SCHEMBL10001979

SCHEMBL10001979

Cc1ccc(C(=O)Nc2cc(S(=O)(=O)c3ccc(O)c(NC(=O)c4ccc(C)c(C)c4)c3)ccc2O)cc1C

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 6/20 0.52
MEN1 O00255 5/20 0.52
RAB9A P51151 7/20 0.52
MAPT P10636 2/20 0.52
LMNA P02545 2/20 0.52
TDP1 Q9NUW8 1/20 0.52
NPC1 O15118 4/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
CA12 O43570 3/20 0.49
CA1 P00915 3/20 0.49
CA2 P00918 3/20 0.49
CA9 Q16790 3/20 0.49
KCNMA1 Q12791 2/20 0.48
ALDH1A1 P00352 4/20 0.47
GAA P10253 1/20 0.47
PKM P14618 1/20 0.47
POLB P06746 1/20 0.46
RXFP1 Q9HBX9 1/20 0.46
TP53 P04637 1/20 0.45
CASP3 P42574 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13400971 0.90 KMT2A (0.56) KMT2AMEN1RAB9AMAPTLMNA
SCHEMBL2605535 0.88 MEN1 (0.52) KMT2AMEN1RAB9AMAPTLMNA
SCHEMBL2605529 0.86 ALDH1A1 (0.48) KMT2AMEN1RAB9AMAPTLMNA
SCHEMBL2605546 0.86 KCNMA1 (0.61) KMT2AMEN1RAB9AMAPTTDP1
SCHEMBL10001980 0.85 KMT2A (0.51) KMT2AMEN1RAB9AMAPTLMNA
SCHEMBL19846842 0.82 KMT2A (0.60) KMT2AMEN1RAB9AMAPTLMNA
SCHEMBL14679679 0.82 ALDH1A1 (0.47) KMT2AMEN1RAB9AMAPTLMNA
SCHEMBL14228242 0.81 MAPT (0.58) KMT2AMEN1RAB9AMAPTCA12
SCHEMBL19492088 0.80 MEN1 (0.45) KMT2AMEN1RAB9AMAPTLMNA
SCHEMBL2605542 0.80 KCNMA1 (0.69) RAB9AMAPTNPC1SMN1; SMN2CA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8673540-B2 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2014-03-18 US disclosed
US-8673540-B2 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2014-03-18 US disclosed
US-20130095426-A1 PHOTOSENSITIVE POLYMIDES ETERNAL CHEMICAL CO., LTD. (TW) 2013-04-18 US disclosed
US-20130095426-A1 PHOTOSENSITIVE POLYMIDES ETERNAL CHEMICAL CO., LTD. (TW) 2013-04-18 US disclosed
US-8349539-B2 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2013-01-08 US disclosed
US-8349539-B2 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2013-01-08 US disclosed
US-8105752-B2 Photosensitive polyimides ETERNAL CHEMICAL CO., LTD. (TW) 2012-01-31 US disclosed
US-8105752-B2 Photosensitive polyimides ETERNAL CHEMICAL CO., LTD. (TW) 2012-01-31 US disclosed
US-20110212402-A1 PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION ETERNAL CHEMICAL CO., LTD. (TW) 2011-09-01 US disclosed
US-20110212402-A1 PHOTOSENSITIVE RESIN COMPOSITION AND ITS APPLICATION ETERNAL CHEMICAL CO., LTD. (TW) 2011-09-01 US disclosed
US-20100086874-A1 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2010-04-08 US disclosed
US-20100086871-A1 PHOTOSENSITIVE POLYIMIDES ETERNAL CHEMICAL CO., LTD. 2010-04-08 US disclosed
US-20100086874-A1 Photosensitive polymides ETERNAL CHEMICAL CO., LTD. (TW) 2010-04-08 US disclosed
US-20100086871-A1 PHOTOSENSITIVE POLYIMIDES ETERNAL CHEMICAL CO., LTD. 2010-04-08 US disclosed