SCHEMBL10001980

SCHEMBL10001980

Cc1ccc(C(=O)Nc2cc(S(=O)(=O)c3ccc(N)c(NC(=O)c4ccc(C)c(C)c4)c3)ccc2N)cc1C

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 6/20 0.51
MEN1 O00255 5/20 0.51
RAB9A P51151 5/20 0.48
LMNA P02545 1/20 0.48
MAPT P10636 1/20 0.48
TDP1 Q9NUW8 1/20 0.48
POLB P06746 1/20 0.45
RXFP1 Q9HBX9 1/20 0.45
NPC1 O15118 4/20 0.44
TP53 P04637 2/20 0.44
CASP3 P42574 1/20 0.44
SENP8 Q96LD8 1/20 0.44
SENP7 Q9BQF6 1/20 0.44
SENP6 Q9GZR1 1/20 0.44
HDAC3 O15379 1/20 0.44
ALDH1A1 P00352 2/20 0.43
HDAC1 Q13547 3/20 0.43
HDAC2 Q92769 2/20 0.43
BLM P54132 1/20 0.42
SMN1; SMN2 Q16637 2/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13400971 0.89 KMT2A (0.56) KMT2AMEN1RAB9ALMNAMAPT
SCHEMBL10001979 0.85 KMT2A (0.52) KMT2AMEN1RAB9ALMNAMAPT
SCHEMBL11643585 0.83 NPC1 (0.58) KMT2AMEN1MAPTPOLBNPC1
SCHEMBL10001982 0.83 KMT2A (0.56) KMT2AMEN1RAB9ALMNAMAPT
SCHEMBL15579623 0.77 CA12 (0.54) KMT2AMEN1RAB9AMAPTHDAC3
SCHEMBL11642121 0.75 NPC1 (0.62) KMT2AMEN1LMNAMAPTNPC1
SCHEMBL2605535 0.74 MEN1 (0.52) KMT2AMEN1RAB9ALMNAMAPT
SCHEMBL11141332 0.73 CA2 (0.71) KMT2AMEN1RAB9ALMNAMAPT
SCHEMBL11640399 0.73 NPC1 (0.63) KMT2AMEN1LMNAMAPTPOLB
SCHEMBL20628706 0.73 RAB9A (0.59) KMT2AMEN1RAB9ALMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8673540-B2 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2014-03-18 US disclosed
US-8673540-B2 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2014-03-18 US disclosed
US-20130095426-A1 PHOTOSENSITIVE POLYMIDES ETERNAL CHEMICAL CO., LTD. (TW) 2013-04-18 US disclosed
US-20130095426-A1 PHOTOSENSITIVE POLYMIDES ETERNAL CHEMICAL CO., LTD. (TW) 2013-04-18 US disclosed
US-8349539-B2 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2013-01-08 US disclosed
US-8349539-B2 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2013-01-08 US disclosed
US-8105752-B2 Photosensitive polyimides ETERNAL CHEMICAL CO., LTD. (TW) 2012-01-31 US disclosed
US-8105752-B2 Photosensitive polyimides ETERNAL CHEMICAL CO., LTD. (TW) 2012-01-31 US disclosed
US-20110212402-A1 PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION ETERNAL CHEMICAL CO., LTD. (TW) 2011-09-01 US disclosed
US-20110212402-A1 PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION ETERNAL CHEMICAL CO., LTD. (TW) 2011-09-01 US disclosed
US-20100086874-A1 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2010-04-08 US disclosed
US-20100086874-A1 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2010-04-08 US disclosed
US-20100086871-A1 PHOTOSENSITIVE POLYIMIDES ETERNAL CHEMICAL CO., LTD. 2010-04-08 US disclosed
US-20100086871-A1 PHOTOSENSITIVE POLYIMIDES ETERNAL CHEMICAL CO., LTD. 2010-04-08 US disclosed