosed
US-8193345-B2 Purification method of lactone compounds containing unsaturated alkyl group by extraction with silver ion solution GENOTECH CORP. (KR) 2012-06-05 US disclosed
US-8067640-B2 Method for the separation of intermediates which may be used for the preparation of escitalopram H. LUNDBECK A/S (DK) 2011-11-29 US disclosed
EP-2360150-A1 Method for the separation of intermediates which may be used for the preparation of escitalopram H. Lundbeck A/S (DK) 2011-08-24 EP disclosed
EP-2353686-A1 METHOD FOR PURIFYING LACTONE COMPOUND HAVING UNSATURATED ALKYL GROUP BY EXTRACTION WITH SILVER ION SOLUTION Genotech Co., Ltd (KR) 2011-08-10 EP disclosed
US-20110172413-A1 PURIFICATION METHOD OF LACTONE COMPOUNDS CONTAINING UNSATURATED ALKYL GROUP BY EXTRACTION WITH SILVER ION SOLUTION GENOTECH CO., LTD (KR) 2011-07-14 US disclosed
US-20110065937-A1 METHOD FOR THE SEPARATION OF INTERMEDIATES WHICH MAY BE USED FOR THE PREPARATION OF ESCITALOPRAM H. LUNDBECK A/S (DK) 2011-03-17 US disclosed
US-7582780-B2 Method for the separation of intermediates which may be used for the preparation of escitalopram H. LUNDBECK A/S (DK) 2009-09-01 US disclosed
EP-0984000-B1 PROCESS FOR PRODUCING AMIDE DERIVATIVES AND INTERMEDIATE COMPOUNDS JAPAN TOBACCO INC (JP) 2008-12-03 EP disclosed
EP-1716108-B1 METHOD FOR THE SEPARATION OF INTERMEDIATES WHICH MAY BE USED FOR THE PREPARATION OF ESCITALOPRAM LUNDBECK & CO AS H (DK) 2008-10-15 EP disclosed
US-20080045602-A1 Process for Preparation of 3-(2-Hydroxy-5Methylphenyl)-N, N-Disopropyl-3-Phenylpropylamine LEK PHARMACEUTICALS, D.D. (SI) 2008-02-21 US disclosed
EP-1838659-A1 PROCESS FOR PREPARATION OF 3-(2-HYDROXY-5-METHYLPHENYL)-N,N-DIISOPROPYL-3­PHENYLPROPYLAMINE LEK Pharmaceuticals D.D. (SI) 2007-10-03 EP disclosed
US-20070190624-A1 Method for the separation of intermediates which may be used for the preparation of escitalopram H. LUNDBECK A/S (DK) 2007-08-16 US disclosed
US-20070129561-A1 Method for the separation of intermediates which may be used for the preparation of escitalopram H. LUNDBECK A/S (DK) 2007-06-07 US disclosed
US-7150856-B2 On-spot selectively activated hydrophobic slide and preparation thereof INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2006-12-19 US disclosed
EP-1716108-A1 METHOD FOR THE SEPARATION OF INTERMEDIATES WHICH MAY BE USED FOR THE PREPARATION OF ESCITALOPRAM H. Lundbeck A/S (DK) 2006-11-02 EP disclosed
US-7118908-B2 On-spot selectively activated hydrophobic slide and preparation thereof Jan, Bor-Iuan (TW) 2006-10-10 US disclosed
US-7105340-B2 On-spot selectively activated hydrophobic slide and preparation thereof Jan, Bor-Iuan (TW) 2006-09-12 US disclosed
WO-2006066931-A1 PROCESS FOR PREPARATION OF 3-(2-HYDROXY-5-METHYLPHENYL)-N,N-DIISOPROPYL-3­PHENYLPROPYLAMINE LEK PHARMACEUTICALS D.D. (SI) 2006-06-29 WO disclosed
US-20060029973-A1 On-spot selectively activated hydrophobic slide and preparation thereof INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2006-02-09 US disclosed
US-20060029974-A1 On-spot selectively activated hydrophobic slide and preparation thereof INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2006-02-09 US disclosed
WO-2005077891-A1 METHOD FOR THE SEPARATION OF INTERMEDIATES WHICH MAY BE USED FOR THE PREPARATION OF ESCITALOPRAM H. LUNDBECK A/S (DK) 2005-08-25 WO disclosed
EP-1534654-A1 METHOD FOR THE SEPARATION OF INTERMEDIATES WHICH MAY BE USED FOR THE PREPARATION OF ESCITALOPRAM H. LUNDBECK A/S (DK) 2005-06-01 EP disclosed
EP-0983999-B1 PROCESS FOR PRODUCING AMIDE DERIVATIVES AND INTERMEDIATES JAPAN TOBACCO INC (JP) 2005-02-09 EP disclosed
WO-2004014821-A1 METHOD FOR THE SEPARATION OF INTERMEDIATES WHICH MAY BE USED FOR THE PREPARATION OF ESCITALOPRAM H. LUNDBECK A/S (DK) 2004-02-19 WO disclosed
US-6596903-B2 Ring opening 4-(2-amino-1-hydroxyethyl)oxazoline by reaction with organic mercaptan; stereospecific; human immunodeficiency virus protease inhibitors JAPAN TOBACCO INC. (JP) 2003-07-22 US disclosed
US-20030040633-A1 Methods for producing amide derivative INABA TAKASHI (JP) 2003-02-27 US disclosed
US-20020182719-A1 On-spot selectively activated hydrophobic slide and preparation thereof INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2002-12-05 US disclosed
US-6476232-B2 ACETALATING OR KETALATING (Z)-2-BUTENE-1,4-DIOL, EPOXIDATION TO 3,5,8-TRIOXABICYCLO(5.1.0)OCTANE DERIVATIVE, RING-OPENING WITH CHIRAL AMINE; HIV PROTEASE INHIBITORS; INTERMEDIATES FOR PRODUCING X-RAY CONTRAST MEDIA JAPAN TOBACCO INC. (JP) 2002-11-05 US disclosed
US-20020049337-A1 4-(2-AMINO-1-HYDROXYETHYL)OXAZOLINE DERIVATIVE AND METHOD FOR PRODUCING SAME INABA TAKASHI (JP) 2002-04-25 US disclosed
US-6333416-B2 (Oxazolin-4-yl) oxirane derivative JAPAN TOBACCO INC. (JP) 2001-12-25 US disclosed
US-20010021782-A1 Production of amide derivatives and intermediates therefor INABA TAKASHI (JP) 2001-09-13 US disclosed
US-6252085-B1 OXAZOLINE DERIVATIVE JAPAN TOBACCO INC. (JP) 2001-06-26 US disclosed
US-6194589-B1 USEFUL AS AN HIV(HUMAN IMMUNODEFICIENCY VIRUS) PROTEASE INHIBITOR; AS X-RAY CONTRAST MEDIUM JAPAN TOBACCO INC. (JP) 2001-02-27 US disclosed
US-6133461-A Process for producing amide derivatives and intermediates therefor JAPAN TOBACCO INC. (JP) 2000-10-17 US disclosed
US-6121468-A Process for producing amide derivatives and intermediate compounds JAPAN TOBACCO INC. (JP) 2000-09-19 US disclosed
EP-0983999-A1 PROCESS FOR PRODUCING AMIDE DERIVATIVES AND INTERMEDIATES Japan Tobacco Inc. (JP) 2000-03-08 EP disclosed
EP-0984000-A1 PROCESS FOR PRODUCING AMIDE DERIVATIVES AND INTERMEDIATE COMPOUNDS Japan Tobacco Inc. (JP) 2000-03-08 EP disclosed
US-6018066-A Production of amide derivatives and intermediate compounds therefor JAPAN TOBACCO INC. (JP) 2000-01-25 US disclosed
US-5962704-A Production of amide derivatives and intermediate compounds therefor JAPAN TOBACCO INC. (JP) 1999-10-05 US disclosed
US-5948774-A EXCELLENT ANTIBACTERIAL ACTIVITIES ON A BROAD RANGE OF GRAM-POSITIVE AND GRAM-NEGATIVE BACTERIA, ESPECIALLY STAPHYLOCOCCUS AUREUS AND METHICILLIN-RESISTANT STAPHYLOCOCCUS AUREUS (MRSA) TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1999-09-07 US disclosed
EP-0828744-A1 CEPHEM COMPOUNDS, THEIR PRODUCTION AND USE Takeda Chemical Industries, Ltd. (JP) 1998-03-18 EP disclosed
US-5625059-A Process for the manufacture of 4-acetoxy-3-hydroxyethyl-azetidinone CIBA-GEIGY CORPORATION (US) 1997-04-29 US disclosed
WO-1996038451-A1 CEPHEM COMPOUNDS, THEIR PRODUCTION AND USE TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1996-12-05 WO disclosed
US-5312914-A Process for the manufacture of 4-acetoxy-3-hydroxyethyl-azetidinone CIBA-GEIGY CORP (US) 1994-05-17 US disclosed
EP-0184162-B1 Tricyclo compounds, a process for their production and a pharmaceutical composition containing the same FUJISAWA PHARMACEUTICAL CO (JP) 1994-04-27 EP disclosed
US-5210258-A Optically active alpha-naththylalkyl ketones SYNTEX PHARMACEUTICALS INTERNATIONAL LTD. (BM) 1993-05-11 US disclosed
US-5187293-A Blood platelet activating factor inhibitors HOFFMANN-LA ROCHE INC. (US) 1993-02-16 US disclosed
US-5057530-A For inhibiting blood platelet activating faactors HOFFMANN-LA ROCHE INC. (US) 1991-10-15 US disclosed
US-4912254-A Preparation of α-arylalkanoic acids SYNTEX PHARMACEUTICAL INTERNATIONAL LIMITED (BM) 1990-03-27 US disclosed
US-4891363-A PLATELET ACTIVATING FACTOR ANTAGONISTS SANKYO COMPANY LIMITED (JP) 1990-01-02 US disclosed
US-4863941-A PLATELET ACTIVATING FACTOR INHIBITORS, ANTITUMOR AGENTS HOFFMANN-LA ROCHE INC. (US) 1989-09-05 US disclosed
EP-0210804-B1 PHOSPHATE ESTER DERIVATIVES, THEIR PREPARATION AND THEIR THERAPEUTIC USE SANKYO COMPANY LIMITED (JP) 1989-05-10 EP disclosed
EP-0279781-A2 Process for the preparation of 4-acetoxy-3-hydroxyethyl-acetidinone CIBA-GEIGY AG (CH) 1988-08-24 EP disclosed
EP-0081993-B1 OPTICALLY ACTIVE ALPHA-SUBSTITUTED ARYL KETONES, THEIR PREPARATION AND THEIR USE IN PREPARING ALPHA-ARYLALKANOIC ACIDS SYNTEX PHARMACEUTICALS INTERNATIONAL LIMITED (BM) 1988-08-17 EP disclosed
US-4749804-A Preparation of stereoisomers of ketals SYNTEX (U.S.A.) INC. (US) 1988-06-07 US disclosed
US-4731373-A BLOOD PLATELET ACTIVATING FACTOR HOFFMAN-LA ROCHE INC. (US) 1988-03-15 US disclosed
EP-0210804-A1 Phosphate ester derivatives, their preparation and their therapeutic use SANKYO COMPANY LIMITED (JP) 1987-02-04 EP disclosed
EP-0208932-A2 Glycerin derivatives F. HOFFMANN-LA ROCHE AG (CH) 1987-01-21 EP disclosed
EP-0092190-B1 PHOSPHOLIPID DERIVATIVES, PROCESS FOR PREPARATION THEREOF AND PHARMACEUTICAL COMPOSITION OF THE SAME FUJISAWA PHARMACEUTICAL CO., LTD. (JP) 1986-09-24 EP disclosed
US-4605758-A Preparation of α-arylalkanoic acids SYNTEX PHARMACEUTICALS INTERNATIONAL LTD. (BM) 1986-08-12 US disclosed
EP-0147768-A2 Glycerin derivatives F. HOFFMANN-LA ROCHE & CO. Aktiengesellschaft (CH) 1985-07-10 EP disclosed
EP-0081993-A2 Optically active alpha-substituted aryl ketones, their preparation and their use in preparing alpha-arylalkanoic acids SYNTEX PHARMACEUTICALS INTERNATIONAL LIMITED (BM) 1983-06-22 EP disclosed
EP-0081993-A2 Optically active alpha-substituted aryl ketones, their preparation and their use in preparing alpha-arylalkanoic acids SYNTEX PHARMACEUTICALS INTERNATIONAL LIMITED (BM) 1983-06-22 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (39 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170233418-A1 N-(PHOSPHINOALKYL)-N-(THIOALKYL)AMINE DERIVATIVE, METHOD FOR PRODUCING SAME, AND METAL COMPLEX THEREOF NSFL1C, TST, NCL KMT2A 1126/4885ALDH1A1 1341/4885F2 115/4885
US-20110065937-A1 METHOD FOR THE SEPARATION OF INTERMEDIATES WHICH MAY BE USED FOR THE PREPARATION OF ESCITALOPRAM MAOB, HSD17B14, MAOA KMT2A 1030/4885ALDH1A1 63/4885F2 1508/4885
US-20170190679-A9 METHOD FOR PRODUCING POLYMERIZABLE COMPOUND DCXR, CBR1, GRHPR KMT2A 216/4885ALDH1A1 152/4885F2 524/4885
US-20110172413-A1 PURIFICATION METHOD OF LACTONE COMPOUNDS CONTAINING UNSATURATED ALKYL GROUP BY EXTRACTION WITH SILVER ION SOLUTION FKBP2, FKBP8, FKBP5 KMT2A 4082/4885ALDH1A1 3310/4885F2 2349/4885
US-20230219983-A1 TETRADENTATE DIAMINODIPHOSPHINE LIGAND AND TRANSITION METAL COMPLEX, AND METHOD FOR MANUFACTURING SAME AND APPLICATION FOR SAME ADH4, ADH5, PF4 KMT2A 1576/4885ALDH1A1 219/4885F2 270/4885
US-20220017447-A1 PROCESS FOR PREPARING 6-ISOPROPENYL-3-METHYL-9-DECENYL ACETATE, AND INTERMEDIATES THEREFOR CUL1, CYP51A1, CYP4Z1 KMT2A 713/4885ALDH1A1 166/4885F2 4482/4885
US-11148989-B2 Dialkoxyalkadienyne compound and a process for preparing the same and a process for preparing a dienynal compound DOHH, HRH1, HRH2 KMT2A 2256/4885ALDH1A1 423/4885F2 1312/4885
US-20030229115-A1 Tricyclo compounds, a process for their production and pharmaceutical composition containing the same OTC, SLC11A2, TYMS KMT2A 4352/4885ALDH1A1 2501/4885F2 4175/4885
US-20210017112-A1 DIMETHYLCYCLOBUTANONE COMPOUNDS, DIMETHYLCYCLOBUTANE COMPOUNDS, AND PROCESSES FOR PREPARING THE SAME GGPS1, PFKFB4, PHOSPHO1 KMT2A 2708/4885ALDH1A1 3369/4885F2 723/4885
US-11384043-B2 Dimethylcyclobutanone compounds, dimethylcyclobutane compounds, and processes for preparing the same GGPS1, PFKFB4, PHOSPHO1 KMT2A 2708/4885ALDH1A1 3369/4885F2 723/4885
US-12012426-B2 Tetradentate diaminodiphosphine ligand and transition metal complex, and method for manufacturing same and application for same ADH4, ADH5, PF4 KMT2A 1576/4885ALDH1A1 219/4885F2 270/4885
US-20230128569-A1 NOVEL COMPOUND AND APPLICATION THEREOF ABCG2, CXCR4, CCR10 KMT2A 4526/4885ALDH1A1 275/4885F2 765/4885
US-10059729-B2 Ruthenium complex, method for producing same, and use of same ADH1C, PNPO, PNP KMT2A 4043/4885ALDH1A1 734/4885F2 701/4885
US-20020049337-A1 4-(2-AMINO-1-HYDROXYETHYL)OXAZOLINE DERIVATIVE AND METHOD FOR PRODUCING SAME XDH, XPNPEP1, PEPD KMT2A 1451/4885ALDH1A1 2454/4885F2 1141/4885
US-20210017115-A1 DIESTER COMPOUND HAVING A DIMETHYLCYCLOBUTANE RING, A PROCESS FOR PREPARING THE SAME, AND A PROCESS FOR PREPARING DIMETHYLCYCLOBUTANE COMPOUND DERIVED FROM THE DIESTER COMPOUND DHCR24, PHOSPHO1, CCNT1 KMT2A 1119/4885ALDH1A1 4253/4885F2 705/4885
US-10059679-B2 Method for producing polymerizable compound DCXR, CBR1, GRHPR KMT2A 216/4885ALDH1A1 152/4885F2 524/4885
US-11370741-B2 Processes for preparing alpha-necrodyl compounds and processes for preparing gamma-necrodyl compounds CUL1, CUL2, ZC3HAV1 KMT2A 1695/4885ALDH1A1 3468/4885F2 1057/4885
US-20070129561-A1 Method for the separation of intermediates which may be used for the preparation of escitalopram MAOB, HSD17B14, MAOA KMT2A 1030/4885ALDH1A1 63/4885F2 1508/4885
US-20210061745-A1 PROCESS FOR PREPARING 4-PENTEN-2-YNAL ORC3, OR10J3, OXER1 KMT2A 1256/4885ALDH1A1 163/4885F2 696/4885
US-11639362-B2 Tetradentate diaminodiphosphine ligand and transition metal complex, and method for manufacturing same and application for same ADH4, ADH5, PF4 KMT2A 1576/4885ALDH1A1 219/4885F2 270/4885
US-20170044196-A1 RUTHENIUM COMPLEX, METHOD FOR PRODUCING SAME, AND USE OF SAME ADH1C, PNPO, PNP KMT2A 4036/4885ALDH1A1 739/4885F2 714/4885
US-10138179-B2 Method for producing 2,4-dienal acetal compound and 2,4-dienal compound SRD5A2, OR51E2, AR KMT2A 2065/4885ALDH1A1 407/4885F2 288/4885
US-20210061744-A1 DIALKOXYALKADIENYNE COMPOUND AND A PROCESS FOR PREPARING THE SAME AND A PROCESS FOR PREPARING A DIENYNAL COMPOUND DOHH, HRH1, HRH3 KMT2A 2309/4885ALDH1A1 416/4885F2 1310/4885
US-20180305276-A1 METHOD FOR PRODUCING 2,4-DIENAL ACETAL COMPOUND AND 2,4-DIENAL COMPOUND SRD5A2, OR51E2, AR KMT2A 2065/4885ALDH1A1 407/4885F2 288/4885
US-20030170831-A1 Tricyclo compounds, a process for their production and a pharmaceutical composition containing the same OTC, OAT, SLC11A2 KMT2A 4382/4885ALDH1A1 2496/4885F2 4341/4885
US-20220324783-A1 DIMETHYLCYCLOBUTANONE COMPOUNDS, DIMETHYLCYCLOBUTANE COMPOUNDS, AND PROCESSES FOR PREPARING THE SAME GGPS1, PFKFB4, PHOSPHO1 KMT2A 2708/4885ALDH1A1 3369/4885F2 723/4885
US-11352312-B2 Diester compound having a dimethylcyclobutane ring, a process for preparing the same, and a process for preparing dimethylcyclobutane compound derived from the diester compound DHCR24, PHOSPHO1, CCNT1 KMT2A 1119/4885ALDH1A1 4253/4885F2 705/4885
US-20170015639-A1 METHOD FOR PRODUCING POLYMERIZABLE COMPOUND DCXR, CBR1, GRHPR KMT2A 216/4885ALDH1A1 152/4885F2 524/4885
US-20200283399-A1 METHOD OF PRODUCING POLYMERIZABLE COMPOUND, AND SOLUTION OF POLYMERIZABLE COMPOUND PDE8A, ADCY6, TKFC KMT2A 3209/4885ALDH1A1 2498/4885F2 381/4885
US-20220024847-A1 PROCESSES FOR PREPARING ALPHA-NECRODYL COMPOUNDS AND PROCESSES FOR PREPARING GAMMA-NECRODYL COMPOUNDS CUL1, CUL2, ZC3HAV1 KMT2A 1695/4885ALDH1A1 3468/4885F2 1057/4885
US-20200102336-A1 CATIONIC RUTHENIUM COMPLEX, AND PRODUCTION METHOD THEREFOR AND USE THEREOF NOTUM, POR, ADH1A KMT2A 3591/4885ALDH1A1 919/4885F2 863/4885
US-20030040633-A1 Methods for producing amide derivative XDH, PEPD, XPNPEP1 KMT2A 2218/4885ALDH1A1 3176/4885F2 450/4885
US-20080045602-A1 Process for Preparation of 3-(2-Hydroxy-5Methylphenyl)-N, N-Disopropyl-3-Phenylpropylamine SLC6A3, PNMT, PIR KMT2A 1571/4885ALDH1A1 1210/4885F2 4043/4885
US-11795133-B2 Process for preparing 6-isopropenyl-3-methyl-9-decenyl acetate, and intermediates therefor CUL1, CYP51A1, CYP4Z1 KMT2A 713/4885ALDH1A1 166/4885F2 4482/4885
US-20070190624-A1 Method for the separation of intermediates which may be used for the preparation of escitalopram MAOB, HTR4, HTR2B KMT2A 891/4885ALDH1A1 26/4885F2 1801/4885
US-20040029908-A1 Tricyclo compounds, a process for their production and a pharmaceutical composition containing the same OTC, OAT, SLC11A2 KMT2A 4648/4885ALDH1A1 1876/4885F2 3754/4885
US-10072033-B2 N-(phosphinoalkyl)-N-(thioalkyl)amine derivative, method for producing same, and metal complex thereof NSFL1C, TST, NCL KMT2A 1126/4885ALDH1A1 1341/4885F2 115/4885
US-20010021782-A1 Production of amide derivatives and intermediates therefor XDH, CYP51A1, FURIN KMT2A 2797/4885ALDH1A1 2552/4885F2 557/4885
US-11325933-B2 Cationic ruthenium complex, and production method therefor and use thereof NOTUM, POR, ADH1A KMT2A 3591/4885ALDH1A1 919/4885F2 863/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.